Substrate processing apparatus
A substrate processing apparatus includes a cup, an exhaust duct, a mist collecting member and a lid portion. The cup surrounds a substrate being processed with use of a processing liquid. The exhaust duct has an opening in a portion not overlapping with the cup in a plan view and forms an exhaust flow path for exhausting a gas in the cup. The mist collecting member is provided at a position overlapping with the opening and collects mist of the processing liquid in the exhaust duct. The lid portion closes the opening of the exhaust duct.
1 . A substrate processing apparatus comprising:
a cup surrounding a substrate that is being processed with use of a processing liquid,
an exhaust duct that has an opening in a portion not overlapping with the cup in a plan view and forms an exhaust flow path for exhausting a gas in the cup;
a mist collecting member that is provided at a position overlapping with the opening and collects a mist component of the processing liquid in the exhaust duct; and
a lid portion that closes the opening of the exhaust duct,
wherein at least part of the lid portion is formed of a light transmitting member.
2 . The substrate processing apparatus according to claim 1 , wherein
the exhaust duct has a bent portion not overlapping with the cup in the plan view,
the opening is formed in the bent portion, and
the mist collecting member is provided in the bent portion.
3 . The substrate processing apparatus according to claim 1 , wherein
the opening is formed in an upper surface of the exhaust duct.
4 . The substrate processing apparatus according to claim 1 , wherein
the lid portion includes
a light transmitting portion formed of the light transmitting member, and
a frame to which the light transmitting portion is attached.
5 . The substrate processing apparatus according to claim 1 , wherein
the lid portion forms part of the exhaust flow path.
6 . The substrate processing apparatus according to claim 1 , further comprising a base portion that supports the cup and the exhaust duct.
7 . A substrate processing apparatus comprising:
a cup surrounding a substrate that is being processed with use of a processing liquid;
an exhaust duct that has an opening in a portion not overlapping with the cup in a plan view and forms an exhaust flow path for exhausting a gas in the cup;
a mist collecting member that is provided at a position overlapping with the opening and collects a mist component of the processing liquid in the exhaust duct;
a lid portion that closes the opening of the exhaust duct; and
a surrounding member that surrounds the cup, wherein
the opening is formed in a portion of the exhaust duct not overlapping with the surrounding member in the plan view.
8 . The substrate processing apparatus according to claim 7 , wherein
the exhaust duct has a bent portion not overlapping with the cup in the plan view,
the opening is formed in the bent portion, and
the mist collecting member is provided in the bent portion.
9 . The substrate processing apparatus according to claim 7 , wherein
the opening is formed in an upper surface of the exhaust duct.
10 . The substrate processing apparatus according to claim 7 , wherein
the lid portion forms part of the exhaust flow path.
11 . The substrate processing apparatus according to claim 7 , further comprising a
base portion that supports the cup and the exhaust duct.