Transfer film, manufacturing method of laminate, laminate, and micro LED display element

1 . A manufacturing method of a laminate using a transfer film,

the transfer film comprising, in the following order:

a temporary support;

a photosensitive precursor layer of a light absorbing layer; and

a photosensitive precursor layer of a light reflecting layer,

wherein a thickness of the precursor layer of the light reflecting layer is 3 μm or more, and

the manufacturing method of a laminate, comprising:

a bonding step of bonding the transfer film to a base material by bringing a surface of the transfer film on a side opposite to the temporary support into contact with the base material to obtain a precursor layer-attached base material including the base material, the precursor layer of the light reflecting layer, the precursor layer of the light-absorbing layer, and the temporary support in this order;

an exposing step of exposing the precursor layer of the light reflecting layer and the precursor layer of the light-absorbing layer in the precursor layer-attached base material; and

a developing step of developing the exposed precursor layer of the light reflecting layer and the exposed precursor layer of the light-absorbing layer to form a pattern having a light reflecting layer and a light absorbing layer in order from the base material side,

wherein the manufacturing method further includes, between the bonding step and the exposing step or between the exposing step and the developing step, a peeling step of peeling the temporary support from the precursor layer-attached base material.

2 . The manufacturing method of a laminate according to claim 1 ,

wherein the precursor layer of the light reflecting layer contains an alkali-soluble resin, a polymerizable compound, and a photopolymerization initiator.

3 . The manufacturing method of a laminate according to claim 1 ,

wherein the precursor layer of the light absorbing layer contains an alkali-soluble resin, a polymerizable compound, and a photopolymerization initiator.

4 . The manufacturing method of a laminate according to claim 1 ,

wherein the thickness of the precursor layer of the light reflecting layer is 5 μm or more.

5 . The manufacturing method of a laminate according to claim 2 ,

wherein the precursor layer of the light reflecting layer contains particles having a refractive index higher than a refractive index of a cured substance of the polymerizable compound.

6 . The manufacturing method of a laminate according to claim 5 ,

wherein the particles include titanium oxide.

7 . The manufacturing method of a laminate according to claim 1 ,

wherein the precursor layer of the light reflecting layer contains metal particles.

8 . The manufacturing method of a laminate according to claim 1 ,

wherein the precursor layer of the light reflecting layer contains hollow particles.

9 . The manufacturing method of a laminate according to claim 1 ,

wherein the precursor layer of the light reflecting layer contains a liquid crystal compound.

10 . The manufacturing method of a laminate according to claim 1 ,

wherein a thickness of the precursor layer of the light absorbing layer is 1 μm or more.

11 . The manufacturing method of a laminate according to claim 1 ,

wherein the precursor layer of the light absorbing layer contains carbon black.

12 . The manufacturing method of a laminate according to claim 1 ,

the transfer film comprising, in the following order:

the temporary support;

the photosensitive precursor layer of a light absorbing layer; and

the photosensitive precursor layer of a light reflecting layer,

wherein the precursor layer of the light reflecting layer contains an alkali-soluble resin, a polymerizable compound, and a photopolymerization initiator,

the precursor layer of the light absorbing layer contains an alkali-soluble resin, a polymerizable compound, and a photopolymerization initiator,

the thickness of the precursor layer of the light reflecting layer is 5 μm or more, and

a thickness of the precursor layer of the light absorbing layer is 1 μm or more.

13 . The manufacturing method of a laminate according to claim 1 , further comprising:

an interlayer between the precursor layer of the light absorbing layer and the precursor layer of the light reflecting layer.

14 . A laminate formed by the manufacturing method of a laminate according to claim 1 .

15 . A micro LED display element comprising:

the laminate according to claim 14 .

