IP Library Granted Patent US 12699263
Granted Patent B2
US 12699263 · App. 17/634,360 · Granted Aug 4, 2026

Micromechanical oscillation system

Inventors: Eugene Moliere Tanguep Njiokep (Reutlingen, DE); Frank Schatz (Kornwestheim, DE); Helmut Grutzeck (Kusterdingen, DE); Stefan Pinter (Reutlingen, DE); Johannes Baader (Haslach, DE); Rainer Straub (Ammerbuch, DE); Timo Schary (Aichtal-Neuenhaus, DE)
Assignee: ROBERT BOSCH GMBH
G02B26/085B81B3/0045G02B26/101B81B2201/042
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Quick Facts
Patent No.
US 12699263
App. No.
17/634,360
Filed
Feb 10, 2022
Granted
Aug 4, 2026
Kind
B2
Art Unit
2872
USPC
359/199.1
Abstract

A micromechanical oscillation system that is designed as a micromirror system. The micromechanical oscillation system includes a micromechanical oscillating body that includes at least one micromirror. The micromechanical oscillating body is designed to oscillate about an oscillation axis, in particular at a resonant frequency of the oscillating body. The micromechanical oscillating body has a total mass made up of mass elements. The mass elements are distributed as a function of a lateral horizontal spacing of the mass elements from the oscillation axis.

Claims (12)

1 . A micromechanical oscillation system, comprising:

a micromechanical oscillating body that includes at least one micromirror, the micromechanical oscillating body being configured to oscillate about an oscillation axis at a resonant frequency of the oscillating body, the micromechanical oscillating body having a total mass made up of mass elements, and the mass elements are distributed as a function of a lateral spacing of the mass elements from the oscillation axis,

wherein the micromechanical oscillating body additionally includes a carrier unit configured to carry at least one coil unit,

wherein in an outer area of the micromechanical oscillating body situated relative to the oscillation axis, the coil unit of the micromechanical oscillating body is made of a metal having a density less than 4 g/cm 3 , the metal having the density less than 4 g/cm 3 being aluminum, and in an inner area of the micromechanical oscillating body situated relative to the oscillation axis is made of a metal having a density greater than 4 g/cm 3 , the metal having the density greater than 4 g/cm 3 being copper.

2 . The micromechanical oscillation system as recited in claim 1 , wherein the micromechanical oscillation system is a micromirror system.

3 . The micromechanical oscillation system as recited in claim 1 , wherein a distribution of the mass elements is reduced as a function of the lateral spacing of the mass elements from the oscillation axis.

4 . The micromechanical oscillation system as recited in claim 1 , wherein the carrier unit is configured as two struts, one of the struts being situated on each side of the oscillation axis, and the struts being configured to span the coil unit.

5 . The micromechanical oscillation system as recited in claim 1 , wherein the micromirror in a top view completely covers the coil unit.

6 . The micromechanical oscillation system as recited in claim 1 , wherein in an outer area of the micromechanical oscillating body situated relative to the oscillation axis, the micromechanical oscillating body includes at least one recess on both sides of the oscillation axis.

7 . The micromechanical oscillation system as recited in claim 6 , wherein the at least one recess in a top view has the shape of a hexagonal prism.

8 . The micromechanical oscillation system as recited in claim 6 , wherein the at least one recess in a top view has a rectangular design.

9 . The micromechanical oscillation system as recited in claim 6 , wherein in the outer area of the micromechanical oscillating body situated relative to the oscillation axis, the micromechanical oscillating body includes a plurality of recesses on both sides of the oscillation axis, an extension of the recesses in a longitudinal direction and/or a transverse direction of the recesses increasing as a function of a lateral spacing of the recesses from the oscillation axis.