Pattern generation device, pattern generation method and non-transitory computer-readable medium

1 . A pattern generation device comprising:

a memory; and

a processor coupled to the memory, the processor being configured to:

generate pattern data corresponding to a pattern of a metal layer provided on a surface of a dielectric layer based on a generation condition;

determine whether the generated pattern data satisfies a predetermined condition, wherein determining whether the generated pattern data satisfies the predetermined condition comprises: (i) identifying connected regions of the pattern represented by the pattern data by executing a connected-component labeling operation; and (ii) determining that the predetermined condition is satisfied when a first portion of the pattern and a second portion of the pattern are included in a same labeled connected region;

return to generate the pattern data when it is determined that the predetermined condition is not satisfied;

calculate a characteristic of the pattern or an element or circuit having the pattern when a high-frequency signal is inputted to the first portion of the pattern and a high-frequency signal is outputted from the second portion of the pattern by performing an electromagnetic field analysis based on the pattern data when it is determined that the predetermined condition is satisfied;

determine whether the calculated characteristic is within a target range;

change the generation condition when it is determined that the calculated characteristic is not within the target range; and

return to generate the pattern data after changing the generation condition.

2 . The pattern generation device according to claim 1 , wherein

the processor changes the generation condition so that the characteristic calculated based on pattern data generated based on the changed generation condition approaches the target range.

3 . The pattern generation device according to claim 1 , wherein

when it is determined that the predetermined condition is not satisfied, before returning to generate the pattern data, the processor changes the generation condition so that pattern data generated based on the changed generation condition approaches satisfaction of the predetermined condition.

4 . The pattern generation device according to claim 1 , wherein

when the processor generates the pattern data, the processor generates a plurality of weights respectively associated with a plurality of positions on the surface, and generates the pattern data based on the generated plurality of weights, and

wherein the generation condition is a condition for generating the plurality of weights.

5 . The pattern generation device according to claim 4 , wherein

when the processor generates the pattern data, the processor calculates a plurality of functions each having a position on the surface as a variable, the plurality of functions being related to the plurality of positions and having the plurality of weights, respectively, and generates the pattern in a corresponding unit region when an integrated value of the plurality of functions in the corresponding unit region is within a predetermined range for each of a plurality of unit regions into which the surface is divided, and does not generate the pattern in the corresponding unit region when the integrated value is not within the predetermined range.

6 . The pattern generation device according to claim 5 , wherein

the plurality of functions are Gaussian basis functions centered at the plurality of positions.

7 . The pattern generation device according to claim 1 , wherein

the predetermined condition is that the first portion and the second portion are physically connected via the pattern such that the first portion and the second portion are included in the same labeled connected region identified by the connected-component labeling operation.

8 . The pattern generation device according to claim 7 , wherein

when it is determined that the predetermined condition is not satisfied, before returning to generate the pattern data, the processor changes the generation condition so that a minimum distance between a pattern connected to the first portion and a pattern connected to the second portion in pattern data generated based on the changed generation condition becomes smaller.

9 . The pattern generation device according to claim 8 , wherein

when the processor generates the pattern data, the processor generates a plurality of different pattern data, and

the processor determines that the predetermined condition is satisfied when at least one of the plurality of different pattern data satisfies the predetermined condition, and determines that the predetermined condition is not satisfied when all of the plurality of different pattern data fail to satisfy the predetermined condition.

10 . A pattern generation method that causes a computer to execute a process, the process comprising:

generating pattern data corresponding to a pattern of a metal layer provided on a surface of a dielectric layer based on a generation condition;

determining whether the generated pattern data satisfies a predetermined condition, wherein determining whether the generated pattern data satisfies the predetermined condition comprises: (i) identifying connected regions of the pattern represented by the pattern data by executing a connected-component labeling operation; and (ii) determining that the predetermined condition is satisfied when a first portion of the pattern and a second portion of the pattern are included in a same labeled connected region;

returning to generating the pattern data when it is determined that the predetermined condition is not satisfied;

calculating a characteristic of the pattern or an element or circuit having the pattern when a high-frequency signal is inputted to the first portion of the pattern and a high-frequency signal is outputted from the second portion of the pattern by performing an electromagnetic field analysis based on the pattern data when it is determined that the predetermined condition is satisfied;

determining whether the calculated characteristic is within a target range;

changing the generation condition when it is determined that the calculated characteristic is not within the target range; and

returning to generating the pattern data after changing the generation condition.

11 . A non-transitory computer-readable recording medium storing a program that causes a computer to execute a process, the process comprising:

generating pattern data corresponding to a pattern of a metal layer provided on a surface of a dielectric layer based on a generation condition;

determining whether the generated pattern data satisfies a predetermined condition, wherein determining whether the generated pattern data satisfies the predetermined condition comprises: (i) identifying connected regions of the pattern represented by the pattern data by executing a connected-component labeling operation; and (ii) determining that the predetermined condition is satisfied when a first portion of the pattern and a second portion of the pattern are included in a same labeled connected region;

returning to generating the pattern data when it is determined that the predetermined condition is not satisfied;

calculating a characteristic of the pattern or an element or circuit having the pattern when a high-frequency signal is inputted to the first portion of the pattern and a high-frequency signal is outputted from the second portion of the pattern by performing an electromagnetic field analysis based on the pattern data when it is determined that the predetermined condition is satisfied;

determining whether the calculated characteristic is within a target range;

changing the generation condition when it is determined that the calculated characteristic is not within the target range; and

returning to generating the pattern data after changing the generation condition.