Systems and methods for combinatorial arrays using dynamic interference lithography

1 . A dynamic interference lithography (DIL) device comprising:

a laser source configured for providing a laser beam;

a substrate stage configured for mounting a substrate;

an at least partially convex curved mirror mounted on a rotatable stage; and

a spatial filter configured to divide the laser beam into a first beam portion directed toward the at least partially convex curved mirror and a second beam portion directed toward the substrate,

wherein the first beam portion is reflected by the at least partially convex curved mirror toward the substrate to form an interference pattern on the substrate,

wherein the rotatable stage is configured to adjust a location on the at least partially convex curved mirror where the first beam portion is reflected from.

2 . The DIL device of claim 1 , wherein the at least partially convex curved mirror is mounted on the rotatable stage configured for adjusting an angle at which the first beam portion impinges on the at least partially convex curved mirror.

3 . The DIL device of claim 1 , wherein the interference pattern comprises a plurality of heterogeneous topographical patterns.

4 . The DIL device of claim 3 , wherein the plurality of heterogeneous topographic patterns comprise at least one of the following topographic features: grooves, grids, pores, lines, dots, bumps, gratings, pillars, dimples, curved lens structures, or complex three-dimensional hierarchical structures of calculated dimensions.

5 . The DIL device of claim 3 , wherein at least two of the plurality of heterogeneous topographic patterns have topographical features that differ in at least one of the following properties: shape, size, height, pitch, orientation, type, periodicity, spacing, composition, elasticity, or stiffness.

6 . The DIL device of claim 3 , further comprising a controller device configured to control a position of the at least partially convex curved mirror to create formation of the interference pattern that comprises the plurality of heterogeneous topographic patterns.

7 . The DIL device of claim 6 , wherein the controller device is configured to control a position of the at least partially convex curved mirror such that an angle of incidence of the first beam portion on the at least partially curved mirror is about 0°-90°.

8 . The DIL device of claim 3 , further comprising a controller device configured to control the laser source for providing a desired number of laser beams.

9 . The DIL device of claim 1 , wherein a focal length of the at least partially convex curved mirror is about 1.0 millimeter to about 1.0 meter.