CMP inner ring in smart head
The disclosure provides an apparatus for substrate polishing, the apparatus includes a housing member, a carrier member, and a distal force assembly. The carrier member is coupled to and disposed radially outward of the housing member. The distal force assembly disposed radially inward of an exterior portion of the carrier member and radially outward of the housing member. The distal force assembly includes a bladder seal, a seal ring in contact with the bladder seal. The seal ring has a seal ring face and one or more grooves disposed therein. The grooves include a plateau radius and a ridge radius disposed opposite the plateau radius at an intersection between the seal ring face and the grooves, wherein the plateau radius and the ridge radius are between about 0.012 to about 0.018 inches. The distal force assembly also includes a transfer ring coupled to the seal ring opposite the bladder.
1 . An apparatus for substrate polishing, comprising:
a housing member;
a carrier member coupled to and disposed radially outward of the housing member; and
a distal force assembly disposed radially inward of an exterior portion of the carrier member and radially outward of the housing member, the distal force assembly comprising:
a bladder seal;
a seal ring in contact with the bladder seal, the seal ring having a seal ring face and one or more grooves disposed in the seal ring face, the grooves comprising:
a plateau radius disposed at an intersection between the seal ring face and the one or more grooves; and
a ridge radius disposed opposite the plateau radius at an intersection between the seal ring face and the grooves, wherein the plateau radius and the ridge radius are between about 0.012 to about 0.018 inches; and
a transfer ring coupled to the seal ring opposite the bladder seal,
wherein the one or more grooves form a plateau region in the seal ring face, and
wherein the plateau region has a plurality of seal mounts, each seal mount of the plurality of seal mounts comprises a receiving face and one or more features, the features being sloped faces.
2 . The apparatus of claim 1 , wherein the seal ring is stainless steel and the transfer ring is a polymer.
3 . The apparatus of claim 1 , wherein the receiving face slopes from the seal ring face towards a bolt hole in the seal ring.
4 . The apparatus of claim 3 , the bladder seal includes a coating, the coating having a thickness between about 0.3 and about 0.8 microns thick.
5 . The apparatus of claim 4 , wherein the bladder seal has a hardness of greater than about 40 on the Shore A hardness scale.
6 . A distal force assembly for use in a substrate carrier, comprising:
a bladder seal;
a seal ring in contact with the bladder seal, the seal ring having a seal ring face and two or more grooves disposed in the seal ring face, the two or more grooves comprising:
a plateau radius disposed at an intersection between the seal ring face and the two or more grooves; and
a ridge radius disposed opposite the plateau radius at an intersection between the seal ring face and the two or more grooves, wherein the plateau radius and the ridge radius are between about 0.012 to about 0.018 inches; and
a transfer ring coupled to the seal ring opposite the bladder seal,
a seal mount disposed between two of the two or more grooves; and
sealing hardware disposed through the bladder seal and connecting the bladder seal to the seal ring,
wherein the seal mount comprises:
an interior feature, the interior feature being an angled face that slopes towards a bottom face of the two or more grooves from the receiving face; and
an exterior feature, the exterior feature being an angled face that slopes towards the bottom face of the two or more grooves from a receiving face and the interior feature.
7 . The distal force assembly of claim 6 , wherein the distal force assembly is circular assembly.
8 . The distal force assembly of claim 6 , wherein the bladder seal comprises one or more seal features configured to align with the two or more grooves of the seal ring.
9 . The distal force assembly of claim 6 , wherein bladder seal has a hardness of greater than about 40 on the Shore A hardness scale.
10 . The distal force assembly of claim 6 , wherein the plateau radius and the ridge radius are about equal.
11 . The distal force assembly of claim 6 , wherein the ridge radius is between about 0.014 inches.
12 . A metal seal ring for use in a distal force assembly of a substrate polishing apparatus, comprising:
a plateau region disposed between two grooves, the plateau region and two grooves disposed on a seal ring face of the seal ring, the two grooves comprising:
a plateau radius disposed at an intersection between the seal ring face and the two grooves; and
a ridge radius disposed opposite the plateau radius at an intersection between the seal ring face and the two grooves, wherein the plateau radius and the ridge radius are between about 0.012 to about 0.018 inches,
wherein the metal seal ring further comprises a seal mount, the seal mount having a receiving face that slopes from the seal ring face to a bottom face of the two grooves.
13 . The metal seal ring of claim 12 , wherein the plateau radius is disposed opposite the ridge radius.
14 . The metal seal ring of claim 12 , wherein the seal mount comprises:
an interior feature, the interior feature being an angled face that slopes towards the bottom face of the two grooves from the receiving face; and
an exterior feature, the exterior feature being an angled face that slopes towards the bottom face of the two grooves from the receiving face and the interior feature.