IP Library Granted Patent US 12688956
Granted Patent B2
US 12688956 · App. 18/275,229 · Granted Jul 21, 2026

Vacuum valve and method for manufacturing same

Inventors: Katsuya Jinno (Tokyo, JP); Tatsuya Koyama (Tokyo, JP); Taiki Donen (Tokyo, JP); Yasutomo Otake (Tokyo, JP); Naoya Aihara (Tokyo, JP)
Assignee: MITSUBISHI ELECTRIC CORPORATION
H01C1/026H01C1/14H01C17/00
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Quick Facts
Patent No.
US 12688956
App. No.
18/275,229
Granted
Jul 21, 2026
Kind
B2
Abstract

A vacuum valve includes a structure having: a container in which a fixed-side end plate and a movable-side end plate are fixed to both ends of an insulation cylinder; and an arc shield at an intermediate portion of the insulation cylinder. The vacuum valve includes: a voltage nonlinear resistance layer containing particles having a voltage nonlinear resistance characteristic at at least either one of an outer creepage surface or an inner creepage surface of the insulation cylinder. A filling rate of the particles in the voltage nonlinear resistance layer has a distribution along a film thickness direction, and a filling rate of the particles in an outermost layer is not greater than half of an average filling rate of the particles in an entirety of the voltage nonlinear resistance layer.

Claims (33)

1 . A vacuum valve including a structure having: a container in which a fixed-side end plate and a movable-side end plate are fixed to both ends of an insulation cylinder; and an arc shield at an intermediate portion of the insulation cylinder,

the vacuum valve comprising:

a voltage nonlinear resistance layer containing particles having a voltage nonlinear resistance characteristic at at least either one of an outer creepage surface or an inner creepage surface of the insulation cylinder, wherein

a filling rate of the particles in the voltage nonlinear resistance layer has a distribution along a film thickness direction, and

a filling rate of the particles in an outermost layer is not greater than half of an average filling rate of the particles in an entirety of the voltage nonlinear resistance layer.

2 . The vacuum valve according to claim 1 , wherein

in the voltage nonlinear resistance layer, the filling rate of the particles in the outermost layer is not greater than 10 vol %.

3 . The vacuum valve according to claim 1 , wherein

the filling rate of the particles in the voltage nonlinear resistance layer has a distribution of not less than 25 vol % and not greater than 74 vol %.

4 . The vacuum valve according to claim 1 , wherein

the filling rate of the particles in the voltage nonlinear resistance layer is high at a surface of the insulation cylinder and becomes lower further away from the surface of the insulation cylinder.

5 . The vacuum valve according to claim 1 , wherein

between the outermost layer and a portion having voltage nonlinear resistance characteristics having a filling rate of the particles of not less than 25 vol % and not greater than 74 vol %, a distribution portion having a filling rate of the particles between the filling rate in the outermost layer and the filling rate of not less than 25 vol % and not greater than 74 vol % is included.

6 . The vacuum valve according to claim 1 , wherein

the particles having the voltage nonlinear resistance characteristic are a main component containing not less than 80 wt % of zinc oxide or silicon carbide.

7 . The vacuum valve according to claim 1 , wherein

the particles having the voltage nonlinear resistance characteristic are each an aggregate of two or more primary particles.

8 . The vacuum valve according to claim 1 , wherein

an average particle diameter of primary particles forming each of the particles having the voltage nonlinear resistance characteristic is not less than 1 μm and less than 20 μm.

9 . The vacuum valve according to claim 1 , wherein

the voltage nonlinear resistance layer is provided so as to electrically connect the fixed-side end plate and the movable-side end plate, and is provided at a portion of the insulation cylinder.

10 . The vacuum valve according to claim 1 , wherein

the voltage nonlinear resistance layer is provided between either one of the fixed-side end plate and the movable-side end plate, and the arc shield, and is provided at an entire surface or a portion of the insulation cylinder.

11 . The vacuum valve according to claim 1 , wherein

two or more types of matrix materials forming the voltage nonlinear resistance layer are used.

12 . A method for manufacturing a vacuum valve including a structure having: a container in which a fixed-side end plate and a movable-side end plate are fixed to both ends of an insulation cylinder; and an arc shield at an intermediate portion of the insulation cylinder, the method comprising:

applying a material, in a liquid state, containing particles having a voltage nonlinear resistance characteristic at at least either one of an outer creepage surface or an inner creepage surface of the insulation cylinder, and curing the material, to form a voltage nonlinear resistance layer, such that

a filling rate of the particles in the voltage nonlinear resistance layer has a distribution along a film thickness direction, and

a filling rate of the particles in an outermost layer is not greater than half of an average filling rate of the particles in an entirety of the voltage nonlinear resistance layer.

13 . The method for manufacturing the vacuum valve according to claim 12 , wherein

the voltage nonlinear resistance layer is obtained through adhesion or pressure-bonding of a part in a cured material or a semi-cured state.

14 . The method for manufacturing the vacuum valve according to claim 12 , wherein

the voltage nonlinear resistance layer is obtained by causing a liquid material to flow into a gap between a part in a cured material or a semi-cured state and the insulation cylinder and curing the liquid material.