IP Library Granted Patent US 12693193
Granted Patent B2
US 12693193 · App. 18/175,810 · Granted Jul 28, 2026

Manufacturing data analysis device and method

Inventors: Wataru Watanabe (Tokyo, JP); Keisuke Kawauchi (Kawasaki Kanagawa, JP); Takayuki Itoh (Kawasaki Kanagawa, JP); Jumpei Ando (Yokohama Kanagawa, JP); Toshiyuki Ono (Kawasaki Kanagawa, JP)
Assignee: KABUSHIKI KAISHA TOSHIBA
G01M99/00
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Quick Facts
Patent No.
US 12693193
App. No.
18/175,810
Granted
Jul 28, 2026
Kind
B2
Abstract

According to one embodiment, a manufacturing data analysis device includes processing circuitry. The processing circuitry acquires, from manufacturing data related to a plurality of products, first manufacturing data under a first acquisition condition. The first manufacturing data includes manufacturing condition data related to a manufacturing condition for each of the products and quality data related to quality for each of the products. The processing circuitry determines a second acquisition condition different from the first acquisition condition based on the first manufacturing data. The processing circuitry acquires second manufacturing data including the manufacturing condition data and the quality data from the manufacturing data under the second acquisition condition. The processing circuitry calculates an analysis result of a relationship between the manufacturing condition data and the quality data by analyzing the second manufacturing data. The processing circuitry generates output data including the analysis result.

Claims (64)

1 . A manufacturing data analysis device comprising processing circuitry configured to:

acquire first manufacturing data from manufacturing data,

wherein the manufacturing data includes pieces of data, and each of the pieces of data includes identification information for a plurality of products, and manufacturing condition data and quality data associated with the identification information, and

wherein the first manufacturing data corresponds to a first acquisition condition indicating a specific value or a range for the identification information, the manufacturing condition data, or the quality data;

determine a second acquisition condition different from the first acquisition condition and including at least a part of the first acquisition condition, based on the first manufacturing data;

acquire second manufacturing data from the manufacturing data, wherein the second manufacturing data corresponds to the second acquisition condition;

calculate a first analysis result for manufacturing data acquired under the first acquisition condition and the quality data;

calculate, for additional analysis, a second analysis result for manufacturing data acquired under the second acquisition condition different from the first acquisition condition and including at least a part of the first acquisition condition;

generate output data related to the first analysis result and additional output data related to the second analysis result; and

present, simultaneously, the output data related to the first analysis result and the additional output data related to the second analysis result for a user.

2 . The manufacturing data analysis device according to claim 1 , wherein the processing circuitry is configured to:

calculate an analysis result of a relationship between the manufacturing data and the quality data by analyzing the first manufacturing data; and

generate the output data further including the analysis result for the first manufacturing data.

3 . The manufacturing data analysis device according to claim 1 , wherein

the processing circuitry is configured to determine the second acquisition condition so that bias in distribution of a plurality of values included in the manufacturing condition data or the quality data in the first manufacturing data can be reduced.

4 . The manufacturing data analysis device according to claim 1 , wherein

the processing circuitry is configured to, if the manufacturing condition data or the quality data is qualitative data, determine the second acquisition condition so that the number of pieces of data for each type of values included in the qualitative data is equal to or greater than a predetermined threshold value.

5 . The manufacturing data analysis device according to claim 1 , wherein

the processing circuitry is configured to, if the manufacturing condition data or the quality data is quantitative data, determine the second acquisition condition so that a frequency for each class of values included in the quantitative data is equal to or greater than a predetermined threshold value.

6 . The manufacturing data analysis device according to claim 1 , wherein

the processing circuitry is configured to calculate a first degree of reliability related to the first manufacturing data and determine the second acquisition condition based on the first degree of reliability.

7 . The manufacturing data analysis device according to claim 6 , wherein

the processing circuitry is configured to calculate a second degree of reliability related to the second manufacturing data and determine the second acquisition condition so that the second degree of reliability is higher than the first degree of reliability.

8 . The manufacturing data analysis device according to claim 1 , wherein

the processing circuitry is configured to acquire, from the manufacturing data, the first manufacturing data under the first acquisition condition, the first manufacturing data including a manufacturing condition data group including a plurality of pieces of manufacturing condition data and a quality data group including a plurality of pieces of quality data,

the manufacturing condition data group includes first manufacturing condition data and second manufacturing condition data different from the first manufacturing condition data, and

the processing circuitry is configured to:

determine the second acquisition condition based on the first manufacturing data;

acquire the second manufacturing data including the manufacturing condition data group and the quality data group from the manufacturing data under the second acquisition condition;

calculate a first degree of influence exerted by the first manufacturing condition data on each of the pieces of quality data and a second degree of influence exerted by the second manufacturing condition data on each of the pieces of quality data by analyzing the first manufacturing data and the second manufacturing data; and

generate first output data including a content related to at least one of the first manufacturing condition data, quality data on which the first manufacturing condition data has exerted the first degree of influence satisfying a first determination condition, or the first degree of influence satisfying the first determination condition, and generate second output data including a content related to at least one of the second manufacturing condition data, quality data on which the second manufacturing condition data has exerted the second degree of influence satisfying a second determination condition, or the second degree of influence satisfying the second determination condition.

