IP Library Granted Patent US 12685206
Granted Patent B2
US 12685206 · App. 18/275,177 · Granted Jul 14, 2026

AI bonding wire for semiconductor devices

Inventors: Yuya Suto (Tokyo, JP); Tomohiro Uno (Tokyo, JP); Tetsuya Oyamada (Tokyo, JP); Daizo Oda (Saitama, JP); Motoki Eto (Saitama, JP); Yuto Kurihara (Saitama, JP)
Assignees: Nippon Micrometal Corporation; NIPPON STEEL Chemical & Material Co., Ltd.
H10W72/50B23K20/004B23K35/286H10W72/015H10W72/01565H10W72/5524
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Quick Facts
Patent No.
US 12685206
App. No.
18/275,177
Granted
Jul 14, 2026
Kind
B2
Abstract

To provide an Al bonding wire exhibiting a favorable high-temperature and high-humidity service life in a high-temperature and high-humidity environment required for next-generation vehicle-mounted power devices. The Al bonding wire for semiconductor devices containing equal to or larger than 3 mass ppm and equal to or smaller than 500 mass ppm of one or more of Pd and Pt in total, in which, as a result of measuring a crystal orientation on a cross section parallel to a wire axis direction including a wire axis of the bonding wire, an orientation ratio of a <100> crystal orientation angled at 15 degrees or less to the wire axis direction is equal to or higher than 30% and equal to or lower than 90%.

Claims (9)

1 . An Al bonding wire for semiconductor devices containing equal to or larger than 3 mass ppm and equal to or smaller than 500 mass ppm of one or more of Pd and Pt in total, wherein, as a result of measuring a crystal orientation on a cross-section parallel to a wire axis direction including a wire axis of the bonding wire, an orientation ratio of a <100> crystal orientation angled at 15 degrees or less to the wire axis direction is equal to or higher than 30% and equal to or lower than 90%.

2 . The Al bonding wire for semiconductor devices according to claim 1 , wherein a tensile strength is equal to or larger than 25 MPa and equal to or smaller than 85 MPa.

3 . The Al bonding wire for semiconductor devices according to claim 1 , further containing equal to or larger than 3 mass ppm and equal to or smaller than 10000 mass ppm of one or more of Si, Au, and Ag in total.

4 . The Al bonding wire for semiconductor devices according to claim 1 , further containing equal to or larger than 3 mass ppm and equal to or smaller than 700 mass ppm of one or more of Fe and Mg in total.

5 . The Al bonding wire for semiconductor devices according to claim 1 , wherein a content of Al is equal to or larger than 98% by mass.

6 . The Al bonding wire for semiconductor devices according to claim 1 , wherein a balance of the Al bonding wire comprises Al and inevitable impurities.

7 . A semiconductor device comprising the Al bonding wire for semiconductor devices according to claim 1 .

8 . The Al bonding wire for semiconductor devices according to claim 1 , wherein the Al bonding wire contains both Pd and Pt, and a total amount of Pd and Pt in the Al bonding wire is equal to or larger than 3 mass ppm and equal to or smaller than 500 mass ppm.

9 . The Al bonding wire for semiconductor devices according to claim 3 , wherein the Al bonding wire contains at least Au.