High-temperature resistant nano-copper produced by laser direct writing, preparation method and application thereof
The present disclosure provides a high-temperature resistant nano-copper produced by laser direct writing, a preparation method and an application thereof. The high-temperature resistant nano-copper exhibits excellent oxidation resistance, thermal stability and superior conductivity. In this disclosure, the preparation is simple, and the nano-copper oxide ink can be stored for extended periods without being affected by oxidation. It is suitable for various manufacturing processes including printing, coating, and other similar methods. Moreover, based on laser direct writing, the processing efficiency is high, enabling the one-step integration of multi-performance of the high-temperature resistant nano-copper. The high-temperature resistant nano-copper described in the present disclosure can be used as an interconnection circuit in an integrated sensor system based on all-laser in-situ direct writing, and can be widely applied in fields of aerospace, automobile, electronics, etc.
1 . A preparation method for a high-temperature resistant nano-copper produced by laser direct writing, comprising the following steps:
(1) uniformly heating and stirring an alcohol solvent, an organic dispersant, an organic auxiliary agent and an appropriate amount of formate to obtain a precursor solution;
(2) adding an appropriate amount of nano-copper oxide into the precursor solution and thoroughly dispersing the mixture via ultrasonication to obtain a nano-copper oxide ink, comprising 43.0-50.4 wt % of nano-copper oxide, 37.1-50.4 wt % of alcohol solvent, 3.4-5.3 wt % of organic dispersant, 0.0-9.5 wt % of organic auxiliary agent and 1.3-2.0 wt % of formate, and the nano-copper oxide being a copper oxide nanowire;
(3) coating a pretreated substrate with the nano-copper oxide ink, followed by heating and drying to obtain a nano-copper oxide film;
(4) applying one-step laser direct writing-induced passivation/photothermal reduction sintering to the nano-copper oxide film to obtain a high-temperature resistant nano-copper, wherein the laser is a continuous green light with a wavelength of 532 nm, a laser power is 100-400 mW, a laser speed is 20-200 mm/s and a laser scanning period is 20-40 μm; and the laser-induced passivation involves comprising a passivation reaction of HCOO − on a surface of the nano-copper, causing copper ions on the surface of the nano-copper to form a copper formate dimer complex with HCOO − , forming an oxidation-resistant coordination passivation layer; wherein the high-temperature is 170° C., wherein a temperature of the heating and stirring in step (1) is 50-70° C., a rotation speed is 600-1500 rpm, and a duration is 2-20 h; a real-time temperature during the ultrasonic dispersion in step (2) is 50-60° C., an ultrasonic pulse width is 0.1 s, and an ultrasonic duration is 0.1-2 h; and a temperature of the heating and drying in step (3) is 50-80° C., and a duration is 2-12 h.
2 . The preparation method for a high-temperature resistant nano-copper produced by laser direct writing according to claim 1 , wherein the alcohol solvent in step (1) is selected from at least one of monohydric alcohols and polyhydric alcohols.
3 . The preparation method for a high-temperature resistant nano-copper produced by laser direct writing according to claim 1 , wherein the organic dispersant in step (1) is selected from at least one of polyacrylamide-based organic polymers, polyethylene oxide-based organic polymers, tannin, and lignin.
4 . The preparation method for a high-temperature resistant nano-copper produced by laser direct writing according to claim 1 , wherein the organic auxiliary agent in step (1), an organic amide, is selected from at least one of alkyl amides with a chemical formula conforming to C n H 2n+1 NO (1≤n≤5).
5 . The preparation method for a high-temperature resistant nano-copper produced by laser direct writing according to claim 1 , wherein the formate in step (1) is selected from at least one of lithium formate, beryllium formate, sodium formate, magnesium formate, potassium formate, calcium formate, iron formate, manganese formate, cobalt formate, nickel formate, copper formate, zinc formate, barium formate, and ammonium formate.
6 . The preparation method for a high-temperature resistant nano-copper produced by laser direct writing according to claim 1 , wherein the pretreatment in step (3) is oxygen plasma surface treatment with a treatment duration of 60-150 s to form a pretreated substrate; subsequently coating the pretreated substrate with the nano-copper oxide ink.