IP Library Granted Patent US 12683118
Granted Patent B2
US 12683118 · App. 18/220,931 · Granted Jul 14, 2026

Scanning electron microscopy-based sample analysis

Inventors: Maximilian Alexander Moser (Vienna, AT); Gregor Bernhard Pobegen (Villach, AT); Michael Nelhiebel (Villach, AT)
Assignee: Infineon Technologies AG
H01J37/28H01J37/265H01J2237/2801H01J2237/2802
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Quick Facts
Patent No.
US 12683118
App. No.
18/220,931
Granted
Jul 14, 2026
Kind
B2
Abstract

A method of determining sample information associated with a sample is provided. In an embodiment, when a sample has a first temperature, a first measure of electrons of the sample is determined. When the sample has a second temperature different than the first temperature, a second measure of electrons of the sample is determined. Sample information associated with the sample is determined based upon the first measure of electrons and the second measure of electrons. The sample information includes a dopant concentration of the sample, a measure of electric field strength of the sample, a defect concentration of the sample, a Fermi level of the sample and/or an indication of a space charge region of the sample.

Claims (40)

1 . A method comprising:

performing, when a sample has a first temperature, a first scanning electron microscopy (SEM) process on the sample to generate a first SEM map;

performing, when the sample has a second temperature different than the first temperature, a second SEM process on the sample to generate a second SEM map; and

generating, based upon the first SEM map and the second SEM map, a dopant distribution map indicative of a first dopant concentration in a first region of the sample and a second dopant concentration in a second region of the sample.

2 . The method of claim 1 , wherein:

the sample comprises a filled electron valence band.

3 . The method of claim 1 , wherein:

performing the first SEM process comprises:

emitting a first electron beam to the sample when the sample has the first temperature;

detecting first electrons emitted from the sample via interactions of electrons of the first electron beam with the sample;

determining a first measure of electrons based upon the first electrons; and

generating the first SEM map based upon the first measure of electrons; and

performing the second SEM process comprises:

emitting a second electron beam to the sample when the sample has the second temperature;

detecting second electrons emitted from the sample via interactions of electrons of the second electron beam with the sample;

determining a second measure of electrons based upon the second electrons; and

generating the second SEM map based upon the second measure of electrons.

4 . The method of claim 3 , wherein:

the first measure of electrons comprises a first measure of secondary electrons emitted from the sample; and

the second measure of electrons comprises a second measure of secondary electrons emitted from the sample.

5 . The method of claim 1 , wherein:

performing the first SEM process comprises performing the first SEM process using a first scanning electron microscope; and

performing the second SEM process comprises performing the second SEM process using the first scanning electron microscope.

6 . The method of claim 1 , wherein:

the first SEM map is indicative of a first measure of electrons relative to the first region of the sample;

the second SEM map is indicative of a second measure of electrons relative to the first region of the sample; and

generating the dopant distribution map comprises:

determining, based upon the first measure of electrons, a first difference between a first Fermi level associated with the sample and a first valence band energy level associated with the sample;

determining, based upon the second measure of electrons, a second difference between a second Fermi level associated with the sample and a second valence band energy level associated with the sample; and

determining the first dopant concentration in the first region based upon the first difference and the second difference.

7 . The method of claim 1 , comprising:

at least one of prior to or during the first SEM process, heating the sample.

8 . The method of claim 7 , wherein:

the sample is supported by a sample stage of a scanning electron microscope used to perform the first SEM process; and

heating the sample comprises directing thermal energy, to the sample, via the sample stage.

9 . The method of claim 1 , wherein:

a difference between the first temperature and the second temperature is at least 10° Celsius.

10 . The method of claim 1 , comprising:

applying a first bias to the sample during the first SEM process; and

applying a second bias to the sample during the second SEM process.