Electron beam application device
A light source that emits pulse excitation light includes a laser light source, an optical splitter that splits a pulse laser beam into a plurality of pulse laser beams, phase adjusters and optical amplifiers provided for the pulse laser beams, and an optical combiner that combines the plurality of pulse laser beams whose phases are adjusted and that are amplified, and outputs combined light as the pulse excitation light. An optical phase controller controls phase delay amounts of the phase adjusters, and an optical monitor detects an inclination of the pulse excitation light relative to an optical axis of a focusing lens. The optical phase controller stores phase delay amount data indicating phase delay amounts of the plurality of phase adjusters in which the inclination is a predetermined value, and sets the phase delay amounts of the plurality of phase adjusters based on the phase delay amount data.
1 . An electron beam application device comprising:
an electron gun that includes a photocathode including a substrate and a photo electric film, a light source configured to emit pulse excitation light, and a focusing lens configured to focus the pulse excitation light toward the photocathode and that is configured to emit pulse electron beams from a position of the photo electric film where the pulse excitation light is focused; and
an electron optics configured to irradiate a sample with the pulse electron beams,
wherein the light source includes;
a laser light source,
a power supply configured to supply power to the laser light source to emit a pulse laser beam,
an optical splitter configured to split a pulse laser beam emitted by the laser light source into a plurality of pulse laser beams,
a plurality of phase adjusters each provided for a respective one of the plurality of pulse laser beams and configured to adjust phases of the pulse laser beams split by the optical splitter,
a plurality of optical amplifiers each provided for a respective one of the plurality of pulse laser beams and configured to amplify the pulse laser beams split by the optical splitter,
an optical combiner configured to combine the plurality of pulse laser beams whose phases are adjusted by the phase adjusters and that are amplified by the optical amplifier, and output the light from the pulse laser beams, and
an optical phase controller configured to control phase delay amounts of the plurality of phase adjusters,
wherein the optical phase controller stores phase delay amount data indicating the phase delay amounts of the plurality of phase adjusters in which an inclination of the pulse excitation light relative to an optical axis of the focusing lens is a predetermined value, and sets the phase delay amounts of the plurality of phase adjusters based on the phase delay amount data,
wherein the phase delay amount data indicates phase delay amounts of the plurality of phase adjusters when the pulse excitation light is parallel to the optical axis of the focusing lens,
wherein the light source further includes a controller configured to control the power supply and the optical phase controller,
wherein the controller outputs a light emission control signal for controlling light emission of the laser light source to the power supply,
wherein when the laser light source is caused to emit light having a first pulse width, the optical phase controller sets phase delay amounts of the plurality of phase adjusters based on the phase delay amount data, and
wherein when the laser light source is caused to emit light having a second pulse width longer than the first pulse width, the optical phase controller changes a phase delay amount of at least one of the plurality of phase adjusters in a manner of increasing a focusing diameter of the pulse excitation light on the photo electric film.
2 . The electron beam application device according to claim 1 , wherein
the controller outputs, to the optical phase controller, a phase control signal synchronized with a light emission control signal output to the power supply to control light emission of the laser light source, and
the optical phase controller stores a plurality of pieces of the phase delay amount data in which inclinations of the pulse excitation light relative to the optical axis of the focusing lens have different values, and switches each piece of the phase delay amount data for setting the phase delay amounts of the plurality of phase adjusters for a respective one of the pulse laser beams.
3 . The electron beam application device according to claim 2 , further comprising:
a control device, wherein
the electron optics includes an aligner or a deflector configured to control trajectories of the pulse electron beams, and
the control device outputs a deflection control signal synchronized with the light emission control signal to the aligner or the deflector, and controls the trajectories of the pulse electron beams deflected by the aligner or the deflector to be the same.
4 . The electron beam application device according to claim 2 , wherein
the electron optics includes a deflector configured to sweep the pulse electron beams in a first direction on the sample, and
trajectories of positions irradiated with the pulse electron beams on the sample are arranged at an equal interval in a direction perpendicular to the first direction.
5 . The electron beam application device according to claim 4 , further comprising:
a detection system that includes an electron detector configured to detect electrons generated by irradiating the sample with the pulse electron beams; and
a control device, wherein
the control device outputs a discrimination signal synchronized with the light emission control signal to the detection system, and
the detection system discriminates positions irradiated with the pulse electron beams and forms an image based on a detection signal from the electron detector.
6 . The electron beam application device according to claim 2 , further comprising:
a control device, wherein
the electron optics includes an electron beam monitor configured to monitor a fluctuation of the pulse electron beams, and
the control device outputs a control signal for recovering a current amount of the pulse electron beams to the controller when the electron beam monitor determines that a current amount of the pulse electron beams decreases.
7 . The electron beam application device according to claim 6 , wherein
the controller receives the control signal and adjusts an output of the laser light source and/or an amplification factor of the optical amplifier.
8 . The electron beam application device according to claim 6 , wherein
the controller receives the control signal and changes the phase delay amount data used by the optical phase controller to set each of the phase delay amounts of the plurality of phase adjusters for a respective one of the pulse laser beams.
9 . The electron beam application device according to claim 1 , wherein
light emission of the laser light source is synchronized with excitation light to be radiated to the sample.
10 . The electron beam application device according to claim 1 , wherein
the light source includes an optical monitor configured to monitor whether the pulse excitation light is parallel to the optical axis of the focusing lens, and
the optical monitor includes a transparent mirror on which the pulse excitation light is incident and that reflects a part of the pulse excitation light, and a light detector disposed such that reflected light from the transparent mirror is incident perpendicularly on a light receiving surface when the pulse excitation light is parallel to the optical axis of the focusing lens.
11 . The electron beam application device according to claim 1 , wherein
the photo electric film includes a compound semiconductor film and a work function lowering film provided on a surface of the compound semiconductor film.
12 . The electron beam application device according to claim 1 , wherein
each of the optical splitter and the optical combiner includes a diffractive optical element and a collimator, and
a pulse laser beam perpendicularly incident on the diffractive optical element is split into a plurality of pulse laser beams, and optical paths of the plurality of pulse laser beams are made parallel to one another by the collimator.
13 . The electron beam application device according to claim 1 , wherein
the light source includes an optical monitor configured to detect an inclination of the pulse excitation light relative to the optical axis of the focusing lens, and
the optical monitor includes a transparent mirror on which the pulse excitation light is incident and that reflects a part of the pulse excitation light, an imaging lens that is disposed such that an optical axis of the imaging lens is perpendicular to the optical axis of the focusing lens and on which reflected light from the transparent mirror is incident, and an image sensor that is disposed such that a distance from the imaging lens is a focal length of the imaging lens.
14 . The electron beam application device according to claim 1 , wherein
the optical splitter and the optical combiner are a half mirror.
15 . The electron beam application device according to claim 14 , wherein
the light source includes an optical monitor configured to monitor whether the pulse excitation light is parallel to the optical axis of the focusing lens, and
the optical monitor is a light detector configured to monitor uncombined light from the optical combiner.