Memory device and program operation thereof
In certain aspects, a memory device includes memory strings each including a first drain select gate (DSG) transistor, an insulating structure disposed between two adjacent sets of the memory strings and electrically separating the first DSG transistors of the two adjacent sets of the memory strings, first DSG line, each coupled to the first DSG transistors in a respective set of the two adjacent sets of the memory strings, and a peripheral circuit coupled to the memory strings through the first DSG lines and configured to, in an operation, apply a negative voltage to an unselect first DSG line of the first DSG lines, wherein the unselect first DSG line is coupled to the first DSG transistors in an unselect set of the two adjacent sets of the memory strings.
1 . A memory device, comprising:
memory strings each comprising a first drain select gate (DSG) transistor;
an insulating structure disposed between two adjacent sets of the memory strings and electrically separating the first DSG transistors of the two adjacent sets of the memory strings;
first DSG lines, each of the first DSG lines being coupled to the first DSG transistors in a respective set of the two adjacent sets of the memory strings; and
a peripheral circuit coupled to the memory strings through the first DSG lines and configured to, in an operation, apply a negative voltage to an unselect first DSG line of the first DSG lines, wherein the unselect first DSG line is coupled to the first DSG transistors in an unselect set of the two adjacent sets of the memory strings.
2 . The memory device of claim 1 , wherein the insulating structure extends laterally in a straight line or a serpentine line, and extends vertically through the first DSG lines.
3 . The memory device of claim 1 , wherein
each of the memory strings further comprises memory cells, and the memory device further comprises word lines coupled to the memory cells of the memory strings; and
the operation comprises a program operation, and the peripheral circuit is further configured to, in the program operation, during applying the negative voltage to the unselect first DSG line, apply a program voltage to a select word line of the word lines to program select memory cells of the memory cells that are coupled to the select word line.
4 . The memory device of claim 2 , wherein
each of the memory strings further comprises memory cells, and the memory device further comprises word lines coupled to the memory cells of the memory strings; and
the operation comprises a read operation or a verify operation, and the peripheral circuit is further configured to, in the read or verify operation, during applying the negative voltage to the unselect first DSG line, apply a read/verify voltage to a select word line of the word lines to read or verify select memory cells of the memory cells coupled to the select word line.
5 . The memory device of claim 3 , wherein
each of the memory strings further comprises a second DSG transistor, and the memory device further comprises a second DSG line coupled to the second DSG transistors of the memory strings; and
the peripheral circuit is further configured to, during applying the negative voltage to the unselect first DSG line, apply a first positive voltage to the second DSG line to turn on the second DSG transistors.
6 . The memory device of claim 5 , wherein
each of the memory strings further comprises a third DSG transistor, and the memory device further comprises a third DSG line coupled to the third DSG transistors of the memory strings, the third DSG line being vertically closer to the insulating structure than the second DSG line; and
the peripheral circuit is further configured to, during applying the negative voltage to the unselect first DSG line, apply a second positive voltage smaller than the first positive voltage to the third DSG line to turn on the third DSG transistors.
7 . The memory device of claim 6 , wherein the insulating structure extends vertically through the first DSG lines and stops before reaching the second DSG line.
8 . The memory device of claim 1 , wherein the peripheral circuit is further configured to, in the operation, apply a third positive voltage to a select first DSG line of the first DSG lines, the select first DSG line being coupled to the first DSG transistors in a select set of the two adjacent sets of the memory strings.
9 . The memory device of claim 8 , further comprising an additional first DSG line coupled to the first DSG transistors in an additional unselect set of the memory strings that is nonadjacent to the select set of the two adjacent sets of the memory strings,
wherein the peripheral circuit is further configured to, in the operation, apply a ground voltage to the additional first DSG line.
10 . The memory device of claim 1 , wherein the memory device is a NAND Flash memory device.
11 . A method for operating a memory device, the memory device comprising memory strings each comprising a first drain select gate (DSG) transistor, an insulating structure disposed between two adjacent sets of the memory strings and electrically separating the first DSG transistors of the two adjacent sets of the memory strings, and first DSG lines each coupled to the first DSG transistors in a respective set of the two adjacent sets of the memory strings, the method comprising:
in an operation, applying a negative voltage to an unselect first DSG line of the first DSG lines, wherein the unselect first DSG line is coupled to the first DSG transistors in an unselect set of the two adjacent sets of the memory strings.
12 . The method of claim 11 , wherein the insulating structure extends laterally in a straight line or a serpentine line, and extends vertically through the first DSG lines.
13 . The method of claim 11 , wherein
each of the memory strings further comprises memory cells, and the memory device further comprises word lines coupled to the memory cells of the memory strings; and
the operation comprises a program operation, and the method comprises, in the program operation, during applying the negative voltage to the unselect first DSG line, applying a program voltage to a select word line of the word lines to program select memory cells of the memory cells that are coupled to the select word line.
14 . The method of claim 12 , wherein
each of the memory strings further comprises memory cells, and the memory device further comprises word lines coupled to the memory cells of the memory strings; and
the operation comprises a read operation or a verify operation, and the method comprises, in the read or verify operation, during applying the negative voltage to the unselect first DSG line, applying a read/verify voltage to a select word line of the word lines to read or verify select memory cells of the memory cells coupled to the select word line.
15 . The method of claim 13 , wherein
each of the memory strings further comprises a second DSG transistor, and the memory device further comprises a second DSG line coupled to the second DSG transistors of the memory strings; and
the method further comprises, during applying the negative voltage to the unselect first DSG line, applying a first positive voltage to the second DSG line to turn on the second DSG transistors.
16 . The method of claim 15 , wherein
each of the memory strings further comprises a third DSG transistor, and the memory device further comprises a third DSG line coupled to the third DSG transistors of the memory strings, the third DSG line being vertically closer to the insulating structure than the second DSG line; and
the method further comprises, during applying the negative voltage to the unselect first DSG line, applying a second positive voltage smaller than the first positive voltage to the third DSG line to turn on the third DSG transistors.
17 . The method of claim 16 , wherein the insulating structure extends vertically through the first DSG lines and stops before reaching the second DSG line.
18 . The method of claim 11 , further comprising, in the operation, applying a third positive voltage to a select first DSG line of the first DSG lines, the select first DSG line being coupled to the first DSG transistors in a select set of the two adjacent sets of the memory strings.
19 . The method of claim 18 , wherein
the memory device further comprises an additional first DSG line coupled to the first DSG transistors in an additional unselect set of the memory strings that is nonadjacent to the select set of the two adjacent sets of the memory strings; and
the method further comprises, in the operation, applying a ground voltage to the additional first DSG line.
20 . A system, comprising:
a memory device, comprising:
memory strings each strings comprising a first drain select gate (DSG) transistor;
an insulating structure disposed between two adjacent sets of the memory strings and electrically separating the first DSG transistors of the two adjacent sets of the memory strings;
first DSG lines, each of the first DSG lines being coupled to the first DSG transistors in a respective set of the two adjacent sets of the memory strings; and
a peripheral circuit coupled to the memory strings through the first DSG lines and configured to, in an operation, apply a negative voltage to an unselect first DSG line of the first DSG lines, wherein the unselect first DSG line is coupled to the first DSG transistors in an unselect set of the two adjacent sets of the memory strings; and
a memory controller coupled to the memory device and configured to control the memory device.