Detection chip and manufacturing method therefor, and reaction system

1 . A detection chip, comprising:

a first substrate;

a microcavity defining layer, arranged on the first substrate and defining a plurality of micro-reaction chambers; and

a shading structure layer, arranged on the first substrate and disposed among the plurality of micro-reaction chambers;

wherein the microcavity defining layer comprises an interval portion arranged among the plurality of micro-reaction chambers;

the interval portion comprises a groove disposed around the plurality of micro-reaction chambers;

the shading structure layer comprises a first portion disposed in the groove;

the groove is a through groove penetrating through the interval portion; and

the first portion disposed in the groove penetrates through the interval portion.

2 . The detection chip according to claim 1 , wherein a cross section of the groove gradually becomes smaller along a direction toward the first substrate.

3 . The detection chip according to claim 1 , wherein the microcavity defining layer comprises an interval portion arranged among the plurality of micro-reaction chambers; and

the shading structure layer comprises a second portion covering the interval portion.

4 . The detection chip according to claim 3 , wherein an orthographic projection of the second portion on the first substrate coincides with an orthographic projection of a side surface, facing away from the first substrate, of the interval portion on the first substrate.

5 . The detection chip according to claim 3 , further comprising a hydrophilic layer;

wherein the hydrophilic layer covers inner walls of the plurality of micro-reaction chambers and the shading structure layer.

6 . The detection chip according to claim 3 , wherein a material of the microcavity defining layer comprises a photoresist.

7 . The detection chip according to claim 3 , wherein a material of the shading structure layer comprises a black matrix material.

8 . The detection chip according to claim 3 , further comprising a heating electrode;

wherein the heating electrode is arranged on the first substrate and between the microcavity defining layer and the first substrate, and is configured to heat the plurality of micro-reaction chambers; and

orthographic projections of the plurality of micro-reaction chambers on the first substrate are arranged within an orthographic projection of the heating electrode on the first substrate.

9 . The detection chip according to claim 8 , further comprising a control electrode and a first insulating layer;

wherein the control electrode is arranged on the first substrate, the first insulating layer covers the control electrode, and the heating electrode is arranged on the first insulating layer; and

the first insulating layer comprises a via hole penetrating through the first insulating layer, the control electrode and the heating electrode are electrically connected through the via hole, and the control electrode is configured to apply an electrical signal to the heating electrode.

10 . The detection chip according to claim 9 , further comprising a second insulating layer;

wherein the second insulating layer is arranged between the heating electrode and the microcavity defining layer.

11 . The detection chip according to claim 4 , further comprising:

a second substrate, disposed opposite to the first substrate; and

a hydrophobic layer, covering one side, facing the first substrate, of the second substrate;

wherein the microcavity defining layer and the shading structure layer are arranged on one side, facing the second substrate, of the first substrate.

12 . The detection chip according to claim 11 , wherein the first substrate and the second substrate are glass substrates.

13 . The detection chip according to claim 11 , wherein the first substrate comprises a reaction region and a peripheral region, and the peripheral region at least partially surrounds the reaction region; and

a size of the second substrate is smaller than that of the first substrate, and an orthographic projection of the second substrate on the first substrate covers the reaction region.

14 . The detection chip according to claim 13 , further comprising a plurality of spacers;

wherein the plurality of spacers are disposed at least in the peripheral region and between the first substrate and the second substrate.

15 . The detection chip according to claim 11 , further comprising at least one sample inlet and at least one sample outlet;

wherein the at least one sample inlet and the at least one sample outlet each penetrate through the second substrate and the hydrophobic layer.

16 . A reaction system, comprising the detection chip according to claim 1 .

17 . A manufacturing method for the detection chip according to claim 1 , comprising:

preparing the microcavity defining layer and the shading structure layer on the first substrate.

18 . The manufacturing method according to claim 17 , wherein the preparing the microcavity defining layer and the shading structure layer on the first substrate, specifically comprises:

preparing a photoresist material layer on the first substrate, wherein the photoresist material layer comprises a plurality of chamber portions for forming the plurality of micro-reaction chambers and an interval portion arranged among the plurality of chamber portions;

forming a pattern of a groove in the interval portion through a first patterning process, wherein the groove is arranged among the plurality of chamber portions and disposed around the plurality of chamber portions;

preparing a black matrix material layer on the photoresist material layer, wherein the black matrix material layer covers the photoresist material layer and fills the groove; and

etching the black matrix material layer and the photoresist material layer through a second patterning process, to enable the plurality of chamber portions of the photoresist material layer to form a pattern of the plurality of micro-reaction chambers, and complete patterning of the black matrix material layer and the photoresist material layer;

wherein the black matrix material layer comprises a first portion disposed in the groove and a second portion covering the interval portion of the photoresist material layer.