IP Library Granted Patent US 12690413
Granted Patent B2
US 12690413 · App. 18/234,591 · Granted Jul 21, 2026

Large format continuous imaging system

Inventors: Venkatakaushik Voleti (San Jose, CA); Mehdi Vaez-Iravani (Los Gatos, CA)
Assignee: Applied Materials Inc.
H10P72/0616G06T7/0004G06T7/73G06T2207/30148G06T2207/30204
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Quick Facts
Patent No.
US 12690413
App. No.
18/234,591
Granted
Jul 21, 2026
Kind
B2
Abstract

A scanning inspection apparatus detects anomalies on surfaces of objects such as substrates, substrates with bonded chiplets, and carriers with singulated chiplets and the like. In some embodiments, the inspection apparatus includes a time delay integrated (TDI) linear sensor with an optical input and a data output where more than one optical assembly is positioned adjacent to each other with an optical output focused on a different segment of the TDI linear sensor and with an optical input positioned to receive a portion of a surface under examination. The apparatus may further include a platform with an upper surface for supporting an object with the surface under examination and with a motion assembly to move the platform and with a controller in communication with the motion assembly to move the platform in relation to the optical input of the optical assembly.

Claims (47)

1 . An inspection apparatus for detecting anomalies, comprising:

at least one time delay integrated (TDI) linear sensor that has a TDI linear sensor length, a TDI linear sensor optical input, and a TDI linear sensor data output; and

a plurality of optical assemblies positioned adjacent to and spaced apart from each other, wherein each of the plurality of optical assemblies is positioned with an optical output focused on a segment of the TDI linear sensor length and an optical input with an input field-of-view (FOV) positioned to receive a portion of a surface under examination, wherein the optical assemblies are microscope bodies, and wherein each of the optical assemblies has a different focal plane.

2 . The inspection apparatus of claim 1 , wherein the TDI linear sensor length is approximately 80 mm.

3 . The inspection apparatus of claim 1 , further comprising:

a platform with an upper surface for supporting an object with the surface under examination and with a motion assembly configured to move the platform; and

a controller in communication with the motion assembly to move the platform in relation to the optical input of the plurality of optical assemblies.

4 . The inspection apparatus of claim 3 , wherein the controller moves the platform to adjust a distance between the optical input and the surface under examination.

5 . The inspection apparatus of claim 3 , wherein the controller is in communication with the motion assembly, the plurality of optical assemblies, and the TDI linear sensor and is configured to scan an entire surface of a substrate.

6 . The inspection apparatus of claim 5 , wherein the substrate has chiplets bonded to the substrate.

7 . The inspection apparatus of claim 3 , wherein the controller is in communication with the motion assembly, the optical assemblies, and the TDI linear sensor and is configured to scan a carrier with singulated chiplets.

8 . An inspection apparatus for detecting anomalies, comprising:

at least one time delay integrated (TDI) linear sensor that has a TDI linear sensor length, a TDI linear sensor optical input, and a TDI linear sensor data output;

a plurality of optical assemblies positioned adjacent to each other, wherein each of the plurality of optical assemblies is positioned with an optical output focused on a segment of the TDI linear sensor length and an optical input with an input field-of-view (FOV) positioned to receive a portion of a surface under examination;

a platform with an upper surface for supporting an object with the surface under examination and with a motion assembly configured to move the platform;

a controller in communication with the motion assembly to move the platform in relation to the optical input of the plurality of optical assemblies; and

an integrated Z-profiler with a laser-based auto-focus module configured to determine a Z-profile of the surface under examination prior to acquisition of a surface image by the TDI linear sensor; or

an external Z-profiler configured to provide a Z-profile of the surface under examination prior to acquisition of a surface image by the TDI linear sensor, wherein the external Z-profiler is in communication with the controller.

9 . The inspection apparatus of claim 1 , wherein the plurality of optical assemblies have a similar focus and FOV.

