IP Library › Granted Patent US 12698427
Granted Patent B2
US 12698427 · App. 17/604,530 · Granted Aug 4, 2026

Composition comprising styrene isoprene block copolymer and ethylenically unsaturated monomer

Inventors: Vasav Sahni (St. Paul, MN); Richard B. Ross (Cottage Grove, MN); Saswata Chakraborty (Sunnyvale, CA); Wayne S. Mahoney (St. Paul, MN); Jason D. Clapper (Lino Lakes, MN); Jacob P. Johnson (St. Paul, MN)
Assignee: 3M Innovative Properties Company
C09J153/02
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Quick Facts
Patent No.
US 12698427
App. No.
17/604,530
Granted
Aug 4, 2026
Kind
B2
Abstract

Compositions are described comprising at least 20 wt. % of block copolymer comprising polyvinyl aromatic end blocks and a polyisoprene midblock and at least one ethylenically unsaturated monomer comprising one or more groups selected from (meth)acryl or vinyl ether. In one embodiment, the monomer has a Log P according to Moriguchi's method of at least 2.2. In another embodiment, the monomer is a multifunctional aromatic ethylenically unsaturated monomer. The composition is typically a (e.g. pressure sensitive) adhesive. Also described are methods of making an article, adhesive articles, and methods of bonding.

Claims (37)

1 . A composition comprising:

at least 20 wt. % of block copolymer comprising polyvinyl aromatic end blocks and a polyisoprene midblock; and

at least one ethylenically unsaturated aromatic monomer comprising one or more groups selected from (meth)acryl or vinyl ether, wherein the monomer has a Log P according to Moriguchi's method of at least 2.2 and the monomer is present is an amount no greater than 20 wt.-% of the composition; and tackifier.

2 . The composition of claim 1 wherein the at least one ethylenically unsaturated aromatic monomer is a monofunctional ethylenically unsaturated monomer.

3 . The composition of claim 1 wherein the at least one ethylenically unsaturated aromatic monomer is a multifunctional ethylenically unsaturated monomer.

4 . The composition of claim 1 wherein the at least one ethylenically unsaturated monomer is aromatic and has a refractive index greater than 1.51, 1.55, or 1.60.

5 . The composition of claim 1 wherein the composition comprises styrene-isoprene-styrene (SIS) block copolymer.

6 . The composition of claim 5 wherein the SIS block copolymer has a multi-arm structure.

7 . The composition of claim 5 wherein the SIS block copolymer has a styrene content no greater than 15 wt-%.

8 . The composition of claim 1 wherein the composition further comprises at least one free-radical initiator.

9 . The composition of claim 1 wherein the composition at a thickness of 50 microns has a haze of less than 3, 2.5, 2, 1, 1.5, 1, or 0.5%.

10 . The composition of claim 1 wherein the composition at a thickness of 50 microns has a water vapor transmission rate of less than 100 g/m 2 day at 40° C. and 100% relative humidity.

11 . The composition of claim 1 wherein the composition is an adhesive.

12 . The composition of claim 1 wherein the composition is a pressure sensitive adhesive having a storage modulus G′ of less than 0.3 MPa at a temperature of 25° C. and a frequency of 1 hertz.

13 . The composition of claim 1 wherein the at least one ethylenically unsaturated monomer comprises a monofunctional ethylenically unsaturated monomer and a multifunctional ethylenically unsaturated monomer.

14 . The composition of claim 1 wherein the at least one aromatic ethylenically unsaturated monomer is present in an amount of 1 to 15 wt. % of the composition.

15 . The composition of claim 1 wherein the at least one ethylenically unsaturated aromatic monomer is present in an amount of 1 to 10 wt. % of the composition.

16 . A composition consisting of:

at least 20 wt. % of block copolymer comprising polyvinyl aromatic end blocks and a polyisoprene midblock; and

at least one ethylenically unsaturated aromatic monomer comprising one or more groups selected from (meth)acryl or vinyl ether, wherein the monomer has a Log P according to Moriguchi's method of at least 2.2 and the monomer is present is an amount no greater than 20 wt.-% of the composition;

free-radical initiator;

tackifier; and

optional additives selected from antioxidants, ultraviolet absorbers, light stabilizers, fillers, pigments, and crosslinkers.

17 . A composition comprising:

at least 20 wt. % of block copolymer comprising polyvinyl aromatic end blocks and a polyisoprene midblock; and

at least one ethylenically unsaturated aromatic monomer comprising one or more groups selected from (meth)acryl or vinyl ether, wherein the monomer has a Log P according to Moriguchi's method of at least 2.2 and the monomer is present is an amount of 1 to 10 wt.-% of the composition.

18 . An article comprising:

a substrate; and

a composition disposed on the substrate;

wherein the composition comprises

at least 20 wt. % of block copolymer comprising polyvinyl aromatic end blocks and a polyisoprene midblock; and

at least one ethylenically unsaturated aromatic monomer comprising one or more groups selected from (meth)acryl or vinyl ether, wherein the monomer has a Log P according to Moriguchi's method of at least 2.2 and the monomer is present is an amount no greater than 20 wt.-% of the composition.

19 . The article of claim 18 wherein the composition further comprises tackifier.

20 . The article of claim 18 wherein the substrate is a release liner, a film, or an electronic component.

21 . A method of bonding comprising:

providing the article of claim 20 ; and

bonding the substrate to a second substrate or surface with the composition.