LED display element and method of manufacturing same
A monolithic type LED display element includes: an n-layer; an active layer; a p-layer; an n-electrode; and p-electrodes, regions of the active layer facing the p-electrodes serve as light-emitting portions, and at least one of the p-electrodes or the n-electrode includes a low-reflection layer in which a transparent conductive film containing a transparent conductive oxide and a light-transmitting metal film capable of transmitting light are alternately laminated.
1 . A monolithic type LED display element comprising:
an n-layer;
an active layer;
a p-layer;
an n-electrode; and
p-electrodes, wherein regions of the active layer facing the p-electrodes serve as light-emitting portions,
at least one of the p-electrodes or the n-electrode includes a low-reflection layer in which a transparent conductive film containing a transparent conductive oxide and a light-transmitting metal film capable of transmitting light are alternately laminated, and
wherein the low-reflection layer, as a whole, has conductivity.
2 . The LED display element according to claim 1 , wherein the low-reflection layer comprises a light-impermeable metal film laminated on an opposite end of the n-layer.
3 . The LED display element according to claim 2 , wherein each of the p-electrodes comprises a p-contact layer in contact with the p-layer and the low-reflection layer laminated on the p-contact layer.
4 . The LED display element according to claim 3 , wherein a total thickness of the low-reflection layer laminated on the p-contact layer is larger than a thickness of the p-contact layer.
5 . The LED display element according to claim 3 , wherein the p-contact layer comprises a transparent conductive oxide, and
a layer in the low-reflection layer closest to the p-contact layer is the light-transmitting metal film.
6 . The LED display element according to claim 2 , wherein the n-electrode comprises an n-contact layer in contact with the n-layer and the low-reflection layer laminated on the n-contact layer.
7 . The LED display element according to claim 6 , wherein a total thickness of the low-reflection layer laminated on the n-contact layer is larger than a thickness of the n-contact layer.
8 . The LED display element according to claim 6 , wherein the n-contact layer comprises a metal, and
a layer in the low-reflection layer closest to the n-contact layer is the transparent conductive film.
9 . The LED display element according to claim 8 , wherein a thickness of the light-transmitting metal film constituting the low-reflection layer laminated on the n-contact layer is larger than a thickness of the n-contact layer.
10 . The LED display element according to claim 1 , wherein a thickness of the light-transmitting metal film closest to the n-layer is smaller than a thickness of the transparent conductive film closest to the n-layer.
11 . The LED display element according to claim 1 , wherein each of the p-electrodes comprises a p-contact layer in contact with the p-layer and the low-reflection layer laminated on the p-contact layer.
12 . The LED display element according to claim 11 , wherein a total thickness of the low-reflection layer laminated on the p-contact layer is larger than a thickness of the p-contact layer.
13 . The LED display element according to claim 11 , wherein the p-contact layer comprises a transparent conductive oxide, and
a layer in the low-reflection layer closest to the p-contact layer is the light-transmitting metal film.
14 . The LED display element according to claim 1 , wherein the n-electrode comprises an n-contact layer in contact with the n-layer and the low-reflection layer laminated on the n-contact layer.
15 . The LED display element according to claim 14 , wherein a total thickness of the low-reflection layer laminated on the n-contact layer is larger than a thickness of the n-contact layer.
16 . The LED display element according to claim 14 , wherein the n-contact layer comprises a metal, and
a layer in the low-reflection layer closest to the n-contact layer is the transparent conductive film.
17 . The LED display element according to claim 16 , wherein a thickness of the light-transmitting metal film constituting the low-reflection layer laminated on the n-contact layer is larger than a thickness of the n-contact layer.
18 . The LED display element according to claim 1 , wherein the transparent conductive film comprises ITO or IZO.
19 . The LED display element according to claim 1 , wherein the light-transmitting metal film comprises at least one selected from Cr, Ir, Mo, Ni, Pt, Rh, Ta, Ti, V, W and TIN.
20 . A method of manufacturing the LED display element according to claim 1 , the method comprising:
a combination setting step of setting a plurality of combinations for thicknesses of respective layers included in the low-reflection layer;
an integration step of integrating, for the plurality of combinations, reflectance of the p-electrode or the n-electrode provided with the low-reflection layer in a wavelength range of 400 nm to 700 nm and an incident angle range of 0° to 16°;
a minimum integrated value extraction step of extracting a minimum integrated value from a plurality of integrated values obtained in the integration step;
a combination extraction step of extracting the combination corresponding to an integrated value equal to or less than twice the minimum integrated value in the plurality of integrated values obtained in the integration step; and
a forming step of forming the respective layers so that the thicknesses of the respective layers correspond to the combination extracted in the combination extraction step.