IP Library Granted Patent US 12683572
Granted Patent B2
US 12683572 · App. 18/204,979 · Granted Jul 14, 2026

Acoustic wave device

Inventor: Minefumi Ouchi (Nagaokakyo, JP)
Assignee: MURATA MANUFACTURING CO., LTD.
H03H9/02157H03H9/02228H03H9/132H03H9/205
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Quick Facts
Patent No.
US 12683572
App. No.
18/204,979
Granted
Jul 14, 2026
Kind
B2
Abstract

An acoustic wave device includes a support substrate, a piezoelectric layer, an energy confining layer, a first resonator, and a second resonator. The piezoelectric layer includes a first principal surface and includes lithium niobate or lithium tantalate. The energy confining layer is provided between the support substrate and the piezoelectric layer. Each of the first resonator and the second resonator includes at least one pair of a first electrode and a second electrode provided to the first principal surface of the piezoelectric layer. The first resonator is structured to generate a thickness-shear mode bulk wave, and the second resonator is structured to generate a wave other than a thickness-shear mode bulk wave.

Claims (60)

1 . An acoustic wave device comprising:

a support substrate;

a piezoelectric layer including a principal surface extending in a first direction and including lithium niobate or lithium tantalate, the first direction being a thickness direction of the support substrate;

an energy confining layer between the support substrate and the piezoelectric layer in the first direction; and

a first resonator and a second resonator provided to the support substrate and each including at least one pair of a first electrode and a second electrode; wherein

the first resonator is structured to generate a thickness-shear mode bulk wave;

the second resonator is structured to generate a wave other than a thickness-shear mode bulk wave;

the piezoelectric layer includes rotated Y-cut lithium niobate; and

an angle between a direction orthogonal or substantially orthogonal to a longitudinal direction of the first electrode or the second electrode of the first resonator and a direction orthogonal or substantially orthogonal to a longitudinal direction of the first electrode or the second electrode of the second resonator is about 90°±10°.

2 . The acoustic wave device according to claim 1 , wherein

the second resonator is structured to generate a plate wave.

3 . The acoustic wave device according to claim 1 , wherein the energy confining layer includes a hollow portion.

4 . The acoustic wave device according to claim 1 , wherein the energy confining layer includes an acoustic reflection layer including a low acoustic impedance layer and a high acoustic impedance layer laminated to the low acoustic impedance layer.

5 . The acoustic wave device according to claim 4 , wherein

in the first resonator, a layer in the acoustic reflection layer closest to the piezoelectric layer in the first direction is the low acoustic impedance layer; and

the low acoustic impedance layer includes a hollow portion.

6 . The acoustic wave device according to claim 4 , wherein in the second resonator, the acoustic reflection layer does not include a hollow portion.

7 . The acoustic wave device according to claim 1 , wherein the energy confining layer is a multilayer body including a low acoustic velocity layer and a high acoustic velocity layer.

8 . The acoustic wave device according to claim 3 , wherein a hole extends through the piezoelectric layer in the first direction.

9 . The acoustic wave device according to claim 1 , wherein assuming that a film thickness of the piezoelectric layer is d and a center-to-center spacing distance between the first electrode and the second electrode adjacent to each other is p, d/p is about 0.24 or smaller.

10 . The acoustic wave device according to claim 1 , wherein

assuming that an overlapping range of the first electrode and the second electrode adjacent to each other when seen in an opposing direction of the first electrode and the second electrode is an excitation range and a metallization ratio of a plurality of first electrodes and second electrodes with respect to the excitation range is MR, MR≤about 1.75(d/p)+0.075 is satisfied, each of the plurality of first electrodes and second electrodes being the first electrode and the second electrode.

