Managing beam power effects by varying base emissivity
A workpiece mounting system comprising a chuck and a base is disclosed. The emissivity of the base is increased to allow more heat transfer from the chuck to the base. In some embodiments, the emissivity of the base may be controllable so that for ion beams with lower power levels, the emissivity remains low, enabling the chuck to reach the desired temperature quickly. For ion beams with higher power levels, the emissivity may increase to allow more heat transfer to the base, allowing the chuck to maintain the desired temperature. High emissivity coatings may be applied to the top surface of the base. In other embodiments, a set of movable shields may be disposed between the chuck and the base. The position of the shields may be a function of the power level of the incoming ion beam.
1 . A system for mounting and heating a workpiece, comprising:
an electrostatic chuck; and
a base, separate from the electrostatic chuck by a gap of between 0.5 mm and 50 mm;
wherein a material having an emissivity different from the base is disposed on a top surface of the base and is separate from the electrostatic chuck, such that heat transfer between the electrostatic chuck and the base is achieved via radiative heating.
2 . The system of claim 1 , wherein the material comprises a high emissivity coating.
3 . The system of claim 2 , wherein the high emissivity coating has an emissivity of 0.4 or greater.
4 . The system of claim 2 , wherein the high emissivity coating has an emissivity of 0.6 or greater.
5 . The system of claim 2 , wherein the high emissivity coating comprises at least one of anodized aluminum, anodized titanium, SiC, alumina, graphite, silicon, silicon dioxide, nichrome, and ceramic coatings.
6 . The system of claim 1 , wherein the material comprises an electrochromic material.
7 . The system of claim 6 , wherein the electrochromic material comprises an electrochromic glass.
8 . The system of claim 7 , wherein the electrochromic glass has a transmissivity that changes by at least 30%, depending on a voltage applied to the electrochromic glass.
9 . A system for mounting and heating a workpiece, comprising:
an electrostatic chuck;
a base, separate from the electrostatic chuck, wherein an electrochromic material is disposed on a top surface of the base;
a controller configured to modify an amount of heat transfer between the electrostatic chuck and the base, based on a power level of an incoming ion beam;
and an electrochromic power supply in communication with the electrochromic material and the controller, wherein the controller controls a voltage supplied to the electrochromic material by the electrochromic power supply.
10 . The system of claim 9 , wherein an emissivity of the electrochromic material is greater than the emissivity of the top surface of the base.
11 . The system of claim 9 , wherein a transmissivity of the electrochromic material is at a first value when a low power ion beam is used and a second value, lower than the first value, when a high power ion beam is used.
12 . The system of claim 11 , wherein, when the transmissivity is the second value, the amount of heat transfer between the electrostatic chuck and the base is greater than the amount of heat transfer when the transmissivity is the first value.
13 . A system for mounting and heating a workpiece, comprising:
an electrostatic chuck;
a base, separate from the electrostatic chuck; and
a controller configured to modify an amount of heat transfer between the electrostatic chuck and the base, based on a power level of an incoming ion beam; and
movable shields disposed between the electrostatic chuck and the base.
14 . The system of claim 13 , wherein a top surface of the base is coated with a high emissivity material, having an emissivity of 0.4 or more.
15 . The system of claim 14 , wherein the movable shields are made of a material having an emissivity less than the emissivity of the high emissivity material.
16 . The system of claim 13 , wherein the movable shields are in a closed position when a low power ion beam is used and in an open position when a high power ion beam is used, wherein in the closed position, the movable shields are positioned such that a top surface of the movable shields is parallel to a bottom surface of the electrostatic chuck.
17 . The system of claim 13 , wherein the movable shields are in a closed position when a low power ion beam is used and in an open position when a high power ion beam is used, wherein in the closed position, the movable shields are positioned such that more than 80% of heat radiated by the electrostatic chuck is blocked by the movable shields so the heat does not travel directly to a top surface of the base from the electrostatic chuck.