IP Library Granted Patent US 12686642
Granted Patent B2
US 12686642 · App. 18/199,627 · Granted Jul 21, 2026

Silicon composition and methods of forming the same while forming a silicon doped carbon-based nanomaterial

Inventors: Evan Johnson (Spring, TX); Paul Yollin (Tomball, TX); Dylan Cook (Spring, TX)
Assignee: NABORS ENERGY TRANSITION SOLUTIONS LLC
C04B35/52C04B2235/422C04B2235/428C04B2235/95
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Quick Facts
Patent No.
US 12686642
App. No.
18/199,627
Granted
Jul 21, 2026
Kind
B2
Abstract

The present disclosure relates to a silicon composition that may be formed from a gas mixture and a silicon precursor component. The gas mixture may include a carbon based gas, an oxygen gas, and a hydrogen gas. The silicon composition may include a pure silicon component and a carbon-based nanomaterial composition component. The carbon-based nanomaterial composition component may include silicon doped nanospheres.

Claims (30)

1 . A silicon composition formed from a forming mixture comprising a gas mixture and a silicon dioxide precursor component,

wherein the gas mixture comprises a carbon based gas, an oxygen gas, and a hydrogen gas,

wherein the silicon composition comprises a pure silicon component and a carbon-based nanomaterial composition component, and

wherein the carbon-based nanomaterial composition component comprises silicon doped nanospheres.

2 . The silicon composition of claim 1 , wherein the carbon-based nanomaterial composition component comprises silicon-doped nanospheres, and wherein the silicon doped nanospheres have an average diameter of at least about 5 nm.

3 . The silicon composition of claim 1 , wherein the silicon doped nanospheres have an average diameter of not greater than about 500 nm.

4 . The silicon composition of claim 1 , wherein the silicon composition comprises a pure silicon content of at least about 30% based on elemental analysis of the silicon composition.

5 . The silicon composition of claim 1 , wherein the silicon composition comprises a pure silicon content of not greater than about 70% based on elemental analysis of the silicon composition.

6 . The silicon composition of claim 1 , wherein the silicon composition comprises a carbon content of at least about 25% based on elemental analysis of the silicon composition.

7 . The silicon composition of claim 1 , wherein the silicon composition comprises a carbon content of not greater than about 70% based on elemental analysis of the silicon composition.

8 . The silicon composition of claim 1 , wherein the silicon composition comprises an oxygen content of at least about 1% based on elemental analysis of the silicon composition.

9 . The silicon composition of claim 1 , wherein the silicon composition comprises an oxygen content of not greater than about 35% based on elemental analysis of the silicon composition.

10 . The silicon composition of claim 1 , wherein the carbon-based nanomaterial composition component comprises a carbon hybridization ratio P sp3 /P sp2 of at least about 0.0, where P sp3 is the percent of carbon within the carbon-based nanomaterial composition component having a sp3 hybridization and P sp2 is the percent of carbon within the carbon-based nanomaterial composition component having a sp2 hybridization.

11 . The silicon composition of claim 1 , wherein the carbon-based nanomaterial composition component has a carbon hybridization ratio P sp3 /P sp2 of not greater than about 5.0, where P sp3 is the percent of carbon within the carbon-based nanomaterial composition component having a sp3 hybridization and P sp2 is the percent of carbon within the carbon-based nanomaterial composition component having a sp2 hybridization.

12 . The silicon composition of claim 1 , wherein the carbon-based nanomaterial composition component comprises a D/G ratio of not greater than about 0.1.

13 . The silicon composition of claim 1 , wherein the carbon-based nanomaterial composition component comprises a D/G ratio of at least about 2.0.

14 . A method of forming a silicon composition, wherein the method comprises:

supplying a forming mixture comprising a gas mixture and a silicon precursor component, wherein the gas mixture comprises a carbon based gas, an oxygen gas, and a hydrogen gas,

igniting the gas mixture to form the silicon composition,

wherein the silicon composition comprises a pure silicon component and a carbon-based nanomaterial composition component, and

wherein the carbon-based nanomaterial composition component comprises silicon doped nanospheres.

15 . A silicon composition comprising a pure silicon component and a carbon-based nanomaterial composition component, wherein the carbon-based nanomaterial composition component comprises silicon doped nanospheres, and wherein the silicon composition further comprises:

a carbon content of at least about 25% and not greater than about 70% based on elemental analysis of the silicon composition,

an oxygen content of at least about 1% and not greater than about 35% based on elemental analysis of the silicon composition, and

a pure silicon content of at least about 30% and not greater than 70%.

16 . The silicon composition of claim 15 , wherein the carbon-based nanomaterial composition component comprises silicon-doped nanospheres, and wherein the silicon doped nanospheres have an average diameter of at least about 5 nm.

17 . The silicon composition of claim 15 , wherein the silicon doped nanospheres have an average diameter of not greater than about 500 nm.

18 . The silicon composition of claim 15 , wherein the silicon composition comprises a pure silicon content of at least about 30% based on elemental analysis of the silicon composition.

19 . The silicon composition of claim 15 , wherein the silicon composition comprises a pure silicon content of not greater than about 70% based on elemental analysis of the silicon composition.

20 . The silicon composition of claim 15 , wherein the silicon composition comprises a carbon content of at least about 25% based on elemental analysis of the silicon composition.