Memory device with container-shaped electrode and method for fabricating the same
The present application discloses a memory device and a method for fabricating the memory device. The memory device includes a substrate; a landing area positioned on the substrate; a bottom electrode positioned on the landing area, wherein the bottom electrode has a container-shaped profile; a support layer positioned over the substrate and laterally surrounded the bottom electrode; a dielectric structure including a dielectric layer conformally positioned on the bottom electrode and on a top surface of the support layer, and covering top corners of the support layer, and a plurality of dielectric portions conformally positioned on the dielectric layer and covering the top corners of the support layer; and a top electrode structure positioned on the dielectric structure. The dielectric portions are sandwiched by the top electrode structure and the dielectric layer. The top surface of the third support layer is higher than a top surface of the bottom electrode.
1 . A method for fabricating a memory device, comprising:
forming a landing area on a substrate;
forming an energy-removable layer adjacent to the landing area;
sequentially forming a first support layer, a first material layer, a second material layer, a second support layer, a third material layer, and a third support layer over the landing area, wherein the first material layer is doped with an N-type dopant and the third material layer is doped with a P-type dopant;
forming a first recess to expose the landing area;
forming a bottom electrode within the first recess;
conformally forming a dielectric layer on the bottom electrode and on a top surface of the third support layer;
forming a plurality of dielectric portions on top corners of the first recess;
conformally forming a top conductive layer on the dielectric layer and covering the plurality of dielectric portions; and
forming a top electrode on the top conductive layer.
2 . The method for fabricating the memory device of claim 1 , wherein the first support layer, the second support layer, and the third support layer comprise silicon nitride.
3 . The method for fabricating the memory device of claim 2 , wherein the first material layer, the second material layer, and the third material layer comprise polysilicon.
4 . The method for fabricating the memory device of claim 2 , a dimension of the first recess at a level of the first material layer is greater than a dimension of the first recess at a level of the third material layer.
5 . The method for fabricating the memory device of claim 1 , further comprising performing a thermal treating process to turn the energy-removable layer into an air gap structure comprising an air gap enclosed by a liner.
6 . The method for fabricating the memory device of claim 5 , wherein the energy-removable layer comprises a thermal decomposable material, a photonic decomposable material, or an e-beam decomposable material.