IP Library Granted Patent US 12,686,919
Granted Patent B2
US 12,686,919 · App. 17/669,372 · Granted Jul 21, 2026

Deposition machine exhaust gas pipeline and operation method thereof

Inventors: Jianping Cai (Shamen City, CN); Chih-Chien Huang (Tainan City, TW); Wen Yi Tan (Xiamen, CN)
Assignee: United Semiconductor (Xiamen) Co., Ltd.
C23C16/4412C23C16/4583
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Quick Facts
Patent No.
US 12,686,919
App. No.
17/669,372
Granted
Jul 21, 2026
Kind
B2
Abstract

The invention provides a deposition machine, which comprises a chamber, a first pipeline and a second pipeline, wherein one end of the first pipeline and one end of the second pipeline are connected to the chamber, and a part of the second pipeline passes through a sidewall of the first pipeline and extends into the interior of the first pipeline. The deposition machine has the advantages of reducing the risk of pipeline blockage.

Claims (8)

1 . A deposition machine, comprising:

a chamber; and

a first pipeline and a second pipeline, wherein one end of the first pipeline and a first end of the second pipeline are connected to the chamber, wherein a part of the second pipeline passes through a sidewall of the first pipeline and extends into the interior of the first pipeline, wherein the part of the second pipeline inside the first pipeline is defined as an extension part, wherein the extension part has a second end having a single opening, and wherein a diameter of the single opening is W 1 , a diameter of the middle part of the extension part is W 2 , and a diameter of the part of the second pipeline outside the first pipeline is W 3 , and W 2 >W 3 >W 1 .

2 . The deposition machine according to claim 1 , wherein a diameter of the first pipeline is larger than a diameter of the second pipeline.

3 . The deposition machine according to claim 1 , wherein the extension part includes a turning structure.

4 . The deposition machine according to claim 3 , wherein the other end of the first pipeline is connected with a pump.

5 . The deposition machine according to claim 4 , wherein one end of the extension part turn towards the pump.

6 . The deposition machine according to claim 1 , further comprising a wafer holder in the chamber, and the end of the second pipeline connecting the chamber is connected to the wafer holder.