IP Library Granted Patent US 12684686
Granted Patent B2
US 12684686 · App. 18/307,131 · Granted Jul 14, 2026

Wiring substrate

Inventors: Masataka Kato (Ogaki, JP); Shunsuke Sakai (Ogaki, JP); Masahide Tawatari (Ogaki, JP); Kosuke Ikeda (Ogaki, JP)
Assignee: IBIDEN CO., LTD.
H05K1/0271H05K1/113H05K3/4673H05K1/181
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Quick Facts
Patent No.
US 12684686
App. No.
18/307,131
Granted
Jul 14, 2026
Kind
B2
Abstract

A wiring substrate includes a core substrate, a build-up part formed on a surface of the substrate and including insulating layers and conductor layers, and a covering insulating layer formed on the build-up part such that the covering layer is covering the outermost surface of the build-up part. The build-up part is formed such that the insulating layers include a first insulating layer forming the outermost one of the insulating layers, that the conductor layers include a first conductor layer formed on the first insulating layer and including a first conductor pad, and that a tensile strength of the first insulating layer is higher than a tensile strength of each insulating layer other than the first insulating layer in the first build-up part, and the covering layer is formed such that the covering layer has opening entirely exposing an upper surface and a side surface of the first conductor pad.

Claims (26)

1 . A wiring substrate, comprising:

a core substrate;

a first build-up part formed on a first surface of the core substrate and comprising a plurality of insulating layers and a plurality of conductor layers;

a second build-up part formed on a second surface of the core substrate on an opposite side with respect to the first surface of the core substrate and comprising a conductor layer;

a first covering insulating layer formed on the first build-up part such that the first covering insulating layer is covering an outermost surface of the first build-up part; and

a second covering insulating layer formed on the second build-up part such that the second covering insulating layer is covering an outermost surface of the second build-up part,

wherein the first build-up part is formed such that the plurality of insulating layers includes a first insulating layer forming an outermost one of the insulating layers, that the plurality of conductor layers is laminated on the insulating layers respectively and includes a first conductor layer formed on the first insulating layer and including a plurality of first conductor pads, and that a tensile strength of the first insulating layer is higher than a tensile strength of each of the insulating layers other than the first insulating layer in the first build-up part, the first covering insulating layer is formed such that the first covering insulating layer has a plurality of openings entirely exposing upper surfaces and side surfaces of the first conductor pads, respectively, and the second covering insulating layer has a plurality of openings exposing portions of the conductor layer in the second build-up part respectively such that the openings of the second covering insulating layer define a plurality of second conductor pads, respectively.

2 . The wiring substrate according to claim 1 , wherein the first build-up part is formed such that each of the first conductor pads of the first conductor layer is not directly connected to another pad in the first conductor layer or a wiring in the first conductor layer.

3 . The wiring substrate according to claim 1 , wherein the first build-up part is formed such that the tensile strength of the first insulating layer is 125 MPa or greater.

4 . The wiring substrate according to claim 1 , wherein the first build-up part is formed such that the first insulating layer has a dielectric loss tangent of 0.013 or less at a frequency of 5.8 GHz.

5 . The wiring substrate according to claim 1 , wherein the second build-up part is formed such that the second build-up part includes a plurality of insulating layers and that a number of the insulating layers in the second build-up part is equal to a number of the insulating layers in the first build-up part.

6 . The wiring substrate according to claim 5 , wherein the second build-up part is formed such that the first insulating layer in the first build-up part and the outermost insulating layer in the second build-up part are formed of a same material.

7 . The wiring substrate according to claim 1 , wherein the first build-up part is formed such that the plurality of conductor layers includes a second conductor layer formed on an opposite side with respect to the first conductor layer via the first insulating layer and that the first build-up part includes a plurality of via conductors penetrating through the first insulating layer and connecting the second conductor layer and the first conductor pads of the first conductor layer, respectively.

8 . The wiring substrate according to claim 2 , wherein the first build-up part is formed such that the tensile strength of the first insulating layer is 125 MPa or greater.

9 . The wiring substrate according to claim 2 , wherein the first build-up part is formed such that the first insulating layer has a dielectric loss tangent of 0.013 or less at a frequency of 5.8 GHz.

10 . The wiring substrate according to claim 2 , wherein the second build-up part is formed such that the second build-up part includes a plurality of insulating layers and that a number of the insulating layers in the second build-up part is equal to a number of the insulating layers in the first build-up part.

11 . The wiring substrate according to claim 10 , wherein the second build-up part is formed such that the first insulating layer in the first build-up part and the outermost insulating layer in the second build-up part are formed of a same material.

12 . The wiring substrate according to claim 2 , wherein the first build-up part is formed such that the plurality of conductor layers includes a second conductor layer formed on an opposite side with respect to the first conductor layer via the first insulating layer and that the first build-up part includes a plurality of via conductors penetrating through the first insulating layer and connecting the second conductor layer and the first conductor pads of the first conductor layer, respectively.

13 . The wiring substrate according to claim 3 , wherein the first build-up part is formed such that the first insulating layer has a dielectric loss tangent of 0.013 or less at a frequency of 5.8 GHz.

14 . The wiring substrate according to claim 3 , wherein the second build-up part is formed such that the second build-up part includes a plurality of insulating layers and that a number of the insulating layers in the second build-up part is equal to a number of the insulating layers in the first build-up part.

15 . The wiring substrate according to claim 14 , wherein the second build-up part is formed such that the first insulating layer in the first build-up part and the outermost insulating layer in the second build-up part are formed of a same material.

16 . The wiring substrate according to claim 3 , wherein the first build-up part is formed such that the plurality of conductor layers includes a second conductor layer formed on an opposite side with respect to the first conductor layer via the first insulating layer and that the first build-up part includes a plurality of via conductors penetrating through the first insulating layer and connecting the second conductor layer and the first conductor pads of the first conductor layer, respectively.

17 . The wiring substrate according to claim 4 , wherein the second build-up part is formed such that the second build-up part includes a plurality of insulating layers and that a number of the insulating layers in the second build-up part is equal to a number of the insulating layers in the first build-up part.

18 . The wiring substrate according to claim 17 , wherein the second build-up part is formed such that the first insulating layer in the first build-up part and the outermost insulating layer in the second build-up part are formed of a same material.

19 . The wiring substrate according to claim 4 , wherein the first build-up part is formed such that the plurality of conductor layers includes a second conductor layer formed on an opposite side with respect to the first conductor layer via the first insulating layer and that the first build-up part includes a plurality of via conductors penetrating through the first insulating layer and connecting the second conductor layer and the first conductor pads of the first conductor layer, respectively.

20 . The wiring substrate according to claim 5 , wherein the first build-up part is formed such that the plurality of conductor layers includes a second conductor layer formed on an opposite side with respect to the first conductor layer via the first insulating layer and that the first build-up part includes a plurality of via conductors penetrating through the first insulating layer and connecting the second conductor layer and the first conductor pads of the first conductor layer, respectively.