IP Library › Granted Patent US 12699328
Granted Patent B2
US 12699328 · App. 18/703,797 · Granted Aug 4, 2026

Utility stage for photolithographic apparatus and method

Inventors: Keane Michael Levy (Wilton, CT); Amy Ng (Ridgefield, CT)
Assignee: ASML Netherlands B.V.
G03F7/70808B25J18/02G03F7/70716G03F7/70925
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12699328
App. No.
18/703,797
Granted
Aug 4, 2026
Kind
B2
Abstract

Disclosed is an apparatus for and method of using an in-system utility stage to provide service functions for wafer tables and other components in the photolithographic system in which the utility stage can access multiple tools without any need to open an enclosure containing the utility stage and the wafer tables and other components thus increasing throughput and decreasing downtime.

Claims (48)

1 . A photolithographic apparatus comprising:

an enclosure;

at least one object table situated in the enclosure and adapted to travel between a plurality of positions in the enclosure;

a utility device situated within the enclosure in a utility zone;

a utility stage situated in the enclosure and adapted to travel from a parked position situated within the enclosure to the utility zone, the utility stage being adapted to carry at least one tool from the parked position to the utility zone; and

a tool store situated in the enclosure adjacent to the parked position and a plurality of tools stored in the tool store.

2 . A photolithographic apparatus as in claim 1 wherein:

the utility stage is adapted to unload a first tool from the tool store, convey the first tool to the utility device, and load the first tool on the utility device;

the object table comprises a wafer table, the utility device comprises an object table cleaning tool situated at the utility position, and the first tool comprises a first cleaning stone; and

the utility stage is further adapted to unload the first tool from the utility device, convey the first tool to the tool store, and load the first tool in the tool store.

3 . A photolithographic apparatus as in claim 1 wherein:

the at least one object table comprises a first wafer table and a second wafer table; and/or the utility stage comprises an extensible robotic arm arranged to position the utility stage.

4 . A photolithographic apparatus comprising:

an enclosure;

a first wafer table situated in the enclosure and adapted to move between a plurality of coplanar positions in the enclosure;

a second wafer table situated in the enclosure and adapted to move between the plurality of coplanar positions in the enclosure, the second wafer table being moved in such a way as to avoid interfering with motion of the first wafer table and the first wafer table being moved in such a way as to avoid interfering with motion of the second wafer table;

a utility device situated within the enclosure in a utility zone and adapted to perform a utility operation on a wafer;

a utility stage situated in the enclosure and adapted to travel from a parked position situated within the enclosure to the utility zone, the utility stage being adapted to carry at least one tool from the parked position to the utility zone, the utility stage being moved and positioned in such a way as to avoid interfering with motion of the first wafer table and the second wafer table; and

a tool store situated in the enclosure adjacent to the parked position and a plurality of tools stored in the tool store.

5 . A photolithographic apparatus as in claim 4 wherein the utility stage is adapted to unload a first tool from the tool store, convey the first tool to the utility device, and load the first tool on the utility device.

6 . A photolithographic apparatus as in claim 5 wherein:

the utility device comprises a wafer table cleaning tool situated in the utility zone and the first tool comprises a first cleaning stone;

the plurality of tools stored in the tool store comprises a plurality of cleaning stones; and

the first tool comprises a sticky wafer and wherein the utility device comprises a wafer table cleaning tool adapted to press the sticky wafer against a wafer receiving surface of a wafer table.

7 . A photolithographic apparatus as in claim 5 wherein:

the first tool comprises a spiked wafer and wherein the utility device comprises a wafer table cleaning tool adapted to press the spiked wafer against a wafer receiving surface of a wafer table; and

the utility stage is further adapted to unload the first tool from the utility device, convey the first tool to the tool store, and load the first tool in the tool store.

8 . A photolithographic apparatus as in claim 4 wherein the utility stage comprises an extensible robotic arm.

9 . A method of operating a photolithographic apparatus, the photolithographic apparatus comprising an enclosure, a first wafer table situated in the enclosure and adapted to move between a plurality of coplanar positions in the enclosure, a second wafer table situated in the enclosure and adapted to between a plurality of coplanar positions in the enclosure, a utility device situated within the enclosure in a utility zone and adapted to perform a utility operation on a wafer, and a utility stage situated in the enclosure and adapted to travel from a parked position situated within the enclosure to the utility zone, the utility stage being adapted to carry at least one tool from the parked position to the utility zone, the method comprising:

situating the first wafer table at a first neutral position at which the first wafer table will not interfere with motion of the utility stage from the parked position to the utility zone;

situating the second wafer table at a second neutral position at which the second wafer table will not interfere with motion of the utility stage from the parked position to the utility zone; and

moving the utility stage from the parked position to the utility device utility zone, wherein the utility stage unloads a tool from a tool store when the utility stage is at the parked position.

10 . A method as in claim 9 wherein:

the first tool is one of a plurality of tools stored in the tool store;

the utility stage loads a tool onto a utility device when the utility stage is in the utility zone; and

the utility stage unloads a tool from a tool store when the utility stage is at the parked position, moves to the utility zone, and loads the tool onto a utility device in the utility zone.

11 . A method as in claim 9 further comprising:

using the utility stage to unload a first tool from the utility stage in the utility zone;

moving the utility stage to the parked position;

unloading the first tool from the utility stage and loading the first tool in a tool store;

unloading a second tool from the tool store and loading the second tool on the utility stage;

moving the utility stage to the utility zone; and

using the utility stage to load the second tool onto the utility device.

12 . A method as in claim 9 wherein:

the utility device comprises a wafer table cleaning tool situated in the utility zone and the first tool comprises a first cleaning stone; and

the first tool comprises a sticky wafer and wherein the utility device comprises a wafer table cleaning tool adapted to press the sticky wafer against a wafer receiving surface of a wafer table.

13 . A method as in claim 9 wherein the first tool comprises a spiked wafer and wherein the utility device comprises a wafer table cleaning tool adapted to press the spiked wafer against a wafer receiving surface of a wafer table.

14 . A method as in claim 9 wherein the photolithographic apparatus comprises a lens and the first tool comprises a lens cleaning device, and wherein the utility stage is adapted to travel to the lens and deploy the lens cleaning device to clean the lens.