11 . An acoustic wave device comprising:

a support substrate;

a piezoelectric layer including a principal surface extending in a first direction and including lithium niobate or lithium tantalate, the first direction being a thickness direction of the support substrate;

an energy confining layer between the support substrate and the piezoelectric layer in the first direction; and

a first resonator and a second resonator provided to the support substrate and each including at least one pair of a first electrode and a second electrode; wherein

the first resonator is structured to generate a thickness-shear mode bulk wave;

the second resonator is structured to generate a wave other than a thickness-shear mode bulk wave; and

Euler angles (φ, θ, ψ) of the lithium niobate or the lithium tantalate of the piezoelectric layer are within a range expressed by Formula (1), Formula (2), or Formula (3):

(0°±10°, 0° to 20°, any ψ)  (1)

(0°±10°, 20° to 80°, 0° to 60° (1−(θ−50) 2 /900) 1/2 ) or (0°±10°, 20° to 80°, [180°−60° (1−(θ−50) 2 /900) 1/2 ] to 180°)  (2)

(0°±10°, [180°−30° (1−(ψ−90) 2 /8100) 1/2 ] to 180°, any ψ)  (3).

12 . An acoustic wave device comprising:

a support substrate;

a piezoelectric layer including a principal surface extending in a first direction and including lithium niobate or lithium tantalate, the first direction being a thickness direction of the support substrate;

an energy confining layer between the support substrate and the piezoelectric layer in the first direction; and

a first resonator and a second resonator each including at least one pair of a first electrode and a second electrode provided to the principal surface of the piezoelectric layer; wherein

assuming that a film thickness of the piezoelectric layer is d and a center-to-center spacing distance between the first electrode and the second electrode adjacent to each other is p, d/p of the first resonator is about 0.5 or smaller;

d/p of the second resonator is larger than about 0.5;

the piezoelectric layer includes rotated Y-cut lithium niobate; and

an angle between a direction orthogonal or substantially orthogonal to a longitudinal direction of the first electrode or the second electrode of the first resonator and a direction orthogonal or substantially orthogonal to a longitudinal direction of the first electrode or the second electrode of the second resonator is about 90°±10°.

13 . The acoustic wave device according to claim 12 , wherein

assuming that an overlapping range of the first electrode and the second electrode adjacent to each other when seen in an opposing direction of the first electrode and the second electrode is an excitation range and a metallization ratio of a plurality of first electrodes and second electrodes with respect to the excitation range is MR, MR≤about 1.75(d/p)+0.075 is satisfied, each of the plurality of first electrodes and second electrodes being the first electrode and the second electrode.

14 . The acoustic wave device according to claim 12 , wherein

the second resonator is structured to generate a plate wave.

15 . The acoustic wave device according to claim 12 , wherein the energy confining layer includes a hollow portion.

16 . The acoustic wave device according to claim 12 , wherein the energy confining layer includes an acoustic reflection layer including a low acoustic impedance layer and a high acoustic impedance layer laminated to the low acoustic impedance layer.

17 . The acoustic wave device according to claim 16 , wherein

in the first resonator, a layer in the acoustic reflection layer closest to the piezoelectric layer in the first direction is the low acoustic impedance layer; and

the low acoustic impedance layer includes a hollow portion.

18 . The acoustic wave device according to claim 16 , wherein in the second resonator, the acoustic reflection layer does not include a hollow portion.

19 . The acoustic wave device according to claim 12 , wherein the energy confining layer is a multilayer body including a low acoustic velocity layer and a high acoustic velocity layer.

20 . The acoustic wave device according to claim 15 , wherein a hole extends through the piezoelectric layer in the first direction.

21 . The acoustic wave device according to claim 12 , wherein assuming that a film thickness of the piezoelectric layer is d and a center-to-center spacing distance between the first electrode and the second electrode adjacent to each other is p, d/p is about 0.24 or smaller.

22 . The acoustic wave device according to claim 12 , wherein

Euler angles (φ, θ, ψ) of the lithium niobate or the lithium tantalate of the piezoelectric layer are within a range expressed by Formula (1), Formula (2), or Formula (3):

(0°±10°, 0° to 20°, any ψ)  (1)

(0°±10°, 20° to 80°, 0° to 60° (1−(θ−50) 2 /900) 1/2 ) or (0°±10°, 20° to 80°, [180°−60° (1−(θ−50) 2 /900) 1/2 ] to 180°)  (2)

(0°±10°, [180°−30° (1−(ψ−90) 2 /8100) 1/2 ] to 180°, any ψ)  (3).