Field effect transistor with isolation structure and related method
A method includes: forming a first stack of semiconductor channels and a second stack of semiconductor channels over a substrate, the first stack being adjacent the second stack, a transition region overlapping neighboring protruding corners of the first stack and the second stack; forming a plurality of sacrificial gates over the first stack and the second stack, the plurality of sacrificial gates extending in a first direction and being arranged along a second direction transverse the first direction based on a first pitch along a second direction, each of the plurality of sacrificial gates having a first width; simultaneously with the forming a plurality of sacrificial gates, forming a bar structure over the transition region and adjacent to the plurality of sacrificial gates, the bar structure having a second width that exceeds a sum of the first pitch and the first width; forming a plurality of source/drain openings in areas of the first and second stacks of semiconductor channels that are exposed by the plurality of sacrificial gates and the bar structure; forming a plurality of source/drain regions in the plurality of source/drain openings; replacing the plurality of sacrificial gates with a plurality of gate structures that wrap around the semiconductor channels of the first and second stacks; simultaneously with replacing the plurality of sacrificial gates, replacing the bar structure with an inactive gate structure; and replacing the inactive gate structure with an isolation structure.
1 . A method, comprising:
forming a first stack of semiconductor channels and a second stack of semiconductor channels over a substrate, the first stack of semiconductor channels being adjacent the second stack of semiconductor channels, a transition region overlapping neighboring protruding corners of the first stack of semiconductor channels and the second stack of semiconductor channels;
forming a plurality of sacrificial gates over the first stack of semiconductor channels and the second stack of semiconductor channels, the plurality of sacrificial gates extending in a first direction and being arranged along a second direction transverse the first direction based on a first pitch along a second direction, each of the plurality of sacrificial gates having a first width;
simultaneously with the forming a plurality of sacrificial gates, forming a bar structure over the transition region and adjacent to the plurality of sacrificial gates, the bar structure having a second width that exceeds a sum of the first pitch and the first width;
forming a plurality of source/drain openings in areas of the first and second stacks of semiconductor channels that are exposed by the plurality of sacrificial gates and the bar structure;
forming a plurality of source/drain regions in the plurality of source/drain openings;
replacing the plurality of sacrificial gates with a plurality of gate structures that wrap around the semiconductor channels of the first and second stacks of semiconductor channels;
simultaneously with replacing the plurality of sacrificial gates, replacing the bar structure with an inactive gate structure; and
replacing the inactive gate structure with an isolation structure.
2 . The method of claim 1 , wherein the forming a bar structure includes forming the bar structure over a boundary between an N-type diffusion region and a P-type diffusion region, the boundary including rounding jog.
3 . The method of claim 1 , wherein the forming a bar structure includes forming the bar structure over a boundary between a first region of the substrate in which the first and second stacks of semiconductor channels include a first number of semiconductor channels and a second region of the substrate in which the first and second stacks of semiconductor channels include a second number of semiconductor channels, the first number exceeding the second number.
4 . The method of claim 1 , wherein the forming a bar structure includes forming the bar structure that partially covers the first and second stacks of semiconductor channels in the transition region while exposing at least a portion of the first and second stacks of semiconductor channels in the transition region.
5 . The method of claim 1 , wherein the forming a bar structure includes:
forming a first bar structure having a second width along the second direction; and
forming a second bar structure adjoining the first bar structure, the second bar structure having a third width along the second direction that exceeds the second width.
6 . The method of claim 5 , wherein the forming a second bar structure includes forming the second bar structure having the second width that is at least a sum of two of the first pitch and one of the first width.
7 . The method of claim 1 , wherein the forming a bar structure includes forming the bar structure having the first width that is in a range of about 30 nanometers to about 90 nanometers.
8 . A method, comprising:
forming a first sacrificial gate structure having a first width;
forming a second sacrificial gate structure having the first width and being offset from the first sacrificial gate structure by a pitch;
forming a bar structure having a second width that exceeds a sum of the pitch and the first width, the bar structure being formed with the first and second sacrificial gate structures;
forming a plurality of source/drain openings by recessing a stack of nanostructures underlying the first and second sacrificial gates and the bar structure, a transition region of the stack of nanostructures being protected by the bar structure during the forming a plurality of source/drain openings; and
forming a plurality of source/drain regions in the plurality of source/drain openings.
9 . The method of claim 8 , further comprising:
removing the bar structure;
forming an opening in the transition region; and
forming an isolation structure in the opening.
10 . The method of claim 9 , wherein the forming an isolation structure includes forming an isolation structure that extends from a level below the stack of nanostructures to a level above the stack of nanostructures.
11 . The method of claim 9 , wherein the forming an opening includes removing the stack of nanostructures in the transition region entirely.
12 . The method of claim 9 , wherein the forming an opening includes forming the opening at an outer portion of the stack of nanostructures in the transition region, the opening having width substantially equal to the first width.
13 . The method of claim 10 , wherein the forming an isolation structure includes forming the isolation structure that lands on an isolation region that is between the stack of nanostructures and another adjacent stack of nanostructures.
14 . The method of claim 13 , wherein the forming an isolation structure includes forming the isolation structure that has a portion that extends into a semiconductor fin to a level below that of an upper surface of the isolation region.
15 . A method comprising:
forming a first stack of nanostructure channels having a first width along a first direction;
forming a second stack of nanostructure channels having a second width along the first direction that exceeds the first width,
the second stack of nanostructure channels being offset from the first stack of nanostructure channels along a second direction transverse the first direction;
forming a first source/drain in contact with the first stack of nanostructure channels;
forming a second source/drain in contact with the second stack of nanostructure channels;
forming a first gate structure over and wrapping around the nanostructure channels of the first stack of nanostructure channels;
forming a second gate structure over and wrapping around the nanostructure channels of the second stack of nanostructure channels; and
forming an isolation structure that is between the first source/drain and the second source/drain, the isolation structure extending from a first level below the first and second stacks of nanostructure channels to a second level above the first and second stacks of nanostructure channels.
16 . The method of claim 15 , wherein the isolation structure is separated from the first gate structure by a first distance and has width that exceeds the first distance.
17 . The method of claim 16 , wherein the isolation structure has width that exceeds twice the first distance.
18 . The method of claim 15 , wherein the isolation structure includes:
a first isolation region;
a second isolation region; and
an inactive gate structure between the first and second isolation regions.
19 . The method of claim 18 , wherein the first isolation region includes:
a first portion that extends into a fin underlying the first and second stacks of nanostructure channels; and
a second portion that lands on a shallow trench isolation between the first stack of nanostructure channels and another stack of nanostructure channels offset from the first stack of nanostructure channels along the first direction.
20 . The method of claim 15 , wherein number of nanostructure channels in the first stack of nanostructure channels exceeds number of nanostructure channels in the second stack of nanostructure channels.