Processing of superhydrophilic, infrared transmissive, anti-reflective nanostructured surfaces
A method for producing nanostructured, hydrophilic, transmissive, anti-reflective surfaces is described. The method for providing a hydrophilic surface includes steps of providing a substrate that is transmissive in at least one wavelength in the infrared to ultraviolet range of the electromagnetic spectrum and comprises at least one surface including nanostructures of a size smaller than the at least one wavelength; and functionalizing the at least one surface with hydroxyl groups thereon. This method provides devices having excellent transmittance and anti-reflectance properties and which are resistant to seawater.
1 . A method of forming an anti-reflective, transmissive, superhydrophilic material, comprising:
providing a substrate that is transmissive in at least one wavelength in the infrared to ultraviolet range of the electromagnetic spectrum and comprising at least one surface having nanostructures of a size smaller than the at least one wavelength patterned directly into the at least one surface without a separate coating that can delaminate; and
functionalizing the at least one surface with hydroxyl groups thereon to form an anti-reflective, transmissive, superhydrophilic material, wherein the functionalizing step comprises plasma etching in an oxygen atmosphere.
2 . The method of claim 1 , wherein the substrate is selected from the group consisting of, fused silica, quartz-containing materials, germanium-containing materials, alumina-containing materials, and other optical and non-optical glasses, crystals and ceramics.
3 . The method of claim 1 , wherein the at least one wavelength comprises a range of wavelengths in the infrared range of the electromagnetic spectrum.
4 . The method of claim 1 , wherein the nanostructures have topological features selected from the group consisting of: jagged, pointed, cylindrical pillars, pointed cones, truncated cones, and a honeycomb pattern.
5 . The method of claim 1 , wherein the substrate is fused silica.