Photosensitive polymer and resist composition having the same
Disclosed are a photosensitive polymer including a repeating unit of Chemical Formula 1 or Chemical Formula 2 derived from a vinyl heteroaromatic compound and a resist composition including the same. In Chemical Formula 1 or 2, R 1 and R 2 are hydrogen or a methyl group, X is a carbon, sulfur, or a nitrogen atom, and n is 1 or 2.
1 . A photosensitive polymer, comprising
a repeating unit (1) of a vinyl heteroaromatic compound, wherein the vinyl heteroaromatic compound is any one selected from the following compounds:
wherein R 1 is hydrogen or a methyl group,
a repeating unit (2) of the following Chemical formula:
wherein, R 3 is hydrogen or a methyl group, and R 4 is a tertiary alkyl group,
a repeating unit (3) of the following Chemical formula:
wherein, R 3 is hydrogen or a methyl group, and R 4 is a lactone derivative, and
a repeating unit (4) of the following Chemical formula:
wherein, R 5 is hydrogen or a methyl group,
R 6 is a cycloalkyl group including a polar group selected from a hydroxyl group, a carboxyl group, and a combination thereof.
2 . The photosensitive polymer of claim 1 , wherein the lactone derivative has a substituent having a structure of Chemical Formula 6:
wherein, in Chemical Formula 6, two of X 1 to X 4 are independently C═O and O, and the rest other than C═O and O are C(R 8 ) 2 wherein R 8 is hydrogen, an alkyl, or an alkylene forming a fused ring with a pentagonal ring.
3 . The photosensitive polymer of claim 2 , wherein the lactone derivative is butyrolactonyl, valerolactonyl, 1,3-cyclohexanecarbolactonyl, 2,6-norbornanecarbolacton-5-yl, or 7-oxa-2,6-norbornanecarbolacton-5-yl.
4 . The photosensitive polymer of claim 1 , wherein the photosensitive polymer has a weight average molecular weight (Mw) of about 3000 to about 30,000.
5 . A resist composition, comprising:
(a) the photosensitive polymer of claim 1 ;
(b) a photoacid generator (PAG); and
(c) an organic solvent.
6 . The resist composition of claim 5 , wherein the photosensitive polymer is included in an amount of about 5 to about 50 parts by weight based on 100 parts by weight of the resist composition.
7 . The resist composition of claim 5 , wherein the photoacid generator is included in an amount of about 1 part by weight to about 10 parts by weight based on 100 parts by weight of the resist composition.
8 . The resist composition of claim 5 , wherein the resist composition further comprises about 0.01 parts by weight to about 1 part by weight of an organic base based on 100 parts by weight of the resist composition.