IP Library Granted Patent US 12681381
Granted Patent B2
US 12681381 · App. 18/727,572 · Granted Jul 14, 2026

Pellicle, exposure master, exposure device, pellicle production method and test method for mask adhesive layer

Inventors: Yutaka Yoshimura (Tokyo, JP); Keiichi Kakihara (Tokyo, JP); Ryo Tanaka (Tokyo, JP); Yuji Maruyama (Tokyo, JP); Masatsugu Higashi (Tokyo, JP); Masakazu Yamauchi (Tokyo, JP); Tomokazu Tanaka (Tokyo, JP)
Assignee: MITSUI CHEMICALS, INC.
G03F1/62G03F7/70983
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Quick Facts
Patent No.
US 12681381
App. No.
18/727,572
Granted
Jul 14, 2026
Kind
B2
Abstract

Provided is a pellicle, including a frame on which a pellicle film is placed and a mask adhesive layer which is placed on the frame, wherein when an attachment portion S 1 of the adhesive layer to a quartz mask is irradiated with xenon (Xe) excimer lamp light from a back surface of the mask for 2 minutes and the pellicle is then peeled off, a residual ratio (residual area of the adhesive layer on a quartz mask/area of the attachment portion S 1 of the adhesive layer) of the adhesive layer is 0.001 to 5.0%.

Claims (38)

1 . A pellicle, comprising a frame on which a pellicle film is placed and a mask adhesive layer which is placed on the frame, wherein

when an attachment portion of the adhesive layer to a quartz mask is irradiated with xenon (Xe) excimer lamp light from a back surface of the mask for 2 minutes and the pellicle is then peeled off, a residual ratio of the adhesive layer represented as a ratio of residual area of the adhesive layer on the mask to area of the attachment portion of the adhesive layer is 0.001 to 5.0%,

the adhesive layer comprises:

a reaction product of an acrylic- or methacrylic-copolymer and a curing agent having a crosslinking density-ensuring unit and a flexibility-imparting unit,

the crosslinking density-ensuring unit contains three or more isocyanate groups, and

the flexibility-imparting unit contains an aliphatic isocyanate compound containing an isocyanate group located at an end of an alkyl chain having 4 or more carbon atoms.

2 . The pellicle according to claim 1 , wherein the residual ratio when the attachment portion is irradiated with xenon (Xe) excimer lamp light from the back surface of the mask for 2 minutes and the pellicle is then peeled off is 5.0% or less.

3 . The pellicle according to claim 1 , wherein the residual ratio is 2.0% or less.

4 . The pellicle according to claim 1 , wherein when a tension is applied to the adhesive layer in a longitudinal direction at an elongation of 20% and thereafter the tension is kept, and 3 minutes has elapsed, a residual stress value per unit cross-sectional area is greater than 0 and 10 mN/mm 2 or less.

5 . The pellicle according to claim 1 , wherein the adhesive layer comprises:

a reaction product of the acrylic-copolymer and a curing agent having a crosslinking density-ensuring unit and a flexibility-imparting unit.

6 . The pellicle according to claim 5 , wherein the acrylic-copolymer contains a hydroxyl group-containing monomer, and

a ratio of the hydroxyl group-containing monomer to a total amount of the acrylic-copolymer is 4.0% by mass or less.

7 . The pellicle according to claim 5 , wherein 95% by mass or more of the curing agent is an aliphatic isocyanate compound.

8 . The pellicle according to claim 5 , wherein less than 5% by mass of the curing agent is an aromatic isocyanate compound.

9 . The pellicle according to claim 5 , wherein a ratio of the curing agent to a total amount of the acrylic-copolymer is 0.20 to 3.00% by mass.

10 . An exposure master comprising a quartz mask and the pellicle according to claim 1 mounted to the mask.

11 . An exposure device, comprising:

a light source for emitting xenon (Xe) excimer lamp light, and

the exposure master according to claim 10 , which is irradiated with the xenon (Xe) excimer lamp light.

12 . A method for the production of a pellicle comprising a frame on which a pellicle film is placed and a mask adhesive layer which is placed on the frame, wherein

when an attachment portion of the adhesive layer to a quartz mask is irradiated with xenon (Xe) excimer lamp light from a back surface of the mask for 2 minutes and the pellicle is then peeled off, a residual ratio of the adhesive layer represented as a ratio of residual area of the adhesive layer on the mask to area of the attachment portion of the adhesive layer is 0.001 to 5.0%,

the adhesive layer comprises:

a reaction product of an acrylic- or methacrylic-copolymer and a curing agent having a crosslinking density-ensuring unit and a flexibility-imparting unit,

the crosslinking density-ensuring unit contains three or more isocyanate groups, and

the flexibility-imparting unit contains an aliphatic isocyanate compound containing an isocyanate group located at an end of an alkyl chain having 4 or more carbon atoms.

13 . A test method of an adhesive layer for a mask, using a pellicle comprising a frame on which a pellicle film is placed and a mask adhesive layer which is placed on the frame, wherein

acceptability of the adhesive layer is determined by whether or not a residual ratio of the adhesive layer represented by a ratio of residual area of the adhesive layer on a quartz mask/area of an attachment portion of the adhesive layer to the mask is within a range of 0.001% to 5.0%,

the adhesive layer comprises:

a reaction product of an acrylic- or methacrylic-copolymer and a curing agent having a crosslinking density-ensuring unit and a flexibility-imparting unit,

the crosslinking density-ensuring unit contains three or more isocyanate groups, and

the flexibility-imparting unit contains an aliphatic isocyanate compound containing an isocyanate group located at an end of an alkyl chain having 4 or more carbon atoms.

14 . A pellicle, comprising a frame on which a pellicle film is placed and a mask adhesive layer which is placed on the frame, wherein

when an attachment portion of the adhesive layer to a quartz mask is irradiated with xenon (Xe) excimer lamp light from a back surface of the mask at a cumulative radiation dose of 6.0 J/cm 2 and the pellicle is then peeled off, a residual ratio of the adhesive layer represented as a ratio of residual area of the adhesive layer on the mask/area of the attachment portion of the adhesive layer is 0.001 to 5.0%,

the adhesive layer comprises:

a reaction product of an acrylic- or methacrylic-copolymer and a curing agent having a crosslinking density-ensuring unit and a flexibility-imparting unit,

the crosslinking density-ensuring unit contains three or more isocyanate groups, and

the flexibility-imparting unit contains an aliphatic isocyanate compound containing an isocyanate group located at an end of an alkyl chain having 4 or more carbon atoms.