LIB anode coating measurement with dual x-ray
A system includes a top scanner head configured over a coated substrate. An x-ray sensor and a second x-ray sensor scan the coated substrate. At least one of the x-ray sensor and second x-ray sensor is tuned to an energy level below an absorption peak and at least one of the x-ray sensor and second x-ray sensor is tuned to an energy level above the absorption peak. The x-ray sensor and second x-ray sensor scan a same sheet spot on the coated substrate. A bottom scanner head is configured underneath the coated substrate to provide a location for a detection of x-rays for the x-ray sensor and the second x-ray sensor.
1 . A method comprising:
positioning a top scanner head above a coated substrate;
configuring an x-ray sensor and a second x-ray sensor to scan the coated substrate, wherein at least one of the x-ray sensor and the second x-ray sensor is tuned to an energy level below an absorption peak and the at least one of the x-ray sensor and the second x-ray sensor is tuned to an energy level above the absorption peak, and wherein the x-ray sensor and the second x-ray sensor scan a same sheet spot on the coated substrate; and
positioning a bottom scanner head underneath the coated substrate to provide a location for a detection of x-rays for the x-ray sensor and the second x-ray sensor.
2 . The method of claim 1 , wherein the second x-ray sensor is configured to move in cross-direction to a manufacturing direction of the sheet spot.
3 . The method of claim 2 , wherein the second x-ray sensor is configured to sense photons of energy above the absorption peak.
4 . The method of claim 2 , further comprising:
recording signals from the x-ray sensor and the second x-ray sensor using a processor within a computing device.
5 . The method of claim 4 , wherein the processor is configured to determine substrate and coating weights.
6 . The method of claim 4 , wherein the processor is configured to determine a ratio of the signals with the coated substrate absent to the x-ray sensor and the second x-ray sensor being configured over the coated substrate.
7 . The method of claim 1 , further comprising:
producing two energy x-ray beams with greater absorption in copper and lesser absorption in silicon.
8 . The method of claim 1 , further comprising calculating a basis weight for silicon and for copper in real-time.
9 . The method of claim 8 , wherein the step of calculating using sensor signals from the x-ray sensor and the second x-ray sensor.
10 . The method of claim 8 , wherein the step of calculating is based on the scanning of the sheet spot on the coated substrate while the x-ray sensors are operating.
11 . The method of claim 1 , wherein the x-ray sensor is tuned to the energy above the absorption peak.
12 . The method of claim 1 , wherein the second x-ray sensor is tuned to the energy below the absorption peak.
13 . The method of claim 1 , wherein the absorption peak is 10 kiloelectron volts.
14 . The method of claim 1 , wherein the second x-ray sensor is configured to sense photons of energy above 10 kiloelectron volts.
15 . The method of claim 1 , wherein the second x-ray sensor is configured to move in correlation with the x-ray sensor.
16 . The method of claim 1 , wherein the coated substrate includes Carbon-Silicon coating.
17 . The method of claim 1 , wherein the x-ray sensor is replaced by a single x-ray source that is configured with multiple detectors.
18 . The method of claim 17 , wherein two energy x-ray beams are created through filtering the single x-ray source.
19 . The method of claim 1 , wherein the x-ray sensor is configured to measure weight per square meter.
20 . The method of claim 1 , wherein the bottom scanner head is configured with receivers to receive transmissions of the scans from the x-ray sensor within the top scanner head.