IP Library Granted Patent US 12699329
Granted Patent B2
US 12699329 · App. 18/431,935 · Granted Aug 4, 2026

Laser lithography device and method for producing a three-dimensional structure

Inventors: Marc Hippler (Eggenstein-Leopoldshafen, DE); Michael Thiel (Karlsruhe, DE)
Assignee: Nanoscribe Holding GmbH
G03F7/70958G03F7/70983
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Quick Facts
Patent No.
US 12699329
App. No.
18/431,935
Granted
Aug 4, 2026
Kind
B2
Abstract

A laser lithography device for producing a three-dimensional structure in a lithographic material comprising a laser source for emitting a laser writing beam and a lens for focusing the laser writing beam in a focus region. The lens has an optical terminating element. Furthermore, the laser lithography device comprises a scanning device for displacing the focus region of the laser writing beam relative to the lithographic material and a protection device for preventing contact between the optical terminating element and the lithographic material. The protection device is arranged on the optical terminating element.

Claims (41)

1 . A laser lithography device for producing a three-dimensional structure in a lithographic material, the laser lithography device comprising:

a laser source for emitting a laser writing beam;

a lens for focusing the laser writing beam in a focus region, wherein the lens has an optical terminating element;

a scanning device for displacing the focus region of the laser writing beam relative to the lithographic material; and

a protection device for preventing contact between the optical terminating element and the lithographic material, wherein

the protection device is arranged directly on the optical terminating element,

the protection device has an adhesive layer for fastening the protection device to the optical terminating element, and

the protection device is a sticker or an adhesive tape.

2 . The laser lithography device according to claim 1 ,

wherein the protection device has a film or a foil.

3 . The laser lithography device according to claim 1 ,

wherein the protection device is designed to be fastened to the optical terminating element.

4 . The laser lithography device according to claim 1 ,

wherein a transmittance of the protection device for the laser writing beam is at least 80%.

5 . The laser lithography device according to claim 1 , wherein

the lens has a lens housing,

the optical terminating element is received by the lens housing,

the lens housing has an element that is unsuitable for contact with the lithographic material, and

the protection device covers the element to prevent contact between the element and the lithographic material.

6 . The laser lithography device according to claim 1 , wherein

the protection device has a refractive index that can be corrected by the lens.

7 . The laser lithography device according to claim 1 , wherein

the protection device has a first layer having a first refractive index and a second layer having a second refractive index, and

the first refractive index differs from the second refractive index.

8 . The laser lithography device according to claim 1 , further comprising

a second protection device for preventing contact between the optical terminating element and the lithographic material, wherein

the second protection device is arranged on the protection device.

9 . A method for producing the three-dimensional structure in the lithographic material by means of the laser lithography device according to claim 1 .

10 . The laser lithography device according to claim 1 ,

wherein a transmittance of the protection device for the laser writing beam is at least 85%.

11 . The laser lithography device according to claim 1 ,

wherein a transmittance of the protection device for the laser writing beam is at least 90%.

12 . The laser lithography device according to claim 1 ,

wherein a transmittance of the protection device for the laser writing beam is at least 92%.

13 . The laser lithography device according to claim 1 ,

wherein a transmittance of the protection device for the laser writing beam is at least 95%.

14 . A method for producing a three-dimensional structure in a lithographic material, the method comprising:

emitting a laser writing beam;

focusing the laser writing beam in a focus region;

displacing the focus region of the laser writing beam relative to the lithographic material; and

preventing contact between an optical terminating element and the lithographic material by using a protection device, wherein the protection device is a sticker or an adhesive tape.