IP Library Granted Patent US 12696767
Granted Patent B2
US 12696767 · App. 18/244,443 · Granted Jul 28, 2026

Semiconductor device

Inventor: Makoto Nishihara (Yokohama, JP)
Assignee: Sumitomo Electric Device Innovations, Inc.
H10W44/20H10D84/05H10D88/00H10W70/475H10W72/537H10W90/00H10W44/234H10W72/07352H10W72/07354H10W72/07553H10W72/07554H10W72/327H10W72/347H10W72/5445H10W72/5453H10W72/547H10W72/5473H10W72/5475H10W72/5522H10W72/865H10W72/884H10W72/921H10W72/926H10W72/932H10W72/934H10W72/944H10W72/952H10W90/736H10W90/738H10W90/755H10W90/758H10W90/759
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Quick Facts
Patent No.
US 12696767
App. No.
18/244,443
Granted
Jul 28, 2026
Kind
B2
Abstract

A semiconductor device includes a semiconductor chip including a substrate, a transistor provided on an upper surface of the substrate and having an input electrode to which a high frequency signal is input, an output electrode from which the high frequency signal is output, and a reference potential electrode to which a reference potential is supplied, and a metal pattern provided on the upper surface of the substrate and electrically connected to the reference potential electrode, a first capacitor including a first lower electrode provided on the metal pattern and electrically connected to the metal pattern, a first dielectric layer provided on the first lower electrode, and a first upper electrode provided on the first dielectric layer, and a first bonding wire electrically connecting the first upper electrode and a first electrode which is any one of the input electrode and the output electrode.

Claims (29)

1 . A semiconductor device comprising:

a semiconductor chip including:

a substrate;

a transistor provided on an upper surface of the substrate and having an input electrode to which a high frequency signal is input, an output electrode from which the high frequency signal is output, and a reference potential electrode to which a reference potential is supplied; and

a metal pattern provided on the upper surface of the substrate and electrically connected to the reference potential electrode;

a first capacitor including:

a first lower electrode provided on the metal pattern and electrically connected to the metal pattern,

a first dielectric layer provided on the first lower electrode, and

a first upper electrode provided on the first dielectric layer;

a first bonding wire electrically connecting the first upper electrode and a first electrode which is any one of the input electrode and the output electrode;

a conductive base on which the semiconductor chip is mounted and to which the reference potential is supplied;

a second capacitor provided on a region of the base other than another region where the semiconductor chip is mounted and including a second lower electrode electrically connected to the conductive base, a second dielectric layer provided on the second lower electrode, and a second upper electrode provided on the second dielectric layer; and

a second bonding wire electrically connecting the second upper electrode and a second electrode other than the first electrode of the input electrode and the output electrode.

2 . The semiconductor device according to claim 1 , wherein

the first lower electrode is connected on the metal pattern by using a brazing filler metal.

3 . The semiconductor device according to claim 1 , wherein

the first dielectric layer is a ceramic substrate or a semiconductor substrate.

4 . The semiconductor device according to claim 1 , wherein

the first lower electrode is in contact with the metal pattern, and the first dielectric layer is provided from a region of an upper surface of the metal pattern where the first lower electrode is not provided to another region between the first lower electrode and the first upper electrode.

5 . The semiconductor device according to claim 1 , further comprising:

a first signal terminal; and

a third bonding wire electrically connecting the first upper electrode and the first signal terminal.

6 . The semiconductor device according to claim 1 , further comprising:

a second signal terminal; and

a fourth bonding wire electrically connecting the second upper electrode and the second signal terminal.

7 . The semiconductor device according to claim 1 , wherein

the first electrode is the input electrode, and the second bonding wire is longer than the first bonding wire.

8 . The semiconductor device according to claim 1 , further comprising:

wherein the metal pattern and the reference potential electrode are electrically connected to the conductive base via a via hole penetrating through the substrate.