IP Library Granted Patent US 12690278
Granted Patent B2
US 12690278 · App. 17/428,725 · Granted Jul 21, 2026

Metal oxynitride back contact layers for photovoltaic devices

Inventors: Changming Jin (Sylvania, OH); Vijay Karthik Sankar (Dearborn, MI)
Assignee: First Solar, Inc.
H10F19/908H10F10/162H10F19/906
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Quick Facts
Patent No.
US 12690278
App. No.
17/428,725
Granted
Jul 21, 2026
Kind
B2
Abstract

According to the embodiments provided herein, back contacts for photovoltaic devices can include one or more metal oxynitride layers.

Claims (23)

1 . A photovoltaic device comprising:

a substrate;

a front contact over the substrate;

an absorber layer over the front contact;

a conducting layer having a surface formed by a layer comprising aluminum; and

a back contact between the absorber layer and the conducting layer, the back contact having a first surface, a second surface, and a thickness defined between the first surface of the back contact and the second surface of the back contact, wherein:

the thickness of the back contact is in a range of about 10 nm to about 150 nm;

the first surface of the back contact is in contact with the absorber layer;

the second surface of the back contact is in contact with the surface of the conducting layer;

the back contact comprises: a first layer comprising zinc and tellurium; a second layer comprising zinc and tellurium; and a layer comprising a metal oxynitride material; wherein:

the metal of the metal oxynitride material is at least one of titanium or tungsten;

the first layer comprises a first dopant; and

the second layer comprises a second dopant.

2 . The photovoltaic device of claim 1 , wherein the metal oxynitride material is composed of about 50% or less oxygen or nitrogen.

3 . The photovoltaic device of claim 1 , wherein:

the first dopant includes a copper dopant, a silver dopant or both; and

the second dopant is a group I dopant.

4 . The photovoltaic device of claim 1 , further comprising a high purity metal layer, wherein:

the high-purity metal layer consists essentially of: titanium, tungsten, tantalum, zirconium, or combinations thereof;

the high-purity metal layer has a thickness between about 1 nm to about 5 nm; and

the high purity metal layer is between the layer comprising the metal oxynitride material and the second layer of the back contact.

5 . The photovoltaic device of claim 4 , wherein the metal oxynitride material includes a thickness in a ratio of at least about 2:1 in comparison to the high purity metal layer.

6 . The photovoltaic device of claim 1 , wherein the absorber layer includes a group I dopant, a group V dopant or a combination thereof.