Quantum dot surface treatment method and surface treatment apparatus
A quantum dot surface treatment method including continuously supplying a solution containing a silicone compound and a quantum dot having a surface to which a ligand having a coordinating substituent and a reactive substituent is coordinated by virtue of the coordinating substituent, to a reaction flow path made of a material that transmits light, and emitting light to the reaction flow path, so that the silicone compound and the reactive substituent undergo a photopolymerization reaction, thereby coating the surface of the quantum dot with the silicone compound. Thus, the quantum dot surface treatment method is provided that enables to, even in the case of performing surface treatment using a large amount of solution, obtain a quantum dot having excellent stability with high productivity by stably coating the surface of the quantum dot with the silicone compound, and provide a wavelength conversion material with high reliability.
1 . A quantum dot surface treatment method comprising continuously supplying a solution containing a silicone compound and a quantum dot having a surface to which a ligand having a coordinating substituent and a reactive substituent is coordinated by virtue of the coordinating substituent, to a reaction flow path made of quartz, and emitting light to the reaction flow path, so that the silicone compound and the reactive substituent undergo a photopolymerization reaction, thereby coating the surface of the quantum dot with the silicone compound, wherein
the reaction flow path is tubular,
a concentration of the solution and/or a diameter of the reaction flow path are adjusted such that a transmittance of the light that transmits through the reaction flow path is at least 0.1% or more, and
wherein an amount of the solution containing the silicone compound and the quantum dot is 200 mL or more.
2 . The quantum dot surface treatment method according to claim 1 , wherein the coordinating substituent is one or more kinds of an amino group, a thiol group, a carboxyl group, a phosphino group, and a quaternary ammonium salt.
3 . The quantum dot surface treatment method according to claim 2 , wherein the reactive substituent is one or more kinds of a vinyl group, an acrylic group, a methacryl group, a thiol group, an epoxy group, and an oxetanyl group.
4 . The quantum dot surface treatment method according to claim 1 , wherein the reactive substituent is one or more kinds of a vinyl group, an acrylic group, a methacryl group, a thiol group, an epoxy group, and an oxetanyl group.
5 . The quantum dot surface treatment method according to claim 1 , wherein the coordinating substituent is one or more kinds of an amino group, a thiol group, a phosphino group, and a quaternary ammonium salt.
6 . The quantum dot surface treatment method according to claim 1 , wherein the reactive substituent is one or more kinds of a thiol group, an epoxy group, and an oxetanyl group.
7 . The quantum dot surface treatment method according to claim 1 ,
wherein the coordinating substituent is one or more kinds of an amino group, a thiol group, a phosphino group, and a quaternary ammonium salt, and
wherein the reactive substituent is one or more kinds of a thiol group, an epoxy group, and an oxetanyl group.
8 . The quantum dot surface treatment method according to claim 1 , wherein the ligand is a straight chain having 20 or fewer carbons.
9 . The quantum dot surface treatment method according to claim 1 , wherein a concentration of the solution and/or a diameter of the reaction flow path are adjusted such that a transmittance of the light that transmits through the reaction flow path is 0.1% or more and 0.4% or less.