IP Library Granted Patent US 12696713
Granted Patent B2
US 12696713 · App. 18/081,636 · Granted Jul 28, 2026

Heating unit and substrate treating apparatus including the same

Inventors: Dong Min Choi (Chungcheongnam-do, KR); Hye Ji Kim (Gyeongsangbuk-do, KR)
Assignee: SEMES CO., LTD.
H10P72/0434H10P72/7612
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Quick Facts
Patent No.
US 12696713
App. No.
18/081,636
Granted
Jul 28, 2026
Kind
B2
Abstract

The present disclosure provides a heating unit capable of using a bush with holes and a substrate treating apparatus including the same. An apparatus for treating a substrate, includes a heating unit including a heating plate and configured to heat the substrate, a cooling unit configured to cool the substrate, and a transfer unit configured to move the substrate to the heating unit or the cooling unit, wherein the heating plate includes a first plate configured to provide a seating surface to the substrate, and a second plate disposed under the first plate and installed internally with heater(s) and bush(es), and wherein the bush has a hollow configured to provide a lift pin with a space of movement for allowing the lift pin to be elevated or lowered, and includes a plurality of holes formed to extend from the hollow in an outward direction.

Claims (61)

1 . An apparatus for treating a substrate, comprising:

a heating unit including a heating plate and configured to heat the substrate;

a cooling unit configured to cool the substrate; and

a transfer unit configured to move the substrate to the heating unit or the cooling unit,

wherein the heating plate comprises:

a first plate configured to provide a seating surface to the substrate; and

a second plate disposed under the first plate and installed internally with one or more heaters and one or more bushes,

wherein the bush has a hollow configured to provide a lift pin with a space of movement for allowing the lift pin to be elevated or lowered, and includes a plurality of holes formed to extend from the hollow in an outward direction, and

wherein the second plate of the heating plate includes a plurality of bushes consecutively installed in a height direction, and the bush including the holes is a bush disposed at an uppermost level among the plurality of bushes.

2 . The apparatus of claim 1 , wherein the holes are formed in a vertical direction with respect to a longitudinal direction of the bush, or are formed to be inclined with respect to the longitudinal direction of the bush.

3 . The apparatus of claim 1 , wherein the holes are each partially formed on a surface of the bush.

4 . The apparatus of claim 3 , wherein the hollow of the bush comprises:

a first subspace; and

a second subspace that is narrower in width than the first subspace, and

wherein the holes are connected to the first subspace.

5 . The apparatus of claim 4 , wherein the lift pin has an end configured, when elevated, to pass through the second subspace first, and when lowered, to pass through the first subspace first.

6 . The apparatus of claim 1 , wherein the second plate of the heating plate is formed internally with passages that connect to the holes and to a suction member for removing particles generated in the hollow of the bush.

7 . The apparatus of claim 1 , wherein the lift pin comprises:

a first body; and

a second body joined with the first body and having a width wider than the first body.

8 . The apparatus of claim 7 , wherein the lift pin when inserted into the hollow of the bush has the first body positioned above the second body.

9 . The apparatus of claim 7 , wherein the second body of the lift pin has a width corresponding to at least some of the hollow of the bush.

10 . The apparatus of claim 7 , wherein the lift pin is adjustable in length with the first body disposed internally of the second body and moving toward and away from the second body.

11 . The apparatus of claim 7 , wherein the second body of the lift pin has a length corresponding to at least some of the hollow of the bush.

12 . The apparatus of claim 1 , wherein the first plate of the heating plate has a surface formed with a groove, and the bush is fixed to the first plate through the groove.

13 . The apparatus of claim 12 , wherein the bush comprises:

a first bush installed on the second plate of the heating plate; and

a second bush coupled to the first bush and fixed to the first plate through the groove.

14 . An apparatus for treating a substrate, comprising:

a heating unit including a heating plate and configured to heat the substrate;

a cooling unit configured to cool the substrate; and

a transfer unit configured to move the substrate to the heating unit or the cooling unit,

wherein the heating plate comprises:

a first plate configured to provide a seating surface to the substrate; and

a second plate disposed under the first plate and installed internally with one or more heaters and one or more bushes, and

wherein the bush has a hollow configured to provide a lift pin with a space of movement for allowing the lift pin to be elevated or lowered, and includes a plurality of holes formed to extend from the hollow in an outward direction,

wherein the holes are formed in a vertical direction with respect to a longitudinal direction of the bush or are formed to be inclined with respect to the longitudinal direction of the bush,

wherein the lift pin comprises:

a first body, and

a second body joined with the first body and having a width wider than the first body,

wherein the second body has a width corresponding to at least some of the hollow of the bush,

wherein the first plate has a surface formed with a groove, and the bush is fixed to the first plate through the groove, and

wherein the second plate of the heating plate includes a plurality of bushes consecutively installed in a height direction, and the bush including the holes is a bush disposed at an uppermost level among the plurality of bushes.

15 . A heating unit provided in an apparatus for processing a substrate, the heating unit comprising:

a heating plate configured to heat the substrate and comprising:

a body configured to provide a seating surface to the substrate, and

one or more heaters installed internally of the body;

a cover configured to cover an upper portion of the heating plate; and

an actuator configured to move the cover,

wherein the heating plate comprises:

a first plate configured to provide a seating surface to the substrate; and

a second plate disposed under the first plate and installed internally with the one or more heaters and one or more bushes,

wherein the bush has a hollow configured to provide a lift pin with a space of movement for allowing the lift pin to be elevated or lowered, and includes a plurality of holes formed to extend from the hollow in an outward direction, and

wherein the second plate of the heating plate includes a plurality of bushes consecutively installed in a height direction, and the bush including the holes is a bush disposed at an uppermost level among the plurality of bushes.

16 . The heating unit of claim 15 , wherein the holes are formed in a vertical direction with respect to a longitudinal direction of the bush or are formed to be inclined with respect to the longitudinal direction of the bush.

17 . The heating unit of claim 15 , wherein the holes are each partially formed on a surface of the bush.

18 . The heating unit of claim 17 , wherein the hollow of the bush comprises:

a first subspace; and

a second subspace that is narrower in width than the first subspace, and

wherein the holes are connected to the first subspace.

19 . The heating unit of claim 15 , wherein the second plate of the heating plate is formed internally with passages that connect to the holes and to a suction member for removing particles generated in the hollow of the bush.