Apparatus and method for processing substrate
There are provided an apparatus and a method for providing a substrate, which can suppress any additional reaction between a developing solution and a photoresist (PR) film and prevent any PR remnants from being generated from such additional reaction. The method includes: supplying an organic developing solution onto a substrate while rotating the substrate at a first revolutions per minute (rpm); substituting the organic developing solution with a nonpolar rinse solution by supplying the nonpolar rinse solution onto the substrate while rotating the substrate at a second rpm, which is lower than the first rpm; continuing to supply the nonpolar rinse solution while rotating the substrate at a third rpm, which is higher than the second rpm; and continuing to supply the nonpolar rinse solution while rotating the substrate at a fourth rpm, which is between the second rpm and the third rpm.
1 . A method of processing a substrate, comprising:
supplying an organic developing solution onto a substrate while rotating the substrate at a first revolutions per minute (rpm) over a first period of time;
substituting the organic developing solution with a nonpolar rinse solution by starting a supplying of the nonpolar rinse solution onto the substrate while rotating the substrate at a second rpm that is lower than the first rpm over a second period of time following the first period of time;
continuing to supply the nonpolar rinse solution while rotating the substrate at a third rpm that is higher than the second rpm; and
rotating, after rotating the substrate at the third rpm, the substrate at a fourth rpm that is between the second rpm and the third rpm,
wherein the organic developing solution is continued to be supplied onto the substrate for a portion of the second period of time and stopped when the nonpolar rinse solution is starting to be supplied onto the substrate during the second period of time.
2 . The method of claim 1 , wherein
the substrate is provided in a state of having a negative photoresist (PR) film applied thereon and exposed to light, and
the organic developing solution is n-butyl acetate.
3 . The method of claim 2 , wherein a vapor pressure of the nonpolar rinse solution is lower than a vapor pressure of the organic developing solution.
4 . The method of claim 2 , wherein a viscosity of the nonpolar rinse solution is higher than a viscosity of the organic developing solution.
5 . The method of claim 1 , wherein the nonpolar rinse solution includes at least one of nonane, decane, undecane, and dodecane.
6 . The method of claim 1 , wherein the second period of time over which the substrate is rotated at the second rpm is longer than the third period of time over which the substrate is rotated at the third rpm.
7 . The method of claim 1 , wherein a first nozzle for supplying the organic developing solution and a second nozzle for supplying the nonpolar rinse solution are installed within a single arm of a single nozzle structure.
8 . The method of claim 1 , further comprising:
transferring the substrate with the nonpolar rinse solution remained thereon to a processing chamber for processing the substrate with a supercritical fluid.
9 . A method of processing a substrate, comprising:
a first step of supplying an organic developing solution onto a substrate with an exposed photoresist (PR) film formed thereon, while rotating the substrate at a first revolutions per minute (rpm) over a first period of time;
a second step of reducing a rotation speed of the substrate from the first rpm to a second rpm that is lower than the first rpm over a second period of time following the first period of time; and
a third step of removing PR reactants, generated from a reaction of the PR film with the organic developing solution, by raising the rotation speed of the substrate from the second rpm to a third rpm that is higher than the second rpm and lower than the first rpm,
wherein the organic developing solution is substituted with a rinse solution during the second step or during the third step by stopping the supplying of the organic developing solution while starting a supplying of the rinse solution onto the substrate during the second step or during the third step,
wherein the organic developing solution is continued to be supplied onto the substrate for a portion of the second period of time and stopped when the rinse solution is starting to be supplied onto the substrate during the second period of time.
10 . The method of claim 9 , wherein
the substrate is provided in a state of having a negative PR film applied thereon and exposed to light, and
the organic developing solution is n-butyl acetate.
11 . The method of claim 1 , wherein the first rpm being at least 1000 rpm.