Compound, (co)polymer, composition, method for forming resist pattern, method for producing compound, and method for producing (co)polymer
An iodine-containing (meth)acrylate compound represented by formula (1): wherein R 1 represents a hydrogen atom, methyl, or halogen; each R 2 independently represents a hydrogen atom, a linear organic group having 1 to 20 carbon atoms, a branched organic group having 3 to 20 carbon atoms, or a cyclic organic group having 3 to 20 carbon atoms; A represents an organic group having 1 to 30 carbon atoms; A contains at least one acyl group; n 1 represents 0 or 1; and n 2 represents an integer of 1 to 20.
1 . An iodine-containing (meth) acrylate compound represented by formula (1):
wherein
R 1 represents a hydrogen atom, a methyl group, or halogen;
each R 2 independently represents a hydrogen atom, a linear organic group having 1 to 20 carbon atoms, a branched organic group having 3 to 20 carbon atoms, or a cyclic organic group having 3 to 20 carbon atoms;
A is adamantane or benzene having at least one acetoxy group;
n 1 represents 0 or 1; and
n 2 represents an integer of 1 to 20.
2 . The iodine-containing (meth) acrylate compound according to claim 1 , wherein the formula (1) is formula (2):
wherein R 1 , A, and n 2 are the same as described above.
3 . The iodine-containing (meth) acrylate compound according to claim 2 , wherein the formula (2) is formula (3):
wherein B represents an organic group containing an aromatic group and having 5 to 30 carbon atoms, B is benzene having at least one acetoxy group, and R 1 and n 2 are as described above.
4 . The iodine-containing (meth) acrylate compound according to claim 2 , wherein the formula (2) is formula (3′):
wherein B′ represents an organic group containing an alicyclic ring and having 5 to 30 carbon atoms, B′ is adamantane having at least one acetoxy group, and R 1 and n 2 are as described above.
5 . The iodine-containing (meth) acrylate compound according to claim 1 , wherein n 2 represents an integer of 2 to 20.
6 . An iodine-containing (meth) acrylate (co) polymer comprising a constituent unit represented by formula (4):
wherein
R 1 represents a hydrogen atom, a methyl group, or halogen;
each R 2 independently represents a hydrogen atom, a linear organic group having 1 to 20 carbon atoms, a branched organic group having 3 to 20 carbon atoms, or a cyclic organic group having 3 to 20 carbon atoms;
A is adamantane or benzene having at least one acetoxy group;
n 1 represents 0 or 1;
n 2 represents an integer of 1 to 20; and
the symbol * represents a bonding site to an adjacent constituent unit.
7 . The iodine-containing (meth) acrylate (co) polymer according to claim 6 , wherein the formula (4) is formula (5):
wherein R 1 , n 2 , A, and the symbol * are the same as described above.
8 . The iodine-containing (meth) acrylate (co) polymer according to claim 7 , wherein the formula (5) is formula (6):
wherein B represents an organic group containing an aromatic group and having 5 to 30 carbon atoms, B is benzene having at least one acetoxy group, and R 1 , n 2 , and the symbol * are as described above.
9 . The iodine-containing (meth) acrylate (co) polymer according to claim 7 , wherein the formula (5) is formula (6′):
wherein B′ represents an organic group containing an alicyclic ring and having 5 to 30 carbon atoms, B′ is adamantane having at least one acetoxy group, and R 1 , n 2 , and the symbol * are as described above.
10 . The iodine-containing (meth) acrylate (co) polymer according to claim 6 , wherein n 2 represents an integer of 2 to 20.
11 . A composition comprising the iodine-containing (meth) acrylate compound according to claim 1 .
12 . The composition according to claim 11 , further comprising a solvent.
13 . The composition according to claim 11 , further comprising an acid generating agent.
14 . The composition according to claim 11 , further comprising an acid diffusion controlling agent.
15 . A method for forming a resist pattern, comprising the steps of:
forming a film using the composition according to claim 11 ;
exposing the formed film; and
removing an exposed portion of the exposed film using a developer to form a pattern.