10 . The inspection apparatus of claim 1 , wherein at least one of the plurality of optical assemblies incorporates epi-illumination or darkfield illumination.

11 . The inspection apparatus of claim 1 , wherein at least one of the plurality of optical assemblies has a tunable lens that adjusts a focal plane of the at least one of the plurality of optical assemblies.

12 . An inspection apparatus for detecting anomalies, comprising:

at least one time delay integrated (TDI) linear sensor that has a TDI linear sensor length of approximately 50 mm to approximately 160 mm, a TDI linear sensor optical input, and a TDI linear sensor data output;

a plurality of optical assemblies positioned adjacent to each other, wherein each of the plurality of optical assemblies is positioned with an optical output focused on a segment of the TDI linear sensor length and an optical input with an input field-of-view (FOV) positioned to receive a portion of a surface under examination;

a platform with an upper surface for supporting an object with the surface under examination and with a 4-axis motion assembly that moves the platform;

a controller in communication with the 4-axis motion assembly, the plurality of optical assemblies, and the TDI linear sensor and is configured to scan an entire surface of a substrate or a carrier; and

a Z-profiler that determines a Z-profile of the surface under examination prior to acquisition of a surface image by the TDI linear sensor.

13 . The inspection apparatus of claim 12 , wherein the substrate has chiplets bonded to the substrate.

14 . The inspection apparatus of claim 12 , wherein the plurality of optical assemblies have a similar focus and FOV.

15 . The inspection apparatus of claim 12 , wherein at least one of the plurality of optical assemblies incorporates epi-illumination or darkfield illumination.

16 . The inspection apparatus of claim 12 , wherein at least one of the plurality of optical assemblies has a tunable lens that adjusts a focal plane of the at least one of the plurality of optical assemblies.

17 . An inspection apparatus for detecting anomalies, comprising:

at least one time delay integrated (TDI) linear sensor that has a TDI linear sensor length of approximately 50 mm to approximately 160 mm, a TDI linear sensor optical input, and a TDI linear sensor data output;

a plurality of optical assemblies positioned adjacent to each other, wherein each of the plurality of optical assemblies is positioned with an optical output focused on a segment of the TDI linear sensor length and an optical input with an input field-of-view (FOV) positioned to receive a portion of a surface under examination;

a platform with an upper surface for supporting an object with the surface under examination and with a 4-axis motion assembly configured to move the platform;

a controller in communication with the 4-axis motion assembly, the plurality of optical assemblies, and the TDI linear sensor and is configured to scan an entire surface of a substrate or a carrier; and

an integrated Z-profiler with a laser-based auto-focus module configured to determine a Z-profile of the surface under examination prior to acquisition of a surface image by the TDI linear sensor; or

an external Z-profiler configured to provide a Z-profile of the surface under examination prior to acquisition of a surface image by the TDI linear sensor, wherein the external Z-profiler is in communication with the controller.

18 . A method of obtaining inspection data, comprising:

determining a Z-profile of a surface of a substrate or carrier under examination prior to acquisition of a surface image;

scanning across the surface of the substrate or carrier with a plurality of optical assemblies positioned adjacent to each other;

receiving image data from the surface into the plurality of optical assemblies which is focused onto a single time delay integration (TDI) linear sensor, wherein each optical assembly focuses image data on a different portion of the TDI linear sensor;

reconstructing the image data from the TDI linear sensor to form reconstructed image data and mapping the reconstructed image data to a location on the surface;

analyzing the reconstructed image data and location data to determine locations of anomalies and form a defectivity map of the surface; and

forming inferences based on the defectivity map and performing a corrective action based on the inferences.

19 . The method of claim 18 , wherein the corrective action includes marking chiplets as defective and removing the chiplets from a bonder selection pool.

20 . The method of claim 18 , wherein the corrective action includes augmenting a pre-bonding process to mitigate future anomalies.