Semiconductor device and method for manufacturing the same
A semiconductor device includes: a semiconductor base body; a semiconductor chip; a sintering material layer bonded to a lower surface of the semiconductor chip and having a thickness decreasing toward an outer periphery of the semiconductor chip; and a conductive plate having a main surface facing the lower surface of the semiconductor chip and a recessed portion which the sintering material layer contacts in the main surface, the recessed portion having a depth decreasing toward the outer periphery of the semiconductor chip.
1 . A semiconductor device comprising:
a semiconductor chip;
a sintering material layer bonded to a lower surface of the semiconductor chip and having a thickness decreasing from a center side of the semiconductor chip toward an outer periphery of the semiconductor chip; and
a conductive plate having a main surface facing the lower surface of the semiconductor chip and a recessed portion in the main surface such that the sintering material layer contacts the recessed portion, the recessed portion having a depth decreasing from the center side of the semiconductor chip toward the outer periphery of the semiconductor chip.
2 . The semiconductor device of claim 1 , wherein at least an end of the recessed portion is a curved surface.
3 . The semiconductor device of claim 1 , wherein the recessed portion has a flat bottom surface.
4 . The semiconductor device of claim 1 , wherein the recessed portion has a tapered cross-sectional shape.
5 . The semiconductor device of claim 1 , wherein an outer periphery of the sintering material layer is in alignment with the outer periphery of the semiconductor chip.
6 . The semiconductor device of claim 1 , wherein an outer periphery of the sintering material layer is provided outside the outer periphery of the semiconductor chip.
7 . The semiconductor device of claim 1 , wherein an outer periphery of the recessed portion is in alignment with the outer periphery of the semiconductor chip.
8 . The semiconductor device of claim 1 , wherein an outer periphery of the recessed portion is provided outside the outer periphery of the semiconductor chip.
9 . The semiconductor device of claim 1 , wherein an outer periphery of the recessed portion is provided inside the outer periphery of the semiconductor chip.
10 . The semiconductor device of claim 1 , wherein a thickness of the sintering material layer matches a depth of the recessed portion.
11 . The semiconductor device of claim 1 , wherein
a thickness of the sintering material layer is larger than a depth of the recessed portion, and
the sintering material layer is partially provided on the main surface.
12 . The semiconductor device of claim 1 , wherein a protrusion portion is provided in the outer periphery of the recessed portion of the conductive plate.
13 . The semiconductor device of claim 1 , wherein the conductive plate is a part of an insulating circuit board.
14 . The semiconductor device of claim 1 , wherein
the conductive plate is a conductive block, and
the conductive block is arranged on an insulating circuit board.
15 . The semiconductor device of claim 1 , wherein the conductive plate contains a material containing copper as a main component.
16 . A method for manufacturing a semiconductor device comprising:
forming a recessed portion in a main surface of a conductive plate;
transferring a sintering material layer having a curved shape to a lower surface of a semiconductor chip; and
causing the sintering material layer transferred to the semiconductor chip to face the recessed portion of the conductive plate, sintering the sintering material layer by performing pressurization and heating from an upper surface side of the semiconductor chip, and bonding the conductive plate and the semiconductor chip to each other, such that the sintering material layer bonded to the lower surface of the semiconductor chip has a thickness decreasing from a center side of the semiconductor chip toward an outer periphery of the semiconductor chip, resulting in the recessed portion having a depth decreasing from the center side of the semiconductor chip toward the outer periphery of the semiconductor chip.
17 . The semiconductor device of claim 1 , wherein a depth of the recessed portion is largest in a center portion of the recessed portion.
18 . The semiconductor device of claim 1 , wherein a thickness of the sintering material layer is largest in a center portion of the semiconductor chip.