Tunable fabry-perot cavity device having movable mirror and manufacturing method therefor

1 . A tunable Fabry-Perot cavity device having a movable mirror, wherein a movable mirror is provided opposite an another mirror, said movable mirror and said another mirror are bonded to each other at periphery to form a Fabry-Perot cavity therebetween, said movable mirror comprises a silicon film inlaid with glass, said glass is filled into said silicon film after said silicon film is etched, a central region of said silicon film is inlaid with glass to form a light-transmitting region, and a surface of the light-transmitting region facing the cavity is provided with a mirror material, a transition region of the silicon film between bonded periphery region and the central region is inlaid with glass which extends throughout said silicon film in a dimension of film thickness to form an elastic structure.

2 . The tunable Fabry-Perot cavity device having a movable mirror according to claim 1 , wherein a silicon layer remaining between said transition region and said central region of the silicon film forms an annular support structure.

3 . The tunable Fabry-Perot cavity device having a movable mirror according to claim 2 , wherein said annular support structure is partially removed to form a venting channel.

4 . The tunable Fabry-Perot cavity device having a movable mirror according to claim 1 , wherein said movable mirror is made of Silicon On Insulator (SOI) wafer, wherein said glass is filled into said SOI wafer after a silicon layer of said SOI wafer is etched.

5 . The tunable Fabry-Perot cavity device having a movable mirror according to claim 1 , wherein said another mirror also comprises a silicon film inlaid with glass.

6 . The tunable Fabry-Perot cavity device having a movable mirror according to claim 1 , wherein said another mirror comprises a fixed mirror, which fixed mirror comprises a glass substrate and said mirror material provided on the glass substrate.

7 . The tunable Fabry-Perot cavity device having a movable mirror according to claim 6 , wherein another surface of said fixed mirror facing away said movable mirror is also bonded to another movable mirror, said another movable mirror forms another Fabry-Perot cavity with said another surface of said fixed mirror.

8 . The tunable Fabry-Perot cavity device having a movable mirror according to claim 1 , wherein said silicon film inlaid with glass has a thickness between 10-200 microns.

9 . The tunable Fabry-Perot cavity device having a movable mirror according to claim 1 , wherein material of optical mirror comprises silicon, silicon oxide, or a combination thereof, or silver.

10 . The tunable Fabry-Perot cavity device having a movable mirror according to claim 1 , wherein way of said bonding comprise eutectic bonding, polymer, or anodic bonding.

11 . The tunable Fabry-Perot cavity device having a movable mirror according to claim 1 , wherein said movable mirror is provided with a driving device for controlling relative displacement of said movable mirror.

12 . The tunable Fabry-Perot cavity device having a movable mirror according to claim 11 , wherein said driving device comprises a capacitive driver or an actuator driver with a piezoelectric film structure.

13 . The tunable Fabry-Perot cavity device having a movable mirror according to claim 12 , wherein said piezoelectric film structure comprises lead zirconate titanate film, aluminum nitride film, or zinc oxide film.

14 . The tunable Fabry-Perot cavity device having a movable mirror according to claim 11 , wherein said driving device comprises a first electrode and a second electrode, which electrodes are provided at the periphery of the surface of said movable mirror facing away the mirror thereof and in region of the inlaid silicon layer.

15 . The tunable Fabry-Perot cavity device having a movable mirror according to claim 11 , wherein said driving device comprises a piezoelectric film structure provided at the periphery of the surface of said movable mirror facing away the mirror thereof.

16 . The tunable Fabry-Perot cavity device having a movable mirror according to claim 15 , wherein the way for depositing said piezoelectric film on said movable mirror comprises sputtering or sol-gel.

17 . A method of manufacturing a tunable Fabry-Perot cavity device having a movable mirror, wherein comprises the steps of:

S 1 : providing a substrate and etching a pattern with a certain depth on the substrate;

S 2 : melting glass and filling the etched substrate with the glass;

S 3 : grinding a surface of the substrate filled with the glass to form a substrate inlaid with glass;

S 4 : depositing an optical mirror material on the surface of the substrate inlaid with glass to form an optical mirror; and

S 5 : removing excess part of the substrate by grinding or etching to form a movable mirror, so as to form a Fabry-Perot cavity with a film structure inlaid with glass, wherein said film structure inlaid with glass comprises a silicon film inlaid with glass, said glass is filled into said silicon film after said silicon film is etched, a central region of said silicon film is inlaid with glass to form a light-transmitting region, and a transition region of the silicon film between bonded periphery region and the central region is inlaid with glass to form an elastic structure.

18 . The method of manufacturing a tunable Fabry-Perot cavity device having movable mirror according to claim 17 , wherein S 5 further comprises the steps of:

S 51 : bonding two of the substrates inlaid with glass and having an optical mirror to each other to form a Fabry-Perot cavity between the mirrors; and

S 52 : removing excess part of the substrate by grinding or etching to form a Fabry-Perot cavity with a film structure inlaid with glass.

19 . The method of manufacturing a tunable Fabry-Perot cavity device having movable mirror of claim 17 , wherein the substrate provided in said S 1 is a silicon substrate or a Silicon On Insulator (SOI) substrate.

20 . The method of manufacturing a tunable Fabry-Perot cavity device having movable mirror according to claim 17 , wherein said S 1 comprises the steps of:

S 11 : providing an SOI substrate and etching silicon layer on the SOI substrate to form a pattern with a certain depth; and

S 12 : providing a glass substrate, bonding the glass substrate with the SOI substrate.