Sensor station, data acquisition method and substrate treating system

1 . A sensor station configured to be seated on a load port that is provided in a substrate treating apparatus, the sensor station comprising:

a body providing an inner space for storing a substrate-type sensor, the substrate-type sensor configured to be taken into a process chamber of the substrate treating apparatus and measure data;

a power source unit installed at the body, the power source unit configured to transmit a power to the substrate-type sensor;

a processing unit installed at the body, the processing unit configured to process the data measured by the substrate-type sensor; and

a communication unit installed at the body, the communication unit configured to exchange the data with the substrate-type sensor and a server of a substrate treating system, the server being outside the substrate treating apparatus,

wherein the body comprises

a housing with one side open, and

a door configured to define the inner space with the body,

wherein, when the sensor station is seated on the load port and the door is opened by an opening/closing robot of the substrate treating apparatus, the communication unit is configured to collect the data transmitted by the substrate-type sensor taken into the process chamber and transmit the data to the server,

wherein a first period, during which the substrate-type sensor measures the data within the process chamber, and a second period, during which the communication unit collects and transmits the data to the server, overlap at least partially,

wherein the sensor station seated on the load port is exposed to an outside of the substrate treating apparatus, and

wherein the sensor station with the door open is also exposed to an inside of the substrate treating apparatus.

2 . The sensor station of claim 1 , wherein the body further comprises a flange, the flange installed at the housing and configured to be gripped by a gripper of a transfer device.

3 . The sensor station of claim 1 , wherein the power source unit comprises:

a power receiving part configured to receive the power from an outer power source;

a power storing part configured to store the power received at the power receiving part; and

a power transferring part configured to transmit the power of the power storing part to the substrate-type sensor stored at the inner space.

4 . The sensor station of claim 1 , wherein the communication unit comprises:

a first communication part configured to exchange the data with the substrate-type sensor; and

a second communication part configured to exchange the data with the server of the substrate treating system.

5 . The sensor station of claim 4 , wherein the communication unit further comprises a communication conversion part configured to mediate a-communication between heterogeneous networks.

6 . The sensor station of claim 1 , wherein the processing unit comprises:

a data processing part configured to process the data transmitted by the substrate-type sensor to generate post-treatment data; and

a data storing part configured to store the post-treatment data generated by the data processing part and the data transmitted by the substrate-type sensor through the communication unit.

7 . A substrate treating system comprising:

a substrate treating apparatus configured to treat a substrate, the substrate treating apparatus including a load port for placing a container storing the substrate, a process chamber configured to treat the substrate, and a transfer unit configured to transfer the substrate between the container and the process chamber;

a substrate-type sensor configured to measure data at the process chamber, the substrate-type sensor including a body configured to be transferred to the process chamber by the transfer unit, a data measurement member installed at the body and configured to measure the data, and a transfer member and a power source member installed at the body and configured to transmit the data measured by the data measurement member;

a server outside the substrate treating apparatus; and

a sensor station configured to be seated on the load port,

wherein the sensor station comprises

a housing with one side open,

a door configured to define an inner space by being coupled with the housing,

a flange installed at the housing, the flange configured to be gripped by a gripper of a transfer device, and

a communication unit installed at the body, the communication unit configured to exchange data with the substrate-type sensor and the server,

wherein the substrate treating apparatus further comprises an opening/closing robot, the opening/closing robot being configured to open or close the door of the sensor station placed on the load port,

wherein the opening/closing robot is configured to open the door of the sensor station placed on the load port while the substrate-type sensor measures the data at the process chamber,

wherein, when the sensor station is seated on the load port and the door is opened, the communication unit is configured to collect the data transmitted by the substrate-type sensor taken into the process chamber and transmit the data to the server,

wherein a first period, in which the substrate-type sensor measures the data within the process chamber, and a second period, during which the communication unit collects the data and transmits the data to the server, overlap at least partially,

wherein the sensor station seated on the load port is exposed to an outside of the substrate treating apparatus, and

wherein the sensor station with the door open is also exposed to an inside of the substrate treating apparatus.

8 . The substrate treating system of claim 7 , wherein the sensor station further comprises:

a power source unit installed at the body and configured to transfer a power to the power source member; and

a processing unit installed at the body and configured to process the data measured at the data measurement member.

9 . The substrate treating system of claim 8 , wherein the power source unit comprises:

a power receiving part configured to receive the power from an outer power source;

a power storing part configured to store the power received at the power receiving part; and

a power transferring part configured to transfer the power of the power storing part to the substrate-type sensor stored at the inner space.

10 . The substrate treating system of claim 7 , wherein the communication unit further comprises communication conversion part configured to mediate a communication between heterogeneous networks.

11 . The substrate treating system of claim 7 , wherein the processing unit comprises:

a data processing part configured to process the data transferred by the substrate-type sensor to generate post-treatment data; and

a data storing part configured to store the post-treatment data generated by the data processing part or the data transferred through the communication unit by the substrate-type sensor.

12 . The substrate treating system of claim 7 , wherein the transfer device is configured to transfer the sensor station and the container.