Roll-to-roll processing
A system for roll-to-roll deposition is described wherein the system comprises a substrate transport system comprising a static elongated central cylinder for helical transport of a flexible substrate arranged around the cylinder, the cylinder comprising bearing structures arranged in or arranged on the surface of the cylinder for frictionless or low-friction transport of the flexible substrate over the surface of the central cylinder; and, one or more atomic layer deposition ALD deposition heads, an ALD deposition head being configured as a hollow cylinder, the inner surface of a processing head including deposition structures for depositing atomic layers onto the flexible substrate; wherein the inner radius of a deposition head is larger than the outer radius of the central cylinder, the one or more deposition heads being configured to rotate around the central cylinder, wherein the longitudinal axis of a processing head coincides with the longitudinal axis of the central cylinder.
1 . A system for roll-to-roll deposition comprising:
a substrate transport system comprising a static elongated central cylinder for helical transport of a flexible substrate, the flexible substrate being arranged in a helical manner around the central cylinder, the central cylinder comprising bearing structures arranged in or arranged on a surface of the central cylinder for frictionless or low-friction transport of the flexible substrate over the surface of the central cylinder; and,
one or more processing heads, each processing head being configured as a hollow cylinder, the one or more processing heads comprising at least one deposition head, an inner surface of the at least one deposition head including atomic layer deposition structures for depositing atomic layers onto the flexible substrate;
wherein an inner radius of the one or more processing heads is larger than an outer radius of the central cylinder, the one or more processing heads being configured to rotate around the central cylinder, and
wherein a longitudinal axis of a processing head coincides with the longitudinal axis of the central cylinder.
2 . The system according to claim 1 , wherein the helical transport of the flexible substrate is associated with a first rotation direction and a rotation of the at least one deposition head is associated with a second rotation direction, the second rotation direction being opposite to the first rotation direction.
3 . The system according to claim 1 , wherein the bearing structures comprise gas bearing structures and/or roller bearing structures, arranged in or on the surface of the central cylinder, wherein gas bearing structures includes a plurality of gas outlets and a plurality of gas exhausts in the surface of the central cylinder.
4 . The system according to claim 1 , wherein the substrate transport system further includes:
a plurality of hollow tube segments arranged next to each other over the central cylinder, the flexible substrate being wrapped around the hollow tube segments, wherein when the flexible substrate is transported through a processing chamber, the hollow tube segments move over the central cylinder from a first end of the central cylinder towards a second end of the central cylinder.
5 . The system according to claim 1 , wherein the substrate transport system further includes:
a flexible belt configured to move around the central cylinder via a second helical path, the flexible belt forming a helical belt transport structure for the flexible substrate, the flexible substrate being wrapped around the helical belt transport structure,
wherein when the flexible belt is transported over the central cylinder via the second helical path, the flexible substrate is transported via a first helical path through the at least one deposition head.
6 . The system according to claim 1 , wherein the substrate transport system further comprises:
a substrate guiding structure for guiding the flexible substrate onto the central cylinder, the substrate guiding structure being arranged so that the flexible substrate follows a first helical path around the central cylinder,
the substrate guiding structure comprising one or more rollers.
7 . The system according to claim 6 , wherein the flexible substrate is fed onto the central cylinder at a certain feed angle and wherein the substrate guiding structure is an adjustable substrate guiding structure configured for adjusting a position and/or orientation of the flexible substrate relative to the central cylinder, the certain feed angle being defined by an angle between the longitudinal axis of the flexible substrate and the longitudinal axis of the central cylinder.
8 . The system according to claim 1 , wherein the atomic layer deposition structures are radially arranged around the central cylinder and divided in a plurality of processing sections.
9 . The system according to claim 8 , wherein processing sections are separated by buffer sections.
10 . The system according to claim 1 , wherein the one or more processing heads further include processing structures for processing the flexible substrate, wherein the processing structures are radially arranged along the inner surface of a processing head.
11 . The system according to claim 1 , wherein the one or more processing heads further includes processing structures, wherein the processing structures are tangentially arranged along the inner surface of a processing head.
12 . The system according to claim 1 , wherein one or more gas supplies and/or exhausts are connected to the at least one deposition head using one or more rotary unions.
13 . The system according to claim 1 , wherein a space between the surface of the central cylinder and the inner surface of the at least one deposition head form deposition zones for depositing atomic layers onto the flexible substrate while the flexible substrate is transported via a first helical path around the central cylinder through the deposition head.
14 . The system according to claim 12 , wherein the one or more rotary unions comprise one or more hollow shaft rotary unions positioned on one or both sides of the at least one deposition head.
15 . The system according to claim 9 , wherein the buffer sections are purging sections.
16 . The system according to claim 8 , wherein at least part of the plurality of processing sections extend in a direction parallel to the longitudinal axis of the central cylinder in the inner surface of the at least one deposition head.
17 . The system according to claim 5 , wherein the flexible belt is an endless conveyer belt.
18 . The system according to claim 6 , wherein the one or more rollers include one or more first rollers each configured as a driving roller operably connected to a torquing device to transfer a torque or force onto the flexible substrate to move the flexible substrate over the central cylinder.
19 . The system according to claim 1 , wherein the one or more processing heads further comprise at least one pre-treatment head having an inner surface including pre-treatment structures or an etching head having an inner surface including etching structures.