Ion generators of ion implanters with movable repeller

1 . An ion generator of an ion implanter, the ion generator comprising:

an arc chamber defined by an arc chamber housing extending in a traveling direction;

a filament configured to generate thermal electrons;

a cathode disposed at a first end of the arc chamber housing in the traveling direction and configured to generate secondary electrons in response to bombardment of the thermal electrons generated by the filament;

a repeller disposed at a second end, opposite to the first end, of the arc chamber housing in the traveling direction, wherein the repeller is movable with respect to the arc chamber housing; and

a first distance sensor attached to the arc chamber housing and configured to measure a consumption depth of the repeller in the traveling direction, a displacement of the repeller being determined based on the consumption depth of the repeller measured by the first distance sensor.

2 . The ion generator of claim 1 , further comprising:

a first driving mechanism coupled to the repeller and configured to move the repeller with respect to the arc chamber housing.

3 . The ion generator of claim 2 , wherein the first driving mechanism is coupled to the repeller through a shaft attached to the repeller.

4 . The ion generator of claim 3 , wherein the first driving mechanism is one of:

an actuator;

a rail;

a continuous track; and

a stepper motor.

5 . The ion generator of claim 2 , wherein the repeller is curved.

6 . The ion generator of claim 1 , wherein the consumption depth of the repeller is measured by:

measuring a first distance between the first distance sensor and the repeller at a first moment;

measuring a second distance between the first distance sensor and the repeller at a second moment after the first moment; and

calculating a difference between the first distance and the second distance.

7 . The ion generator of claim 1 , further comprising:

a second driving mechanism coupled to the cathode and configured to move the cathode with respect to the arc chamber housing.

8 . The ion generator of claim 7 , further comprising:

a second distance sensor attached to the arc chamber housing and configured to measure a consumption depth of the cathode in the traveling direction.

9 . The ion generator of claim 8 , wherein the consumption depth of the cathode is measured by:

measuring a first distance between the second distance sensor and the cathode at a first moment;

measuring a second distance between the second distance sensor and the cathode at a second moment after the first moment; and

calculating a difference between the first distance and the second distance.

10 . The ion generator of claim 8 , wherein a displacement of the cathode is determined based on the consumption depth of the cathode.

11 . The ion generator of claim 10 , wherein the displacement of the cathode is zero, and the displacement of the repeller is a sum of the consumption depth of the repeller and the consumption depth of the cathode.

12 . The ion generator of claim 10 , wherein the displacement of the repeller is zero, and the displacement of the cathode is a sum of the consumption depth of the repeller and the consumption depth of the cathode.

13 . The ion generator of claim 10 , wherein a sum of the displacement of the cathode and the displacement of the repeller is equal to a sum of the consumption depth of the repeller and the consumption depth of the cathode.

14 . The ion generator of claim 1 , wherein the first distance sensor is one of an ultrasonic distance sensor, an infrared (IR) distance sensor, and a laser distance sensor.

15 . The ion generator of claim 1 , wherein the first distance sensor is a Light Detection and Ranging (LiDAR) sensor.

16 . An ion generator of an ion implanter, the ion generator comprising:

an arc chamber defined by an arc chamber housing extending in a traveling direction;

a filament configured to generate thermal electrons;

a cathode disposed at a first end of the arc chamber housing in the traveling direction and configured to generate secondary electrons in response to bombardment of the thermal electrons generated by the filament; and

a repeller disposed at a second end, opposite to the first end, of the arc chamber housing in the traveling direction, wherein the repeller is curved;

wherein the repeller is movable in the traveling direction to compensate for a consumption of at least one of the cathode and the repeller, a displacement of the repeller being determined based on a consumption depth measured by a distance sensor.

17 . The ion generator of claim 16 , wherein the repeller comprises:

a front surface facing the cathode; and

a back surface opposite to the front surface; and

wherein the front surface is a concave surface viewing from the cathode, and the back surface is a convex surface viewing toward the cathode.

18 . The ion generator of claim 17 , further comprising:

a first driving mechanism coupled to the repeller and configured to move the repeller with respect to the arc chamber housing.

19 . A method for operating an ion generator of an ion implanter, the method comprising:

measuring a consumption depth of a cathode and a consumption depth of a repeller;

determining, based on the consumption depth of the cathode and the consumption depth of the repeller, at least one of a displacement of the repeller and a displacement of the cathode; and

moving at least one of the cathode and the repeller in accordance with the at least one of the displacement of the repeller and the displacement of the cathode.

20 . The method of claim 19 , wherein the displacement of the cathode is zero, and the displacement of the repeller is a sum of the consumption depth of the cathode and the consumption depth of the repeller.