IP Library Granted Patent US 12689012
Granted Patent B2
US 12689012 · App. 18/924,053 · Granted Jul 21, 2026

Ignition condition calculation method and plasma processing apparatus

Inventor: Morihito Inagaki (Yamanashi, JP)
Assignee: TOKYO ELECTRON LIMITED
H01J37/32926G08B21/18
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Quick Facts
Patent No.
US 12689012
App. No.
18/924,053
Granted
Jul 21, 2026
Kind
B2
Abstract

An ignition condition calculation method includes (A) searching for ignition condition information including first plasma state information when a plasma is ignited under a preset ignition condition, and storing the ignition condition information in a storage; (B) searching for misfire condition information including second plasma state information when the plasma misfires after the plasma has been ignited, and storing the misfire condition information in the storage; and (C) displaying the ignition condition information and the misfire condition information on a display.

Claims (29)

1 . An ignition condition calculation method comprising:

(A) searching for ignition condition information including first plasma state information when a plasma is ignited under a preset ignition condition, and storing the ignition condition information in a storage;

(B) searching for misfire condition information including second plasma state information when the plasma misfires after the plasma has been ignited, and storing the misfire condition information in the storage; and

(C) displaying the ignition condition information and the misfire condition information on a display.

2 . The ignition condition calculation method according to claim 1 , wherein the preset ignition condition includes a gas type, a gas flow rate, and a pressure or a radio-frequency voltage.

3 . The ignition condition calculation method according to claim 2 , wherein, in (A), the gas type, the gas flow rate, and the radio-frequency voltage are input as the preset ignition condition; and

in (B), an upper limit value and a lower limit value of the second plasma state information are searched by variably controlling a pressure within a processing container, and the misfire condition information including the upper limit value and the lower limit value of the second plasma state information is stored in the storage.

4 . The ignition condition calculation method according to claim 2 , wherein, in (A), the gas type, the gas flow rate, and the pressure are input as the preset ignition condition; and

in (B), an upper limit value and a lower limit value of the second plasma state information are searched by variably controlling a radio-frequency voltage applied to an electrode of a plasma generation space, and the misfire condition information including the upper limit value and the lower limit value of the second plasma state information is stored in the storage.

5 . The ignition condition calculation method according to claim 2 , wherein the first plasma state information includes information of at least one of a peak-to-peak voltage difference when a radio-frequency voltage is applied, and radio-frequency power of a reflected wave for the radio-frequency voltage.

6 . The ignition condition calculation method according to claim 1 , wherein the preset ignition condition includes a gas type, a gas flow rate, an antenna position in a plasma generation space, and a pressure or a radio-frequency voltage.

7 . The ignition condition calculation method according to claim 6 , wherein, in (A), the gas type, the gas flow rate, the antenna position, and the radio-frequency voltage are input as the preset ignition condition; and

in (B), an upper limit value and a lower limit value of the second plasma state information are searched by variably controlling a pressure within a processing container, and the misfire condition information including the upper limit value and the lower limit value of the second plasma state information is stored in the storage.

8 . The ignition condition calculation method according to claim 6 , wherein, in (A), the gas type, the gas flow rate, the antenna position, and the pressure are input as the preset ignition condition; and

in (B), an upper limit value and a lower limit value of the second plasma state information are searched by variably controlling the radio-frequency voltage applied to an antenna of the plasma generation space, and the misfire condition information including the upper limit value and the lower limit value of the second plasma state information is stored in the storage.

9 . The ignition condition calculation method according to claim 1 , wherein, in (A), for each of a plurality of preset ignition conditions, a plurality of pieces of the ignition condition information is stored in the storage in association with the first plasma state information based on a result of the searching;

in (B), for each of the plurality of pieces of ignition condition information, a plurality of pieces of the misfire condition information is stored in the storage in association with the second plasma state information based on the result of the searching; and

in (C), the plurality of pieces of the ignition condition information and the plurality of pieces of the misfire condition information are displayed on the display; and

wherein the ignition condition calculation method further comprises:

(D) setting identification information of the ignition condition information and the misfire condition information selected from the plurality of pieces of the ignition condition information and the plurality of pieces of the misfire condition information, in a recipe including the preset ignition conditions.

10 . The ignition condition calculation method according to claim 9 , further comprising:

(E) outputting information on at least one of an ignition of the plasma or a misfire of the plasma based on the ignition condition information and the misfire condition information identified by the identification information set in the recipe when executing a process of the recipe.

11 . A plasma processing apparatus comprising:

a processing container in which a plasma is generated; and

a controller,

wherein the controller is configured to control a process including:

(A) searching for ignition condition information including first plasma state information when the plasma is ignited under a preset ignition condition in the processing container, and storing the ignition condition information in a storage;

(B) searching for misfire condition information including second plasma state information when the plasma misfires after the plasma has been ignited in the processing container, and storing the misfire condition information in the storage; and

(C) displaying the ignition condition information and the misfire condition information on a display.