16 . A manufacturing method of a laminate using a transfer film,

the transfer film comprising, in the following order:

a temporary support;

a photosensitive precursor layer of a light absorbing layer, and

a photosensitive layer,

wherein a thickness of the photosensitive layer is 3 μm or more, and

the manufacturing method of a laminate, comprising:

a bonding step of bonding the transfer film to a base material by bringing a surface of the transfer film on a side opposite to the temporary support into contact with the base material to obtain a precursor layer-attached base material including the base material, the photosensitive layer, the precursor layer of the light-absorbing layer, and the temporary support in this order;

an exposing step of exposing the photosensitive layer and the precursor layer of the light-absorbing layer in the precursor layer-attached base material; and

a developing step of developing the exposed photosensitive layer and the exposed precursor layer of the light-absorbing layer to form a light absorbing layer having a first opening portion penetrating in a thickness direction and a resin layer having a second opening portion penetrating in a thickness direction and communicating with the first opening portion,

wherein the manufacturing method further includes, between the bonding step and the exposing step or between the exposing step and the developing step, a peeling step of peeling the temporary support from the precursor layer-attached base material,

a light reflecting layer forming step of forming a light reflecting layer on an inner wall surface of the second opening portion of the resin layer, and

in a case where the base material includes no light emitting element on an exposed surface exposed through the second opening portion, a light emitting element disposing step of disposing the light emitting element on the exposed surface.

17 . The manufacturing method of a laminate according to claim 16 ,

the transfer film comprising, in the following order:

the temporary support;

the photosensitive precursor layer of a light absorbing layer; and

the photosensitive layer,

wherein the precursor layer of the light absorbing layer contains an alkali-soluble resin, a polymerizable compound, and a photopolymerization initiator,

the photosensitive layer contains an alkali-soluble resin, a polymerizable compound, and a photopolymerization initiator,

the thickness of the precursor layer of the light absorbing layer is 1 μm or more, and a thickness of the photosensitive layer is 5 μm or more.

18 . A laminate formed by the manufacturing method of a laminate according to claim 16 .

19 . A manufacturing method of a laminate using a transfer film,

the transfer film comprising:

a temporary support; and

a photosensitive precursor layer of a light absorbing layer,

wherein a thickness of the precursor layer of the light absorbing layer is 3 μm or more, and

an optical density of the precursor layer of the light absorbing layer at a wavelength of at least one of 385 nm and 550 nm is 3.0 to 6.0, and

the manufacturing method of a laminate, comprising:

a bonding step of bonding the transfer film to a base material by bringing a surface of the transfer film on a side opposite to the temporary support into contact with the base material to obtain a precursor layer-attached base material including the base material, the precursor layer of the light-absorbing layer, and the temporary support in this order;

an exposing step of exposing the precursor layer of the light-absorbing layer in the precursor layer-attached base material; and

a developing step of developing the exposed precursor layer of the light-absorbing layer to form a light absorbing layer having an opening portion penetrating in a thickness direction,

wherein the manufacturing method further includes, between the bonding step and the exposing step or between the exposing step and the developing step, a peeling step of peeling the temporary support from the precursor layer-attached base material,

a light reflecting layer forming step of forming a light reflecting layer on an inner wall surface of the opening portion of the light absorbing layer, and

in a case where the base material includes no light emitting element on an exposed surface exposed through the opening portion, a light emitting element disposing step of disposing the light emitting element on the exposed surface.

20 . The manufacturing method of a laminate according to claim 19 ,

the transfer film comprising:

the temporary support; and

the photosensitive precursor layer of a light absorbing layer,

wherein a thickness of the precursor layer of the light absorbing layer is 3 μm or more,

the precursor layer of the light absorbing layer contains an alkali-soluble resin, a polymerizable compound, and a photopolymerization initiator and

an optical density of the precursor layer of the light absorbing layer at a wavelength of at least one of 385 nm and 550 nm is 3.0 to 6.0.

21 . A laminate formed by the manufacturing method of a laminate according to claim 19 .

22 . A transfer film comprising, in the following order:

a temporary support;

a photosensitive precursor layer of a light absorbing layer; and

a photosensitive precursor layer of a light reflecting layer,

wherein a thickness of the precursor layer of the light reflecting layer is 3 μm or more, and

the precursor layer of the light reflecting layer contains hollow particles.

23 . A transfer film comprising, in the following order:

a temporary support;

a photosensitive precursor layer of a light absorbing layer;

an interlayer; and

a photosensitive precursor layer of a light reflecting layer,

wherein a thickness of the precursor layer of the light reflecting layer is 3 μm or more.