Multi-zone heater with minimum RF loss
Exemplary substrate support assemblies may include an electrostatic chuck body defining a substrate support surface that defines a substrate seat. The substrate support assemblies may include a support stem coupled with the electrostatic chuck body. The substrate support assemblies may include an upper heater embedded within the electrostatic chuck body. The upper heater may include a center heater zone and one or more annular heater zones that are concentric with the center heating zone. The substrate support assemblies may include a lower heater embedded within the electrostatic chuck body at a position below the upper heater. The lower heater may include a plurality of arcuate heater zones.
1 . A substrate support assembly, comprising:
an electrostatic chuck body defining a substrate support surface that defines a substrate seat;
a support stem coupled with the electrostatic chuck body;
an upper heater embedded within the electrostatic chuck body, the upper heater comprising a circular center heater zone and one or more annular heater zones that are concentric with the center heating zone; and
a lower heater embedded within the electrostatic chuck body at a position below the upper heater, the lower heater comprising a plurality of arcuate heater zones, wherein:
the plurality of arcuate heater zones define an annular shape with an open interior; and
an inner edge of the lower heater is positioned radially outward of at least about 50% of a radius of the substrate seat.
2 . The substrate support assembly of claim 1 , further comprising:
a plurality of heater power rods extending through the support stem, each of the plurality of heater power rods being electrically coupled with a respective heater zone.
3 . The substrate support assembly of claim 2 , wherein:
each of the plurality of heater power rods are spaced apart by at least 2 mm within the support stem.
4 . The substrate support assembly of claim 2 , further comprising:
an RF rod extending through the support stem and electrically coupled with the electrostatic chuck body.
5 . The substrate support assembly of claim 4 , wherein:
the RF rod is spaced apart from each rod of a plurality of AC rods by at least 3 mm within the support stem.
6 . The substrate support assembly of claim 1 , further comprising:
a first heater return rod that is coupled with the center heater zone and each of the one or more annular heater zones; and
a second heater return rod that is coupled with each of the plurality of arcuate heater zones.
7 . The substrate support assembly of claim 1 , wherein:
the lower heater is disposed at a distance of between about 2 mm and 10 mm from the upper heater.
8 . The substrate support assembly of claim 1 , wherein:
an inner edge of each of the plurality of arcuate heater zones is disposed radially inward of the substrate seat; and
an outer edge of each of the plurality of arcuate heater zones is disposed at a distance from a center of the substrate seat that is aligned with or radially outward of a peripheral edge of the substrate seat.
9 . A substrate support assembly, comprising:
an electrostatic chuck body defining a substrate support surface that defines a substrate seat;
a support stem coupled with the electrostatic chuck body;
an upper heater embedded within the electrostatic chuck body; and
a lower heater embedded within the electrostatic chuck body at a position below the upper heater, the lower heater comprising a plurality of arcuate lower heater zones, wherein an inner edge of the lower heater is positioned radially outward of at least about 50% of a radius of the substrate seat.
10 . The substrate support assembly of claim 9 , wherein:
each of the plurality of lower heater zones comprises a heating coil.
11 . The substrate support assembly of claim 9 , wherein:
the plurality of lower heater zones comprises at least four lower heater zones.
12 . The substrate support assembly of claim 9 , wherein:
the upper heater comprising a plurality of upper heater zones.
13 . The substrate support assembly of claim 12 , wherein:
the plurality of upper heater zones comprise a circular heater zone and at least two annular circular heater zones that are positioned radially outward of the circular heater zone.
14 . The substrate support assembly of claim 9 , further comprising:
an RF mesh embedded within the electrostatic chuck body above the upper heater.
15 . The substrate support assembly of claim 9 , wherein:
the plurality of lower heater zones collectively form an annular shape defining an open central region.