IP Library Granted Patent US 12685074
Granted Patent B2
US 12685074 · App. 18/587,724 · Granted Jul 14, 2026

Apparatus, systems, and methods of measuring edge ring distance for thermal processing chambers

Inventors: Ole Luckner (Dresden, DE); Wolfgang R. Aderhold (Cupertino, CA)
Assignee: Applied Materials, Inc.
H10P72/0606G01B11/026G01J5/02H05B3/0047H10P72/0436H10P72/0602H10P72/7606
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Quick Facts
Patent No.
US 12685074
App. No.
18/587,724
Granted
Jul 14, 2026
Kind
B2
Abstract

Aspects of the present disclosure relate to apparatus, systems, and methods of measuring edge ring distance for thermal processing chambers. In one example, the distance measured is used to determine a center position shift of the edge ring.

Claims (62)

1 . A thermal processing chamber, comprising:

a chamber body comprising a sidewall and a processing volume;

a rotor disposed in the processing volume of the chamber body;

an edge ring supported on the rotor, the edge ring including a radial outer surface facing the sidewall;

a plurality of lamps; and

a controller including a non-transitory computer-readable medium comprising instructions that, when executed, cause the thermal processing chamber to:

heat a first substrate disposed on the edge ring using the plurality of lamps;

cause a first distance sensor mounted to the sidewall to:

emit a first signal towards a radial outer surface of the edge ring such that the first signal reflects off the radial outer surface of the edge ring to become a first reflected signal; and

receive the first reflected signal;

cause a second distance sensor to:

emit a second signal towards the radial outer surface of the edge ring such that the second signal reflects off the radial outer surface to become a second reflected signal; and

receive the second reflected signal;

determine a first distance between the first distance sensor and the radial outer surface of the edge ring using the first reflected signal;

determine a second distance between the second distance sensor and the radial outer surface of the edge ring using the second reflected signal;

perform repeat determinations of the first and second distances while rotating the edge ring;

determine a center position shift of the edge ring based on the repeat determinations of the first distance and the second distance;

determine a corrected landing position using the center position shift; and

instruct a robot to align a second substrate with the corrected landing position.

2 . The thermal processing chamber of claim 1 , wherein the first distance sensor and the second distance sensor are disposed at least 45 degrees angularly apart relative to the edge ring.

3 . The thermal processing chamber of claim 1 , wherein the instructions cause the thermal processing chamber to rotate the edge ring at least 180 degrees while performing the repeat determinations of the first and second distances.

4 . The thermal processing chamber of claim 1 , wherein the second substrate is different from the first substrate.

5 . The thermal processing chamber of claim 1 , wherein the instructions cause the thermal processing chamber to perform the repeat determinations of the first and second distances during or after removal of the first substrate from the processing volume.

6 . The thermal processing chamber of claim 5 , wherein the instructions cause the thermal processing chamber to perform the repeat determinations of the first and second distances before moving the second substrate into the chamber.

7 . The thermal processing chamber of claim 5 , wherein the instructions cause the thermal processing chamber to perform the repeat determinations of the first and second distances before transferring the second substrate from a robot blade to lift pins in the chamber.

8 . A non-transitory computer-readable medium comprising instructions that, when executed, cause a thermal processing chamber system to:

heat a first substrate disposed on an edge ring disposed in a processing volume of a chamber body using a plurality of lamps;

cause a first distance sensor mounted to a sidewall of the chamber body to:

emit a first signal towards a radial outer surface of the edge ring such that the first signal reflects off the radial outer surface of the edge ring to become a first reflected signal; and

receive the first reflected signal;

cause a second distance sensor to:

emit a second signal towards the radial outer surface of the edge ring such that the second signal reflects off the radial outer surface to become a second reflected signal; and

receive the second reflected signal;

determine a first distance between the first distance sensor and the radial outer surface of the edge ring using the first reflected signal;

determine a second distance between the second distance sensor and the radial outer surface of the edge ring using the second reflected signal;

perform repeat determinations of the first and second distances while rotating the edge ring;

determine a center position shift of the edge ring based on the repeat determinations of the first distance and the second distance;

determine a corrected landing position using the center position shift; and

instruct a robot to align a second substrate with the corrected landing position.

9 . The non-transitory computer-readable medium of claim 8 , wherein the instructions cause the thermal processing chamber system to rotate the edge ring at least 180 degrees while performing the repeat determinations of the first and second distances.

10 . The non-transitory computer-readable medium of claim 8 , wherein the second substrate is different from the first substrate.

11 . The non-transitory computer-readable medium of claim 8 , wherein the instructions cause the thermal processing chamber system to perform the repeat determinations of the first and second distances during or after removal of the first substrate from the processing volume.

12 . The non-transitory computer-readable medium of claim 11 , wherein the instructions cause the thermal processing chamber system to perform the repeat determinations of the first and second distances before moving the second substrate into the chamber body.

13 . The non-transitory computer-readable medium of claim 11 , wherein the instructions cause the thermal processing chamber system to perform the repeat determinations of the first and second distances before transferring the second substrate from a robot blade to lift pins in the chamber body.

14 . A non-transitory computer-readable medium comprising instructions that, when executed, cause a thermal processing chamber system to:

determine a first distance between a first distance sensor and a radial outer surface of an edge ring while the edge ring is disposed at a predetermined position in a processing volume of a chamber body;

determine a second distance between a second distance sensor and the radial outer surface of the edge ring while the edge ring is disposed at the predetermined position;

perform a processing operation on a first substrate disposed on the edge ring;

perform repeat determinations of the first and second distances after performing the processing operation on the first substrate;

determine a shift of the edge ring from the predetermined position based on the repeat determinations of the first distance and the second distance;

determine a corrected landing position using the shift of the edge ring; and

instruct a robot to align a second substrate with the corrected landing position.

15 . The non-transitory computer-readable medium of claim 14 , wherein the instructions cause the thermal processing chamber system to rotate the edge ring at least 180 degrees while performing the repeat determinations of the first and second distances.

16 . The non-transitory computer-readable medium of claim 14 , wherein the instructions cause the thermal processing chamber system to perform the repeat determinations of the first and second distances during or after removal of the first substrate from the processing volume.

17 . The non-transitory computer-readable medium of claim 14 , wherein the instructions cause the thermal processing chamber system to:

determine a third distance between a third distance sensor and the radial outer surface of the edge ring while the edge ring is disposed at the predetermined position;

perform repeat determinations of the third distance after performing the processing operation on the first substrate; and

determine the shift of the edge ring from the predetermined position based on the repeat determinations of the third distance.

18 . The non-transitory computer-readable medium of claim 17 , wherein the instructions cause the thermal processing chamber system to:

determine a fourth distance between a fourth distance sensor and the radial outer surface of the edge ring while the edge ring is disposed at the predetermined position;

perform repeat determinations of the fourth distance after performing the processing operation on the first substrate; and

determine the shift of the edge ring from the predetermined position based on the repeat determinations of the fourth distance.