Hermetic sealing for protection of titania-containing optical devices from damage by light
An optical device coated with a high refractive index (RI) titania-containing resin is hermetically sealed to prevent degradation induced by short wavelength visible light (<425 nm) and UV light in the range 300-400 nm thus including sunlight. The method includes placing the optical device in an assembly that is capable of being sealed hermetically. The method further includes introducing an inert atmosphere or vacuum, and sealing the assembly hermetically such that oxygen and water are excluded. The produced hermetically sealed optical device obtains enhanced resistance to photochemical degradation due to exposure to sunlight and more general light with the wavelength range of 300-425 nm. This method disclosed significantly increases the operational lifespan of optical devices utilizing high refractive index titania-containing resins that will be exposed to sunlight.
1 . A method for protecting an optical device coated with a high refractive index (RI) titania-containing resin from damage by short wavelength visible light (<425 nm) and UV light in the range of 300-400 nm, the method comprising:
placing the optical device in an assembly configured for hermetical sealing;
ensuring that the assembly containing the optical device is in an oxygen- and water-free environment having an atmosphere consisting of at least one of an inert gas, inert gases, or a vacuum;
sealing the assembly; and
producing a hermetic seal.
2 . The method of claim 1 , further comprising obtaining a light-stabilized optical device with a high RI titania-containing resin that maintains a refractive index change of no more than 0.10 RI units and at least 95% of its initial thickness after at least 1,000 hours of average sunlight irradiation at the Earth's surface.
3 . The method of claim 1 , wherein the high RI titania-containing resin has a refractive index of greater than 1.7 at 589 nm.
4 . The method of claim 1 , wherein the crystal structure of the titania is anatase or rutile.
5 . The method of claim 1 , wherein the titania is uncoated or coated with one or more inorganic materials.
6 . The method of claim 1 , wherein the high RI titania-containing resin comprises titanium oxide nanoparticles with an average particle size of less than 100 nanometers dispersed in an organic medium.
7 . A method for protecting a device with thin films containing titanium dioxide from degradation induced by short wavelength visible light (<425 nm) and UV light in the range 300-400 nm, the method comprising:
placing the device in an assembly configured for hermetical sealing;
ensuring that the assembly containing the optical device is in an oxygen- and water-free environment having an atmosphere consisting of at least one of an inert gas, inert gases, or a vacuum;
sealing the assembly; and
producing a hermetic seal.
8 . The method of claim 7 , further comprising obtaining a light-stabilized optical device with a high RI titania-containing resin that maintains a refractive index change of no more than 0.10 RI units and at least 95% of its initial thickness after at least 1,000 hours of average sunlight irradiation at the Earth's surface.
9 . The method of claim 7 , wherein the high RI titania-containing resin has a refractive index of greater than 1.7 at 589 nm.
10 . The method of claim 7 , wherein the crystal structure of the titania is anatase or rutile.
11 . The method of claim 7 , wherein the titania is uncoated or coated with one or more inorganic materials.
12 . The method of claim 7 , wherein the high RI titania-containing resin comprises titanium oxide nanoparticles with an average particle size of less than 100 nanometers dispersed in an organic medium.
13 . The method of claim 7 , wherein the inert gas is nitrogen, argon, or helium.
14 . A method for protecting an optical device employing a high refractive index (RI) titania-containing resin used in nano-imprint lithography (NIL) from damage by short wavelength visible light (<425 nm) and UV light in the range of 300-400 nm, the method comprising:
placing the optical device in an assembly that configured for hermetical sealing;
ensuring that the assembly containing the optical device is in an oxygen- and water-free environment having an atmosphere consisting of at least one of an inert gas, inert gases, or a vacuum;
sealing the assembly; and
producing a hermetic seal.
15 . The method of claim 14 , further comprising obtaining a light-stabilized optical device with a high RI titania-containing resin that maintains a refractive index change of no more than 0.10 RI units and at least 95% of its initial thickness after at least 1,000 hours of average sunlight irradiation at the Earth's surface.
16 . The method of claim 14 , wherein the high RI titania-containing resin has a refractive index of greater than 1.7 at 589 nm.
17 . The method of claim 14 , wherein the crystal structure of the titania is anatase or rutile.
18 . The method of claim 14 , wherein the titania is uncoated or coated with one or more inorganic materials.
19 . The method of claim 14 , wherein the high RI titania-containing resin comprises titanium oxide nanoparticles with an average particle size of less than 100 nanometers dispersed in an organic medium.
20 . The method of claim 14 , wherein the inert gas is nitrogen, argon, or helium.