Sealing member, fluid supplying device including sealing member, and substrate processing apparatus including fluid supplying device
Proposed are a sealing member that prevents fluid leakage even in a cryogenic environment, a fluid supplying device including the sealing member, and a substrate processing apparatus including the fluid supplying device. A sealing member according to an embodiment includes a sealing jacket having a ring shape, an upper O-ring mounted on an upper surface of the sealing jacket, a lower O-ring mounted on a lower surface of the sealing jacket, and a pressure ring inserted into a receiving portion of the sealing jacket and pressing the upper surface and the lower surface.
1 . A sealing member, comprising:
a sealing jacket having a ring shape;
an upper O-ring mounted on an upper surface of the sealing jacket;
a lower O-ring mounted on a lower surface of the sealing jacket; and
a pressure ring inserted into a receiving portion of the sealing jacket and configured to push the upper surface and the lower surface in opposite directions.
2 . The sealing member of claim 1 ,
wherein the receiving portion is formed on an inner wall of the sealing jacket.
3 . The sealing member of claim 1 ,
wherein the receiving portion is formed on an outer wall of the sealing jacket.
4 . The sealing member of claim 1 ,
wherein the pressure ring is a ring-shaped coil spring inserted into the receiving portion.
5 . The sealing member of claim 1 ,
wherein the pressure ring is an O-ring inserted into the receiving portion.
6 . The sealing member of claim 5 ,
wherein the pressure ring is made of phenyl vinyl methyl silicone (PVMQ).
7 . A fluid supplying device connecting a fluid supplying pipe and an electrostatic chuck to each other, the fluid supplying device comprising:
a fluid connection block having a fluid supplying hole connected to the fluid supplying pipe that supplies a fluid to the electrostatic chuck; and
a sealing member mounted around the fluid supplying hole and sealing a space between the fluid connection block and the electrostatic chuck,
wherein the sealing member comprises:
a sealing jacket having a ring shape;
an upper O-ring mounted on an upper surface of the sealing jacket;
a lower O-ring mounted on a lower surface of the sealing jacket; and
a pressure ring inserted into a receiving portion of the sealing jacket and configured to push the upper surface and the lower surface in opposite directions.
8 . The fluid supplying device of claim 7 ,
wherein the fluid supplying hole comprises:
a first fluid supplying hole connected to a first fluid supplying pipe that supplies a first fluid at a first pressure higher than an atmospheric pressure; and
a second fluid supplying hole connected to a second fluid supplying pipe that supplies a second fluid at a second pressure lower than the atmospheric pressure.
9 . The fluid supplying device of claim 8 ,
wherein the first fluid is a coolant.
10 . The fluid supplying device of claim 8 ,
wherein the second fluid is helium (He).
11 . The fluid supplying device of claim 8 ,
wherein the sealing member comprises:
a first sealing member mounted around the first fluid supplying hole; and
a second sealing member mounted around the second fluid supplying hole.
12 . The fluid supplying device of claim 11 ,
wherein the first sealing member is configured such that the receiving portion is formed on an inner wall of the sealing jacket.
13 . The fluid supplying device of claim 11 ,
wherein the second sealing member is configured such that the receiving portion is formed on an outer wall of the sealing jacket.
14 . The fluid supplying device of claim 7 ,
wherein the pressure ring is a ring-shaped coil spring inserted into the receiving portion.
15 . The fluid supplying device of claim 7 ,
wherein the pressure ring is an O-ring inserted into the receiving portion.
16 . The fluid supplying device of claim 15 ,
wherein the pressure ring is made of phenyl vinyl methyl silicone (PVMQ).
17 . A substrate processing apparatus, comprising:
an electrostatic chuck on which a substrate is mounted;
a fluid supplying pipe supplying a fluid for controlling a temperature of the substrate to the electrostatic chuck; and
a fluid supplying device connecting the fluid supplying pipe and the electrostatic chuck to each other,
wherein the fluid supplying device comprises:
a fluid connection block having a fluid supplying hole connected to the fluid supplying pipe that supplies the fluid to the electrostatic chuck; and
a sealing member mounted around the fluid supplying hole and sealing a space between the fluid connection block and the electrostatic chuck, and
wherein the sealing member comprises:
a sealing jacket having a ring shape;
an upper O-ring mounted on an upper surface of the sealing jacket;
a lower O-ring mounted on a lower surface of the sealing jacket; and
a pressure ring inserted into a receiving portion of the sealing jacket and configured to push the upper surface and the lower surface in opposite directions.
18 . The substrate processing apparatus of claim 17 ,
wherein the fluid supplying hole comprises:
a first fluid supplying hole connected to a first fluid supplying pipe that supplies a coolant at a first pressure higher than an atmospheric pressure; and
a second fluid supplying hole connected to a second fluid supplying pipe that supplies helium (He) at a second pressure lower than the atmospheric pressure.
19 . The substrate processing apparatus of claim 18 ,
wherein the sealing member comprises:
a first sealing member mounted around the first fluid supplying hole; and
a second sealing member mounted around the second fluid supplying hole,
wherein the first sealing member is configured such that the receiving portion is formed on an inner wall of the sealing jacket, and
wherein the second sealing member is configured such that the receiving portion is formed on an outer wall of the sealing jacket.
20 . The substrate processing apparatus of claim 18 ,
wherein the fluid connection block and the sealing jacket are made of one of polyetheretherketone (PEEK), Teflon, Vespel, Celazole, and perfluoroalkoxy (PFA), and
wherein the upper O-ring, the lower O-ring, and the pressure ring are made of phenyl vinyl methyl silicone (PVMQ).