Optical apparatus including multilayered optical film structure and method and apparatus for planarizing the multilayered optical film structure

1 . An optical apparatus comprising:

a lower optical layer;

a nanostructure layer disposed on the lower optical layer, the nanostructure layer comprising an active region and a non-active region; and

a reflective pad disposed between the lower optical layer and the nanostructure layer to face the non-active region of the nanostructure layer,

wherein the nanostructure layer comprises a first dielectric patterned in the active region and unpatterned in the non-active region and a second dielectric filled between patterns of the first dielectric, and

wherein the first dielectric comprises a first material and the second dielectric comprises a second material different from the first material and having a different refractive index from a refractive index of the first material,

wherein an edge of the reflective pad proximate to the active region is disposed away from a boundary between the active region and the non-active region to form an offset away from the boundary,

wherein a size of the reflective pad is smaller than a size of the non-active region, and

wherein a height of an uppermost surface of the first dielectric in the non-active region is higher than a height of an uppermost surface of the first dielectric in the active region, wherein in the non-active region, the first dielectric has an inclined surface in an area disposed above the offset from a first upper surface which is proximate to the active region to the uppermost surface which disposed further from the active region.

2 . The optical apparatus of claim 1 , wherein the second dielectric is disposed to cover the upper surface of the first dielectric, and an upper surface of the second dielectric has a planar surface.

3 . The optical apparatus of claim 2 , wherein a thickness of the second dielectric on the upper surface of the first dielectric in the active region is greater by a thickness of the reflective pad than a thickness of the second dielectric on the upper surface of the first dielectric in the non-active region.

4 . The optical apparatus of claim 1 , wherein a thickness of the reflective pad is about 10 nm to about 50 nm.

5 . The optical apparatus of claim 1 , wherein the reflective pad is circular or polygonal having an area of about 5 μm 2 to about 25 μm 2 .

6 . The optical apparatus of claim 1 ,

wherein the second dielectric is disposed only between adjacent patterns of a plurality of patterns of the first dielectric in the active region,

wherein the first dielectric and the second dielectric comprise a planar common upper surface, and

wherein a thickness of the first dielectric in the active region is greater than a thickness of the first dielectric on the reflective pad.

7 . The optical apparatus of claim 1 , further comprising an etch stop layer disposed between the lower optical layer and the nanostructure layer, the etch stop layer being disposed to cover the reflective pad.

8 . The optical apparatus of claim 7 , wherein a height of an upper surface of the etch stop layer in the non-active region is greater than a height of an upper surface of the etch stop layer in the active region by a thickness of the reflective pad.

9 . The optical apparatus of claim 1 , further comprising an etch stop layer disposed between the lower optical layer and the nanostructure layer, wherein the reflective pad is disposed on the etch stop layer.

10 . The optical apparatus of claim 1 , wherein a width or a diameter of each pattern of a plurality of patterns of the first dielectric is about 10 nm to about 400 nm, and a thickness of each pattern of the plurality of patterns of the first dielectric is about 100 nm to about 1,500 nm.

11 . The optical apparatus of claim 1 ,

wherein the lower optical layer comprises a sensor substrate comprising a plurality of light sensing cells arranged to face the active region and a driving circuit region arranged to face the non-active region,

wherein the nanostructure layer comprises a meta lens layer comprising a plurality of lens elements disposed to face the plurality of light sensing cells in the active region, and

wherein the first dielectric in each of the plurality of lens elements is patterned to form a planar optical meta lens.

12 . The optical apparatus of claim 1 ,

wherein the lower optical layer comprises a sensor substrate comprising a plurality of light sensing cells arranged to face the active region and a driving circuit region arranged to face the non-active region,

wherein the nanostructure layer comprises a meta color filter layer comprising a plurality of color filters disposed to face the plurality of light sensing cells in the active region, and

wherein a plurality of the first dielectrics and a plurality of the second dielectrics are alternately arranged in a horizontal direction in the plurality of color filters.

13 . The optical apparatus of claim 12 , further comprising a first reflector disposed between the lower optical layer and the nanostructure layer and a second reflector disposed on the nanostructure layer,

wherein the reflective pad is disposed in the non-active region on the first reflector.

14 . The optical apparatus of claim 1 , wherein the nanostructure layer comprises a first nanostructure layer and a second nanostructure layer stacked in a thickness direction of the optical apparatus.

15 . The optical apparatus of claim 14 , further comprising a first metal reflective layer disposed between the first nanostructure layer and the second nanostructure layer, and a second metal reflective layer disposed on the second nanostructure layer.

16 . The optical apparatus of claim 15 ,

wherein the lower optical layer comprises a sensor substrate comprising a plurality of light sensing cells arranged to face the active region and a driving circuit region arranged to face the non-active region, and

wherein the first nanostructure layer, the first metal reflective layer, the second nanostructure layer, and the second metal reflective layer are configured to form a spectral filter layer comprising a plurality of spectral filters arranged in the active region.

17 . A method of manufacturing an optical apparatus, the method comprising:

forming a lower optical layer;

forming a reflective pad in an edge region of an upper surface of the lower optical layer;

forming an etch stop layer to a constant thickness to cover both the lower optical layer and the reflective pad;

forming a first dielectric on the etch stop layer to a constant thickness;

patterning a portion of the first dielectric disposed within an active region of the optical apparatus;

forming a second dielectric to be filled in a space between patterns of the patterned first dielectric and to cover the first dielectric; and

planarizing an upper surface of the second dielectric;

wherein the planarizing comprises:

irradiating illumination light to the reflective pad and detecting reflected light from the reflective pad; and

determining a polishing speed, a thickness of the second dielectric, and an end time of the planarizing by comparing a simulated reflectance spectrum of reflected light according to the thickness of the second dielectric obtained previously through simulation with an actually measured reflectance spectrum obtained by the detecting of the reflected light,

wherein a thickness of the second dielectric on an upper surface of the first dielectric in the active region is greater by a thickness of the reflective pad than a thickness of the second dielectric on the upper surface of the first dielectric in a non-active region of the optical apparatus,

wherein an edge of the reflective pad proximate to the active region is disposed away from a boundary between the active region and the non-active region to form an offset away from the boundary, and

wherein a size of the reflective pad is smaller than a size of the non-active region.

18 . The method of claim 17 , wherein the reflective pad is disposed to face a non-active region of the optical apparatus where the first dielectric is not patterned.