Substrate inspection apparatus and method of inspecting a substrate using the same
A substrate inspection apparatus includes a laser light source configured to emit a laser beam, an optical splitter configured to split the laser beam into a first laser beam and a second laser beam, a delay stage configured to change a relative time delay of the second laser beam and optically connected to the optical splitter, a first modulator optically connected to the optical splitter and configured to change the first laser beam, and a feedback system configured to sense the second laser beam reflected from a substrate and configured to apply electrical feedback to the first modulator.
1 . A substrate inspection apparatus comprising:
a laser light source configured to emit a laser beam;
an optical splitter configured to split the laser beam into a first laser beam and a second laser beam;
a delay stage optically connected to the optical splitter and configured to change a relative time delay of the second laser beam with respect to the first laser beam;
a first modulator optically connected to the optical splitter and configured to change the first laser beam; and
a feedback system configured to sense the second laser beam reflected from a substrate and configured to apply electrical feedback to the first modulator.
2 . The substrate inspection apparatus of claim 1 , wherein the first modulator comprises: a first optical modulator configured to change an intensity of the first laser beam for each wavelength, and
wherein the first optical modulator includes a spatial light modulator.
3 . The substrate inspection apparatus of claim 2 , wherein the first modulator further comprises: a first grating optically connected to the optical splitter and configured to divide the first laser beam.
4 . The substrate inspection apparatus of claim 3 , wherein the first modulator further comprises: a second grating optically connected to the first modulator and configured to focus the divided first laser beam, and
wherein the first optical modulator is located between the first grating and the second grating.
5 . The substrate inspection apparatus of claim 1 , wherein the first modulator comprises: a first optical modulator configured to change a wavefront of the first laser beam, and
wherein the first optical modulator includes a piezoelectric transducer, the piezoelectric transducer having a shape of a surface configured to be changed by an applied voltage.
6 . The substrate inspection apparatus of claim 5 , wherein the first modulator further comprises: a second optical modulator configured to change an intensity of the first laser beam for each wavelength, and
wherein the second optical modulator includes a spatial light modulator configured to change a refractive index of a medium through which the first laser beam propagates depending on a direction and an intensity of an applied electric field.
7 . The substrate inspection apparatus of claim 1 , wherein the laser light source includes a femtosecond laser light source configured to generate the laser beam having a waveform of a pulse shape.
8 . The substrate inspection apparatus of claim 1 , further comprising:
a second modulator optically connected to the delay stage and configured to change the second laser beam,
wherein the feedback system is electrically connected to the second modulator.
9 . The substrate inspection apparatus of claim 8 , wherein the second modulator includes a piezoelectric transducer configured to change a wavefront of the second laser beam or a spatial light modulator configured to change an intensity of the second laser beam for each wavelength.
10 . A substrate inspection apparatus comprising:
a laser light source configured to emit a femtosecond laser beam;
an optical splitter configured to split the femtosecond laser beam into a first laser beam and a second laser beam;
a delay stage configured to receive the second laser beam from the optical splitter and configured to change a relative time delay of the second laser beam with respect to the first laser beam;
a modulator optically connected to the optical splitter and configured to change the second laser beam; and
a feedback system configured to sense the second laser beam reflected from a substrate and electrically connected to the modulator.
11 . The substrate inspection apparatus of claim 10 , wherein a pulse width of the femtosecond laser light generated from the laser light source ranges from 10 fs to 60 fs.
12 . The substrate inspection apparatus of claim 10 , wherein the modulator comprises: an optical modulator configured to change a waveform of the second laser beam or an intensity of the second laser beam for each frequency.
13 . The substrate inspection apparatus of claim 12 , wherein the optical modulator includes a piezoelectric transducer having a surface, a shape of the surface being configured to be changed by a voltage, or a spatial light modulator having crystal molecules with an alignment direction configured to be changed by an electric field.
14 . The substrate inspection apparatus of claim 12 , wherein the modulator further comprises: a grating including a plurality of slits arranged at equal distances.
15 . The substrate inspection apparatus of claim 10 , further comprising:
a lens configured to focus the femtosecond laser light split by the optical splitter again and optically connected to the delay stage or to the modulator.