Ultrasonic mask and skin care device comprising same

1 . An ultrasonic mask comprising:

a first substrate;

a first wire disposed on an upper surface of the first substrate;

a first electrode connected to the first wire and disposed on the first wire;

a piezoelectric member disposed on the first electrode;

a second electrode disposed on the piezoelectric member;

a second wire connected to the second electrode and disposed on the second electrode;

a second substrate disposed on the second wire;

a first base layer on the second substrate;

a second base layer under the first substrate;

a plurality of spacers disposed on the first base layer;

wherein the first wire and the second wire have a curvature of 5R to 15R,

wherein the piezoelectric member generates an ultrasonic wave having a frequency band of 20 kHz to 1 MHz,

wherein the piezoelectric member includes a plurality of piezoelectric elements spaced apart from each other,

wherein the plurality of piezoelectric elements are spaced apart from each other at different distances,

wherein a distance between the piezoelectric elements disposed in a first region having a first curvature is smaller than a distance between the piezoelectric elements disposed in a second region having a second curvature smaller than the first curvature,

wherein the plurality of spacers are disposed in a region of an upper surface of the first base layer that does not overlap the plurality of piezoelectric elements in a vertical direction and protrude away from each of the first substrate and the second substrate, and

wherein the plurality of spacers include:

a plurality of first spacers extending in a first horizontal direction and spaced apart from each other in a second horizontal direction perpendicular to the first horizontal direction; and

a plurality of second spacers extending in the second horizontal direction, spaced apart from each other in the first horizontal direction, and connected to the plurality of first spacers.

2 . The ultrasonic mask of claim 1 , wherein an elongation of the first wire and the second wire is 10% to 50%, and

wherein the elongation is a ratio of a difference between a first length and a second length, which is a maximum tensile length of each of the first and second wires, to the first length before each of the first and second wires is tensioned.

3 . The ultrasonic mask of claim 1 , wherein

the second base layer reflects the ultrasonic wave in a direction of the first base layer, and

a thickness of the second base layer is equal to or less than a thickness of the first base layer.

4 . The ultrasonic mask of claim 1 , further comprising:

a first adhesive layer disposed between the first electrode and the first wire; and

a second adhesive layer disposed between the second electrode and the second wire,

wherein

when a region where the first adhesive layer and one surface of the first electrode overlap is defined as a first overlapping region,

a region where the second adhesive layer and the other surface of the second electrode overlap is defined as a second overlapping region, and

overlapping areas of the first overlapping region and the second overlapping region are 20% or more of the entire area of the first electrode or the second electrode.

5 . The ultrasonic mask of claim 4 , wherein a difference between the overlapping areas of the first overlapping region and the second overlapping region is 5% to 10%.

6 . The ultrasonic mask of claim 1 , further comprising:

an indicator disposed on the second substrate.

7 . The ultrasonic mask of claim 1 , wherein a thickness of the first substrate and a thickness of the second substrate are 0.5 μm to 5 μm.

8 . The ultrasonic mask of claim 4 , wherein a thickness of the first adhesive layer is greater than a thickness of the second adhesive layer.

9 . The ultrasonic mask of claim 1 , wherein a line width of the first wire and a line width of the second wire are 50 μm to 500 μm.

10 . The ultrasonic mask of claim 9 , wherein a thickness of the first wire and a thickness of the second wire are equal to or less than 1/10 of the line width of the first wire and the line width of the second wire.

11 . The ultrasonic mask of claim 3 , wherein

the first base layer includes silicon (Si), and

the thickness of the first base layer is 300 μm to 1 mm.

12 . The ultrasonic mask of claim 3 , wherein the second base layer includes a groove formed in a region corresponding to the piezoelectric member.

13 . A skin care device comprising:

a main body in which one side thereof is an open region and an accommodation space is formed inside the open region; and

the mask of claim 3 is disposed in the open region and connected to the main body.

14 . The skin care device of claim 13 , further comprising

a buffer member disposed on a lower surface of the second base layer.

15 . The skin care device of claim 13 , wherein an elongation of the first wire and the second wire is 10% to 50%.