Chemical mechanical polisher cleaning unit
A rotating substrate support for use in a substrate processing system includes a cylindrical shaped outer hub having a first end, a second end, a wall that extends from the first end to the second end, and a central opening formed through the wall. The wall includes an inner surface, an outer surface, and a flexible region. A circumferential groove is formed in the outer surface of the wall and within the flexible region and includes a gap that extends in a first direction. The inner surface of the wall defines at least a portion of an inner region of the cylindrical shaped outer hub. A first support plate is coupled to a first portion of the inner surface, and a second support plate coupled to a second portion of the inner surface. An expandable actuator is configured to change a size of the gap by adjusting a distance in the first direction between the second support plate and the first support plate.
1 . A rotating substrate support for use in a substrate processing system, the substrate support comprising:
a cylindrical shaped outer hub comprising a first end, a second end, a wall that extends from the first end to the second end, a central opening formed through the wall at the first end and the second end, and a central axis extending through a center of the central opening, wherein
the wall comprises an inner surface, an outer surface, and a flexible region,
a circumferential groove formed in the outer surface of the wall and within the flexible region, wherein the circumferential groove comprises a gap that extends in a first direction, and
the inner surface of the wall forms at least a portion of an inner region of the cylindrical shaped outer hub;
a first support plate coupled to a first portion of the inner surface of the wall;
a second support plate coupled to a second portion of the inner surface of the wall; and
an expandable actuator, wherein the expandable actuator is configured to change a size of the gap of the circumferential groove by adjusting a distance in the first direction between the second support plate and the first support plate.
2 . The rotating substrate support of claim 1 , further comprising a center disk disposed within the inner region, wherein the center disk comprises a center that is disposed on the central axis.
3 . The rotating substrate support of claim 2 , wherein the expandable actuator comprises:
a first pair of bellows having a first end and a second end, wherein the first end of the is coupled to the first support plate and the second end of the first pair is coupled to a first side of the center disk; and
a first internal bellows region formed between the first pair of bellows.
4 . The rotating substrate support of claim 3 , wherein the expandable actuator further comprises:
a second pair of bellows having a first end and a second end, wherein the first end of the second pair is coupled to the second support plate and the second end of the second pair is coupled to a second side of the center disk; and
a second internal bellows region formed between the second pair of bellows.
5 . The rotating substrate support of claim 4 , wherein the first internal bellows region is in fluid communication with the second internal bellows region.
6 . The rotating substrate support of claim 2 , further comprising a fluid delivery port formed in the center disk, wherein the fluid delivery port is in fluid communication with the expandable actuator and is configured to allow a fluid to pass therethrough to allow a pressure to be altered within the expandable actuator.
7 . The rotating substrate support of claim 6 , wherein altering the pressure within the expandable actuator changes the distance in the first direction between the second support plate and the first support plate.