9 . The manufacturing data analysis device according to claim 8 , further comprising a display device configured to display the second output data obtained by analyzing the second manufacturing data.

10 . The manufacturing data analysis device according to claim 8 , further comprising a display device configured to display the first output data or the second output data including a degree of reliability of each analysis result.

11 . The manufacturing data analysis device according to claim 8 , further comprising a display device configured to display the first output data obtained by analyzing the first manufacturing data.

12 . The manufacturing data analysis device according to claim 1 , wherein the first acquisition condition includes at least one of a product number, a list of product numbers, a time or a time period when a product is processed or inspected, a lot number, a material name or a device name, a list of material names or device names, or a size, a weight, electrical characteristics, or physical characteristics of a product.

13 . The manufacturing data analysis device according to claim 1 , wherein the second acquisition condition is a condition to acquire a greater number of the pieces of data from the manufacturing data than the first acquisition condition.

14 . The manufacturing data analysis device according to claim 1 , wherein the output data includes a diagram in which a first axis indicates the manufacturing condition data and a second axis indicates the quality data.

15 . A manufacturing data analysis device comprising processing circuitry configured to:

acquire first manufacturing data from manufacturing data,

wherein the manufacturing data includes pieces of data, and each of the pieces of data includes identification information for a plurality of products, and manufacturing condition data and quality data associated with the identification information, and

wherein the first manufacturing data corresponds to a first acquisition condition indicating a specific value or a range for the identification information, the manufacturing condition data, or the quality data;

determine a second acquisition condition different from the first acquisition condition and including at least a part of the first acquisition condition, based on the first manufacturing data;

acquire second manufacturing data from the manufacturing data, wherein the second manufacturing data corresponds to the second acquisition condition;

calculate a first analysis result of a relationship between the manufacturing condition data and the quality data by analyzing the first manufacturing data, and calculate, for additional analysis, a second analysis result of the relationship between the manufacturing condition data and the quality data by analyzing the second manufacturing data;

select at least one of the first analysis result or the second analysis result;

generate output data related to the first analysis result and additional output data related to the second analysis result; and

present, simultaneously, the output data related to the first analysis result and the additional output data related to the second analysis result for a user.

16 . The manufacturing data analysis device according to claim 15 , wherein

the first analysis result and the second analysis result each include an index value indicating a strength of the relationship between the manufacturing condition data and the quality data, and

the processing circuitry is configured to select the first analysis result or the second analysis result, whichever index value is larger.

17 . The manufacturing data analysis device according to claim 16 , wherein

the processing circuitry is configured to generate the output data in which an information amount and/or display priority of the selected analysis result is changed based on the index value included in the selected analysis result.

18 . The manufacturing data analysis device according to claim 17 , wherein the processing circuitry is configured to generate the output data so that, as the information amount becomes larger, a display area for the selected analysis result is enlarged in the output data.

19 . The manufacturing data analysis device according to claim 17 , wherein the processing circuitry is configured to generate the output data so that, as the display priority becomes higher, a display area for the selected analysis result is placed in an upper row in the output data.

20 . A manufacturing data analysis method comprising:

acquiring first manufacturing data from manufacturing data,

wherein the manufacturing data includes pieces of data, and each of the pieces of data includes identification information for a plurality of products, and manufacturing condition data and quality data associated with the identification information, and

wherein the first manufacturing data corresponds to a first acquisition condition indicating a specific value or a range for the identification information, the manufacturing condition data, or the quality data;

determining a second acquisition condition different from the first acquisition condition and including at least a part of the first acquisition condition, based on the first manufacturing data;

acquiring second manufacturing data from the manufacturing data, wherein the second manufacturing data corresponds to the second acquisition condition;

calculating a first analysis result for manufacturing data acquired under the first acquisition condition and the quality data;

calculate, for additional analysis, a second analysis result for manufacturing data acquired under the second acquisition condition different from the first acquisition condition and including at least a part of the first acquisition condition;

generating output data related to the first analysis result and additional output data related to the second analysis result; and

present, simultaneously, the output data related to the first analysis result and the additional output data related to the second analysis result for a user.